公开(公告)号：WO2022184578A1

公开(公告)日：2022-09-09

申请号：PCT/EP2022/054790

申请日：2022-02-25

Applicant: ASML NETHERLANDS B.V.

Inventor： SER, Jung Hoon ,  PARK, Sungwoon ,  LEI, Xin ,  JEONG, Jinwoong ,  ZHAO, Rongkuo ,  HSU, Duan-Fu, Stephen ,  LI, Xiaoyang

IPC: G03F1/70 ,  G03F7/20

Abstract: Methods for configuring a patterning process based on results of another patterning process is described. The method includes obtaining a first set of contours by simulating a first patterning process using a design layout in a first orientation. The contours satisfy a design specification associated with the design layout and correspond to a first set of process window conditions. A second patterning process is configured based on a second orientation of the design layout, the first set of process window conditions and first set of contours. The second patterning process is associated with one or more design variables (e.g., source, mask) that affect a second set of contours. The configuring includes adjusting one or more design variables until the second set of contours are within a desired matching threshold with the first set of contours.

公开(公告)号：WO2020002143A1

公开(公告)日：2020-01-02

申请号：PCT/EP2019/066446

申请日：2019-06-21

Applicant: ASML NETHERLANDS B.V.

Inventor： HSU, Duan-Fu, Stephen ,  HENNERKES, Christoph, Rene, Konrad, Cebulla ,  HOWELL, Rafael C. ,  SHI, Zhan ,  LI, Xiaoyang ,  STAALS, Frank

IPC: G03F7/20

Abstract: Described herein is a method for determining a wavefront of a patterning apparatus of a patterning process. The method includes obtaining a reference performance (e.g., a contour, EPE, CD) of a reference apparatus (e.g., a scanner), a lens model of a patterning apparatus configured to convert a wavefront parameter of a wavefront to actuator movements, and a lens fingerprint of a tuning scanner (e.g., a to-be-matched scanner). Further, the method involves determining the wavefront parameter (e.g., wavefront parameters such as tilt, offset, etc.) based on the lens fingerprint of the tuning scanner, the lens model, and a cost function, wherein the cost function is a difference between the reference performance and a tuning scanner performance.

公开(公告)号：WO2018077787A1

公开(公告)日：2018-05-03

申请号：PCT/EP2017/076972

申请日：2017-10-23

Applicant: ASML NETHERLANDS B.V.

Inventor： HSU, Duan-Fu, Stephen ,  LI, Xiaoyang

IPC: G03F1/70 ,  G06F17/50 ,  G03F7/20 ,  G03F1/00 ,  G03F1/36

Abstract: A method for optimizing a patterning device pattern, the method including: obtaining an initial design pattern having a plurality of polygons; causing at least some of the polygons to be effectively connected with each other; placing evaluation features outside the boundaries of the polygons; and creating a patterning device pattern spanning across the connected polygons based on the evaluation features.

Abstract translation: 一种用于优化图案形成装置图案的方法，所述方法包括：获得具有多个多边形的初始设计图案; 使至少一些多边形彼此有效连接; 将评估特征放置在多边形的边界之外; 并根据评估特征创建跨越连接多边形的图案形成装置图案。