公开(公告)号：WO2019211083A1

公开(公告)日：2019-11-07

申请号：PCT/EP2019/059477

申请日：2019-04-12

Applicant: ASML NETHERLANDS B.V.

Inventor： DE GRAAF, Dennis ,  BEAUDRY, Richard ,  BIRON, Maxime ,  JANSSEN, Paul ,  KATER, Thijs ,  KORNELSEN, Kevin ,  KUIJKEN, Michael, Alfred, Josephus ,  KUNTZEL, Jan, Hendrik, Willem ,  MARTEL, Stephane ,  NASALEVICH, Maxim, Aleksandrovich ,  SALMASO, Guido ,  VAN ZWOL, Pieter-Jan

IPC: G03F1/62 ,  G03F7/20

Abstract: A wafer comprising a mask on one face and at least one layer on the opposite face, wherein the mask comprises at least one scribeline which overlies at least a portion of the opposite face which is substantially free of the at least one layer is described. Also described is a method of preparing a pellicle comprising the steps of: providing a wafer comprising a mask on one face and at least one layer on the opposite face, defining a scribeline in the mask, and selectively removing a portion of the at least one layer which at least partially overlies the scribeline as well as a method of preparing a pellicle comprising the steps of: providing a pellicle core, and removing at least some material from at least one face of the pellicle core in a non-oxidising environment. In any aspect, the pellicle may comprise a metal nitride layer.

公开(公告)号：EP3788442A1

公开(公告)日：2021-03-10

申请号：EP19716199.5

申请日：2019-04-12

Applicant: ASML Netherlands B.V.

Inventor： DE GRAAF, Dennis ,  BEAUDRY, Richard ,  BIRON, Maxime ,  JANSSEN, Paul ,  KATER, Thijs ,  KORNELSEN, Kevin ,  KUIJKEN, Michael, Alfred, Josephus ,  KUNTZEL, Jan, Hendrik, Willem ,  MARTEL, Stephane ,  NASALEVICH, Maxim, Aleksandrovich ,  SALMASO, Guido ,  VAN ZWOL, Pieter-Jan

IPC: G03F1/62 ,  G03F7/20