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1.发明申请
公开(公告)号：WO2022214267A1
公开(公告)日：2022-10-13
申请号：PCT/EP2022/056091
申请日：2022-03-09
Applicant: ASML NETHERLANDS B.V.
Inventor： KARA, Dogacan , JENSEN, Erik , WILDENBERG, Jochem, Sebastiaan , DECKERS, David, Frans, Simon , GULER, Sila , ASTUDILLO RENGIFO, Reinaldo, Antonio , YUDHISTIRA, Yasri , HILHORST, Gijs , CAICEDO FERNANDEZ, David, Ricardo , SPIERING, Frans, Reinier , KHO, Sinatra, Canggih , BLOM, Herman, Martin , KIM, Sang Uk , KIM, Hyun-Su
Abstract: A method for determining a substrate model for describing a first measurement dataset and a second measurement dataset relating to a performance parameter. The method comprises obtaining candidate basis functions for a plurality of substrate models. Steps 1 to 4 are performed iteratively for said first measurement dataset and said second measurement dataset until at least one stopping criterion is met so as to determine said substrate model, said steps comprising: 1. selecting a candidate basis function from said candidate basis functions; 2. updating a substrate model by adding the candidate basis function into this substrate model to obtain an updated substrate model; 3. evaluating the updated substrate model based on at least one of said first measurement dataset and said second measurement dataset; and 4. determining whether to include the basis function within the substrate model based on 10 the evaluation.
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2.发明申请
公开(公告)号：WO2017055075A1
公开(公告)日：2017-04-06
申请号：PCT/EP2016/071542
申请日：2016-09-13
Applicant: ASML NETHERLANDS B.V.
Inventor： VERMA, Alok , KHO, Sinatra, Canggih , VAN LEEST, Adriaan, Johan
CPC classification number: G03F7/70625 , G03F7/705 , G03F7/70633 , G03F9/7092
Abstract: This disclosure includes a variety of methods of describing a shape in a hierarchical manner, and uses of such a hierarchical description. In particular, this disclosure includes a method comprising: fitting one or more sub-shapes of a first order against a shape; determining an error of the fitting; and fitting one or more sub-shapes of a second order against the error.
Abstract translation: 本公开包括以分层方式描述形状的各种方法以及这种分层描述的使用。 特别地，本公开包括一种方法，包括：将一个或多个第一阶次的子形状对准一个形状; 确定装配的误差; 并且针对该错误拟合二次的一个或多个子形状。
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3.发明公开
公开(公告)号：EP4517424A1
公开(公告)日：2025-03-05
申请号：EP23193729.3
申请日：2023-08-28
Applicant: ASML Netherlands B.V.
Inventor： YU, Hyunwoo , KHO, Sinatra, Canggih , LAMBREGTS, Cornelis, Johannes, Henricus , BLOM, Herman, Martin
Abstract: Disclosed is a method of determining an exposure strategy for at least a first exposure in a first layer of a substrate with a first correction capability and at least a second exposure in a second layer of said substrate with a second correction capability, the second correction capability being different to the first correction capability, the method comprising: determining a first layer correctable error component of said first layer parameter of interest data, which is correctable according to said first correction capability; determining a first portion of said first layer correctable error component uncorrectable according to said second correction capability; dividing said first portion of said first layer correctable error into at least a first sub-portion and a second sub-portion; and attributing said first sub-portion to a first exposure error budget and said second sub-portion a second exposure error budget.
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4.发明公开
公开(公告)号：EP4320483A1
公开(公告)日：2024-02-14
申请号：EP22710625.9
申请日：2022-03-09
Applicant: ASML Netherlands B.V.
Inventor： KARA, Dogacan , JENSEN, Erik , WILDENBERG, Jochem, Sebastiaan , DECKERS, David, Frans, Simon , GULER, Sila , ASTUDILLO RENGIFO, Reinaldo, Antonio , YUDHISTIRA, Yasri , HILHORST, Gijs , CAICEDO FERNANDEZ, David, Ricardo , SPIERING, Frans, Reinier , KHO, Sinatra, Canggih , BLOM, Herman, Martin , KIM, Sang Uk , KIM, Hyun-Su
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