公开(公告)号：WO2013174539A1

公开(公告)日：2013-11-28

申请号：PCT/EP2013/055701

申请日：2013-03-19

Applicant: ASML NETHERLANDS B.V.

Inventor： LAURENT, Thibault ,  JACOBS, Johannes, Henricus, Wilhelmus ,  KOK, Haico ,  VAN DE VIJVER, Yuri ,  VAN DE WAL, Johannes ,  KNARREN, Bastiaan ,  VOOGD, Robbert Jan ,  WESTERLAKEN, Jan, Steven, Christiaan ,  VAN DE RIJDT, Hans ,  KOOIKER, Eelco ,  HURKENS-MERTENS, Wilhelmina Margareta Jozef ,  TEILLET, Yohann, Bruno, Yvon

IPC: G03F7/20

CPC classification number: G03F7/7085 ,  G03F7/70341 ,  G03F7/70666 ,  G03F7/70858 ,  G03F7/70891

Abstract: A sensor (100) for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid (11) is arranged so that the thermal resistance of a first heat path from a transducer (104) of the sensor to a temperature conditioning device (107) is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.

Abstract translation: 用于浸没式光刻设备中并且在使用中与浸液（11）接触的传感器（100）被布置成使得来自第一传感器（104）的第一热路的热阻 温度调节装置（107）的传感器小于从换能器到浸液的第二热流路的热阻。 因此，热流优先朝向温度调节装置，而不是浸没液体，使得浸没液体中的温度引起的干扰减小或最小化。

公开(公告)号：WO2014005780A1

公开(公告)日：2014-01-09

申请号：PCT/EP2013/061560

申请日：2013-06-05

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： WESTERLAKEN, Jan, ,  BLOKS, Ruud ,  DELMASTRO, Peter ,  LAURENT, Thibault ,  LEENDERS, Martinus ,  SCHUSTER, Mark ,  WARD, Christopher ,  VAN BOXTEL, Frank

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70916 ,  G03F7/70933

Abstract: A lithographic apparatus has a support structure (MT) configured to support a patterning device (MA), the patterning device serving to pattern a radiation beam (B) according to a desired pattern and having a planar main surface (12) through which the radiation beam passes; an outlet opening (100) configured to direct a flow of a gas onto the patterning device; and an inlet opening (150) configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.

Abstract translation: 光刻设备具有被配置为支撑图案形成装置（MA）的支撑结构（MT），所述图案形成装置用于根据期望的图案对辐射束（B）进行图案化，并具有平面的主表面（12），辐射 光束通过 出口开口（100），其构造成将气体流引导到图案形成装置上; 以及入口开口（150），其构造成抽出已经离开出口的气体，其中出口开口和入口开口面对面向图案形成装置的平面主表面的面对的表面。

公开(公告)号：WO2013178438A1

公开(公告)日：2013-12-05

申请号：PCT/EP2013/059437

申请日：2013-05-07

Applicant: ASML NETHERLANDS B.V.

Inventor： LAURENT, Thibault ,  BLOKS, Ruud ,  CORTIE, Rogier ,  HOUBEN, Martijn ,  JACOBS, Johannes ,  LAFARRE, Raymond ,  LEMPENS, Han ,  OVERKAMP, Jim ,  PIETERSE, Gerben ,  POLET, Theodorus ,  SIMONS, Wilhelmus ,  STEFFENS, Koen ,  TROMP, Siegfried ,  VY, Van Vuong

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70716 ,  G03F7/70875 ,  G03F7/7095 ,  H01L21/682

Abstract: An object table (WT) to support an object (W), the object table having a support body (100), an object holder (30) to hold an object, an opening (5) adjacent an edge of the object holder, and a channel (16) in fluid communication with the opening via a passageway (14), wherein the channel is defined by a first material which is different to a second material defining the passageway.

Abstract translation: 用于支撑物体（W）的物体台（WT），所述物体台具有支撑体（100），用于保持物体的物体保持器（30），与所述物体保持器的边缘相邻的开口（5），以及 经由通道（14）与所述开口流体连通的通道（16），其中所述通道由与限定所述通道的第二材料不同的第一材料限定。

公开(公告)号：EP2856261B1

公开(公告)日：2020-11-11

申请号：EP13721703.0

申请日：2013-05-07

Applicant: ASML Netherlands B.V.

Inventor： LAURENT, Thibault ,  BLOKS, Ruud ,  CORTIE, Rogier ,  HOUBEN, Martijn ,  JACOBS, Johannes ,  LAFARRE, Raymond ,  LEMPENS, Han ,  OVERKAMP, Jim ,  PIETERSE, Gerben ,  POLET, Theodorus ,  SIMONS, Wilhelmus ,  STEFFENS, Koen ,  TROMP, Siegfried ,  VY, Van Vuong

IPC: G03F7/20

公开(公告)号：EP2856261A1

公开(公告)日：2015-04-08

申请号：EP13721703.0

申请日：2013-05-07

Applicant: ASML Netherlands B.V.

Inventor： LAURENT, Thibault ,  BLOKS, Ruud ,  CORTIE, Rogier ,  HOUBEN, Martijn ,  JACOBS, Johannes ,  LAFARRE, Raymond ,  LEMPENS, Han ,  OVERKAMP, Jim ,  PIETERSE, Gerben ,  POLET, Theodorus ,  SIMONS, Wilhelmus ,  STEFFENS, Koen ,  TROMP, Siegfried ,  VY, Van Vuong

IPC: G03F7/20

Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.

Abstract translation: 一种用于支撑物体的物体表，具有支撑体的物体表，用于保持物体的物体保持器，邻近物体保持器的边缘的开口以及经由通道与开口流体连通的通道，其中通道 由与限定通道的第二材料不同的第一材料限定。