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公开(公告)号：WO2019211083A1
公开(公告)日：2019-11-07
申请号：PCT/EP2019/059477
申请日：2019-04-12
Applicant: ASML NETHERLANDS B.V.
Inventor： DE GRAAF, Dennis , BEAUDRY, Richard , BIRON, Maxime , JANSSEN, Paul , KATER, Thijs , KORNELSEN, Kevin , KUIJKEN, Michael, Alfred, Josephus , KUNTZEL, Jan, Hendrik, Willem , MARTEL, Stephane , NASALEVICH, Maxim, Aleksandrovich , SALMASO, Guido , VAN ZWOL, Pieter-Jan
Abstract: A wafer comprising a mask on one face and at least one layer on the opposite face, wherein the mask comprises at least one scribeline which overlies at least a portion of the opposite face which is substantially free of the at least one layer is described. Also described is a method of preparing a pellicle comprising the steps of: providing a wafer comprising a mask on one face and at least one layer on the opposite face, defining a scribeline in the mask, and selectively removing a portion of the at least one layer which at least partially overlies the scribeline as well as a method of preparing a pellicle comprising the steps of: providing a pellicle core, and removing at least some material from at least one face of the pellicle core in a non-oxidising environment. In any aspect, the pellicle may comprise a metal nitride layer.
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Patent Agency Ranking
公开(公告)号：WO2023025511A1
公开(公告)日：2023-03-02
申请号：PCT/EP2022/071251
申请日：2022-07-28
Applicant: ASML NETHERLANDS B.V.
Inventor： AGRICOLA, Franciscus, Theodorus , FERRE LLIN, Lourdes , DE GRAAF, Dennis , ANDE, Chaitanya Krishna , DONMEZ NOYAN, Inci , SI, Fai Tong , VAN DER WOORD, Ties, Wouter , ROLLIER, Anne-Sophie , BIRON, Maxime , GIESBERS, Adrianus, Johannes, Maria
Abstract: A pellicle membrane for a lithographic apparatus, wherein the pellicle membrane comprises metal silicide and a reinforcing network. The reinforcing network can be located between metal silicide layers. The reinforcing network can be irregular. The reinforcing network includes windows with a maximum dimension of up to 20 microns. The reinforcing network includes windows having an average size of at least 5 microns.
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公开(公告)号：WO2021018777A1
公开(公告)日：2021-02-04
申请号：PCT/EP2020/070973
申请日：2020-07-24
Applicant: ASML NETHERLANDS B.V.
Inventor： JANSSEN, Paul , BIRON, Maxime , DONMEZ NOYAN, Inci , FERRE LLIN, Lourdes , GIESBERS, Adrianus, Johannes, Maria , KLOOTWIJK, Johan, Hendrik , KUNTZEL, Jan, Hendrik, Willem , NOTENBOOM, Arnoud, Willem , ROLLIER, Anne-Sophie , VAN DER WOORD, Ties, Wouter , VAN ZWOL, Pieter-Jan
Abstract: A method of manufacturing a pellicle membrane, the method comprising: providing a first sacrificial layer on a planar substrate to form a stack; and providing, to at least a portion of the stack, at least one metal silicide or doped metal silicide pellicle core layer which forms at least part of the pellicle membrane is described. Also described is a pellicle membrane assembly comprising a substrate, a first sacrificial layer, and at least one metal silicide or doped metal silicide pellicle layer which forms at least part of a pellicle core, as well as a lithography apparatus comprising such pellicles.
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公开(公告)号：EP4392825A1
公开(公告)日：2024-07-03
申请号：EP22758444.8
申请日：2022-07-28
Applicant: ASML Netherlands B.V.
Inventor： AGRICOLA, Franciscus, Theodorus , FERRE LLIN, Lourdes , DE GRAAF, Dennis , ANDE, Chaitanya Krishna , DONMEZ NOYAN, Inci , SI, Fai Tong , VAN DER WOORD, Ties, Wouter , ROLLIER, Anne-Sophie , BIRON, Maxime , GIESBERS, Adrianus, Johannes, Maria
CPC classification number: G03F1/62 , G03F7/70983
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公开(公告)号：EP4004647A1
公开(公告)日：2022-06-01
申请号：EP20743705.4
申请日：2020-07-24
Applicant: ASML Netherlands B.V.
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公开(公告)号：EP3788442A1
公开(公告)日：2021-03-10
申请号：EP19716199.5
申请日：2019-04-12
Applicant: ASML Netherlands B.V.
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