公开(公告)号：WO2021224009A1

公开(公告)日：2021-11-11

申请号：PCT/EP2021/060403

申请日：2021-04-21

Applicant: ASML NETHERLANDS B.V.

Inventor： ZWIER, Olger, Victor ,  VAN DER SCHAAR, Maurits ,  BOS, Hilko, Dirk ,  VAN DER LAAN, Hans ,  AL ARIF, S. M. Masudur Rahman ,  VAN BUEL, Henricus, Wilhelmus, Maria ,  KOOLEN, Armand, Eugene, Albert ,  CALADO, Victor, Emanuel ,  BHATTACHARYYA, Kaustuve ,  LIAN, Jin ,  GOORDEN, Sebastianus, Adrianus ,  LIM, Hui Quan

IPC: G01N21/47 ,  G01N21/95 ,  G01N21/956 ,  G03F1/42 ,  G03F7/20 ,  G03F9/00

Abstract: Disclosed is a substrate and associated patterning device. The substrate comprises at least one target arrangement suitable for metrology of a lithographic process, the target arrangement comprising at least one pair of similar target regions which are arranged such that the target arrangement is, or at least the target regions for measurement in a single direction together are, centrosymmetric. A metrology method is also disclosed for measuring the substrate. A metrology method is also disclosed comprising which comprises measuring such a target arrangement and determining a value for a parameter of interest from the scattered radiation, while correcting for distortion of the metrology apparatus used.

公开(公告)号：WO2022223230A1

公开(公告)日：2022-10-27

申请号：PCT/EP2022/057659

申请日：2022-03-23

Applicant: ASML NETHERLANDS B.V.

Inventor： LIAN, Jin ,  KOOLEN, Armand, Eugene, Albert ,  GOORDEN, Sebastianus, Adrianus ,  LIM, Hui Quan

IPC: G03F7/20

Abstract: Disclosed is a method of determining a correction for a measurement of a target and an associated apparatus. The measurement is subject to a target-dependent correction parameter which has a dependence the target and/or a stack on which the target is comprised. The method comprises obtaining first measurement data relating to a measurement of a fiducial target, said first measurement data comprising at least a first and second set of intensity parameter values; and second measurement data relating to a measurement of the fiducial target, the second measurement data comprising a third set of intensity parameter values. A target-invariant correction parameter is determined from said first measurement data and second measurement data, the target-invariant correction parameter being a component of the target-dependent correction parameter which is not dependent on the target and/or a stack; and the correction is determined from said target-invariant correction parameter.

公开(公告)号：WO2022135962A1

公开(公告)日：2022-06-30

申请号：PCT/EP2021/085058

申请日：2021-12-09

Applicant: ASML NETHERLANDS B.V.

Inventor： KOOLEN, Armand, Eugene, Albert ,  MATHIJSSEN, Simon, Gijsbert, Josephus ,  LIM, Hui Quan ,  ANDERSON, Amanda, Elizabeth

IPC: G03F7/20

Abstract: Disclosed is a method of measuring a target on a substrate comprising: illuminating a target with measurement radiation comprising at least a first wavelength, collecting the resultant scattered radiation within a collection numerical aperture; and determining a parameter of interest from said scattered radiation. The target comprises a mediator periodic structure and at least a first target periodic structure each in a respective different layer on the substrate, wherein a pitch of at least the mediator periodic structure is below a single diffraction limit defined by the collection numerical aperture and a wavelength of said measurement radiation, such that said scattered radiation comprises double diffracted radiation, said double diffracted radiation comprising radiation having undergone two sequential same-order diffractions of opposite sign.

公开(公告)号：EP4020084A1

公开(公告)日：2022-06-29

申请号：EP20216398.6

申请日：2020-12-22

Applicant: ASML Netherlands B.V.

Inventor： KOOLEN, Armand, Eugene, Albert ,  MATHIJSSEN, Simon, Gijsbert, Josephus ,  LIM, Hui Quan ,  ANDERSON, Amanda, Elizabeth

IPC: G03F7/20

Abstract: Disclosed is a method of measuring a target on a substrate comprising: illuminating a target with measurement radiation comprising at least a first wavelength, collecting the resultant scattered radiation within a collection numerical aperture; and determining a parameter of interest from said scattered radiation. The target comprises a mediator periodic structure and at least a first target periodic structure each in a respective different layer on the substrate, wherein a pitch of at least the mediator periodic structure is below a single diffraction limit defined by the collection numerical aperture and a wavelength of said measurement radiation, such that said scattered radiation comprises double diffracted radiation, said double diffracted radiation comprising radiation having undergone two sequential same-order diffractions of opposite sign.