公开(公告)号：WO2013174539A1

公开(公告)日：2013-11-28

申请号：PCT/EP2013/055701

申请日：2013-03-19

Applicant: ASML NETHERLANDS B.V.

Inventor： LAURENT, Thibault ,  JACOBS, Johannes, Henricus, Wilhelmus ,  KOK, Haico ,  VAN DE VIJVER, Yuri ,  VAN DE WAL, Johannes ,  KNARREN, Bastiaan ,  VOOGD, Robbert Jan ,  WESTERLAKEN, Jan, Steven, Christiaan ,  VAN DE RIJDT, Hans ,  KOOIKER, Eelco ,  HURKENS-MERTENS, Wilhelmina Margareta Jozef ,  TEILLET, Yohann, Bruno, Yvon

IPC: G03F7/20

CPC classification number: G03F7/7085 ,  G03F7/70341 ,  G03F7/70666 ,  G03F7/70858 ,  G03F7/70891

Abstract: A sensor (100) for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid (11) is arranged so that the thermal resistance of a first heat path from a transducer (104) of the sensor to a temperature conditioning device (107) is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.

Abstract translation: 用于浸没式光刻设备中并且在使用中与浸液（11）接触的传感器（100）被布置成使得来自第一传感器（104）的第一热路的热阻 温度调节装置（107）的传感器小于从换能器到浸液的第二热流路的热阻。 因此，热流优先朝向温度调节装置，而不是浸没液体，使得浸没液体中的温度引起的干扰减小或最小化。