公开(公告)号：WO2019211083A1

公开(公告)日：2019-11-07

申请号：PCT/EP2019/059477

申请日：2019-04-12

Applicant: ASML NETHERLANDS B.V.

Inventor： DE GRAAF, Dennis ,  BEAUDRY, Richard ,  BIRON, Maxime ,  JANSSEN, Paul ,  KATER, Thijs ,  KORNELSEN, Kevin ,  KUIJKEN, Michael, Alfred, Josephus ,  KUNTZEL, Jan, Hendrik, Willem ,  MARTEL, Stephane ,  NASALEVICH, Maxim, Aleksandrovich ,  SALMASO, Guido ,  VAN ZWOL, Pieter-Jan

IPC: G03F1/62 ,  G03F7/20

Abstract: A wafer comprising a mask on one face and at least one layer on the opposite face, wherein the mask comprises at least one scribeline which overlies at least a portion of the opposite face which is substantially free of the at least one layer is described. Also described is a method of preparing a pellicle comprising the steps of: providing a wafer comprising a mask on one face and at least one layer on the opposite face, defining a scribeline in the mask, and selectively removing a portion of the at least one layer which at least partially overlies the scribeline as well as a method of preparing a pellicle comprising the steps of: providing a pellicle core, and removing at least some material from at least one face of the pellicle core in a non-oxidising environment. In any aspect, the pellicle may comprise a metal nitride layer.

公开(公告)号：WO2019091932A1

公开(公告)日：2019-05-16

申请号：PCT/EP2018/080219

申请日：2018-11-06

Applicant: ASML NETHERLANDS B.V.

Inventor： HOUWELING, Zomer, Silvester ,  ANDE, Chaitanya Krishna ,  DE GRAAF, Dennis ,  KATER, Thijs ,  KUIJKEN, Michael, Alfred, Josephus ,  VALEFI, Mahdiar

IPC: G03F1/62 ,  G03F1/64 ,  G03F7/20

Abstract: A pellicle comprising a metal oxysilicide layer. Also disclosed in a pellicle comprising a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. Also disclosed is a method of manufacturing a pellicle for a lithographic apparatus, said method comprising: providing a metal oxysilicide layer, a lithographic assembly (LA) comprising a pellicle (15) comprising a metal oxysilicide layer, and the use of a pellicle comprising a metal oxysilicide layer in a lithographic apparatus.

公开(公告)号：EP3707557A1

公开(公告)日：2020-09-16

申请号：EP18796950.6

申请日：2018-11-06

Applicant: ASML Netherlands B.V.

Inventor： HOUWELING, Zomer Silvester ,  ANDE, Chaitanya Krishna ,  DE GRAAF, Dennis ,  KATER, Thijs ,  KUIJKEN, Michael Alfred Josephus ,  VALEFI, Mahdiar

IPC: G03F1/62 ,  G03F1/64 ,  G03F7/20

公开(公告)号：EP3788442A1

公开(公告)日：2021-03-10

申请号：EP19716199.5

申请日：2019-04-12

Applicant: ASML Netherlands B.V.

Inventor： DE GRAAF, Dennis ,  BEAUDRY, Richard ,  BIRON, Maxime ,  JANSSEN, Paul ,  KATER, Thijs ,  KORNELSEN, Kevin ,  KUIJKEN, Michael, Alfred, Josephus ,  KUNTZEL, Jan, Hendrik, Willem ,  MARTEL, Stephane ,  NASALEVICH, Maxim, Aleksandrovich ,  SALMASO, Guido ,  VAN ZWOL, Pieter-Jan

IPC: G03F1/62 ,  G03F7/20