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公开(公告)号：WO2020078721A1
公开(公告)日：2020-04-23
申请号：PCT/EP2019/076667
申请日：2019-10-02
Applicant: ASML NETHERLANDS B.V.
Inventor： VAN ZWOL, Pieter-Jan , BALTUSSEN, Sander , DE GRAAF, Dennis , FRANKEN, Johannes, Christiaan, Leonardus , GIESBERS, Adrianus, Johannes, Maria , KLEIN, Alexander, Ludwig , KLOOTWIJK, Johan, Hendrik , KNAPEN, Peter, Simon, Antonius , KURGANOVA, Evgenia , KUZNETSOV, Alexey, Sergeevich , NOTENBOOM, Arnoud, Willem , VALEFI, Mahdiar , VAN DE KERKHOF, Marcus, Adrianus , VAN DEN EINDEN, Wilhelmus, Theodorus, Anthonius, Johannes , VAN DER WOORD, Ties, Wouter , WONDERGEM, Hendrikus, Jan , ZDRAVKOV, Aleksandar, Nikolov
Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising: at least one membrane layer supported by a planar substrate, wherein the planar substrate comprises an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate, wherein the step of selectively removing the inner region of the planar substrate comprises using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer; such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border comprising the border region of the planar substrate and the first sacrificial layer situated between the border and the membrane layer.
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公开(公告)号：WO2019211083A1
公开(公告)日：2019-11-07
申请号：PCT/EP2019/059477
申请日：2019-04-12
Applicant: ASML NETHERLANDS B.V.
Inventor： DE GRAAF, Dennis , BEAUDRY, Richard , BIRON, Maxime , JANSSEN, Paul , KATER, Thijs , KORNELSEN, Kevin , KUIJKEN, Michael, Alfred, Josephus , KUNTZEL, Jan, Hendrik, Willem , MARTEL, Stephane , NASALEVICH, Maxim, Aleksandrovich , SALMASO, Guido , VAN ZWOL, Pieter-Jan
Abstract: A wafer comprising a mask on one face and at least one layer on the opposite face, wherein the mask comprises at least one scribeline which overlies at least a portion of the opposite face which is substantially free of the at least one layer is described. Also described is a method of preparing a pellicle comprising the steps of: providing a wafer comprising a mask on one face and at least one layer on the opposite face, defining a scribeline in the mask, and selectively removing a portion of the at least one layer which at least partially overlies the scribeline as well as a method of preparing a pellicle comprising the steps of: providing a pellicle core, and removing at least some material from at least one face of the pellicle core in a non-oxidising environment. In any aspect, the pellicle may comprise a metal nitride layer.
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公开(公告)号：WO2017102379A1
公开(公告)日：2017-06-22
申请号：PCT/EP2016/079594
申请日：2016-12-02
Applicant: ASML NETHERLANDS B.V.
Inventor： VAN ZWOL, Pieter-Jan , DE GRAAF, Dennis , JANSSEN, Paul , PÉTER, Mária , VAN DE KERKHOF, Marcus, Adrianus , VAN DER ZANDE, Willem, Joan , VLES, David, Ferdinand , VOORTHUIJZEN, Willem-Pieter
CPC classification number: G03F1/24 , G03F1/62 , G03F7/70916 , G03F7/70983
Abstract: A membrane for EUV lithography, the membrane having a thickness of no more than 200 nm and comprising a stack comprising: at least one silicon layer; and at least one silicon compound layer made of a compound of silicon and an element selected from the group consisting of boron, phosphorous, bromine
Abstract translation: 一种用于EUV光刻的膜，所述膜具有不大于200nm的厚度并且包括叠层，所述叠层包括：至少一个硅层; 以及至少一个由硅化合物和选自由硼，磷，溴组成的组中的元素构成的硅化合物层，
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公开(公告)号：WO2023025511A1
公开(公告)日：2023-03-02
申请号：PCT/EP2022/071251
申请日：2022-07-28
Applicant: ASML NETHERLANDS B.V.
Inventor： AGRICOLA, Franciscus, Theodorus , FERRE LLIN, Lourdes , DE GRAAF, Dennis , ANDE, Chaitanya Krishna , DONMEZ NOYAN, Inci , SI, Fai Tong , VAN DER WOORD, Ties, Wouter , ROLLIER, Anne-Sophie , BIRON, Maxime , GIESBERS, Adrianus, Johannes, Maria
Abstract: A pellicle membrane for a lithographic apparatus, wherein the pellicle membrane comprises metal silicide and a reinforcing network. The reinforcing network can be located between metal silicide layers. The reinforcing network can be irregular. The reinforcing network includes windows with a maximum dimension of up to 20 microns. The reinforcing network includes windows having an average size of at least 5 microns.
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公开(公告)号：WO2019091932A1
公开(公告)日：2019-05-16
申请号：PCT/EP2018/080219
申请日：2018-11-06
Applicant: ASML NETHERLANDS B.V.
Inventor： HOUWELING, Zomer, Silvester , ANDE, Chaitanya Krishna , DE GRAAF, Dennis , KATER, Thijs , KUIJKEN, Michael, Alfred, Josephus , VALEFI, Mahdiar
Abstract: A pellicle comprising a metal oxysilicide layer. Also disclosed in a pellicle comprising a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. Also disclosed is a method of manufacturing a pellicle for a lithographic apparatus, said method comprising: providing a metal oxysilicide layer, a lithographic assembly (LA) comprising a pellicle (15) comprising a metal oxysilicide layer, and the use of a pellicle comprising a metal oxysilicide layer in a lithographic apparatus.
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Patent Agency Ranking
公开(公告)号：WO2016124536A2
公开(公告)日：2016-08-11
申请号：PCT/EP2016/052055
申请日：2016-02-01
Applicant: ASML NETHERLANDS B.V.
Inventor： BROUNS, Derk, Servatius, Gertruda , DE GRAAF, Dennis , DE KRUIF, Robertus, Cornelis, Martinus , JANSSEN, Paul , KRUIZINGA, Matthias , NOTENBOOM, Arnoud, Willem , SMITH, Daniel, Andrew , VERBRUGGE, Beatrijs, Louise, Marie-Joseph, Katrien , WILEY, James, Norman
Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.
Abstract translation: 一种方法，包括以下步骤：接收包括掩模和由防护薄膜框架保持的可去除EUV透明防护薄膜组件的掩模组件，使用检查工具从掩模中去除防护薄膜框架和EUV透明防护薄膜，以检查掩模上的掩模图案， 随后将由防护薄膜组件框架保持的EUV透明防护薄膜组件附接到掩模。 该方法还可以包括以下步骤：在从掩模移除防护薄膜组件框架和EUV透明防护薄膜组件之后，将掩模框架固定在保护由检查工具的检查梁基本透明的材料形成的替代防护薄膜组件 ; 并且在使用检查工具检查掩模上的掩模图案之后，将由替代的防护薄膜框架保持的替代防护薄膜组件从掩模中取出，以便将由防护膜框架保持的EUV透明防护薄膜组件附着到掩模上。
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公开(公告)号：WO2014075881A1
公开(公告)日：2014-05-22
申请号：PCT/EP2013/072124
申请日：2013-10-23
Applicant: ASML NETHERLANDS B.V.
Inventor： SCHIMMEL, Hendrikus , RIEPEN, Michel , JILISEN, Rene , DE GRAAF, Dennis
IPC: H05G2/00
CPC classification number: G03F7/70058 , G03F7/70033 , G03F7/70916 , H05G2/005 , H05G2/006 , H05G2/008
Abstract: A radiation source suitable for providing radiation to a lithographic apparatus generates radiation from a plasma (12) generated from a fuel (31) within an enclosure comprising a gas. The plasma generates primary fuel debris collected as a fuel layer on a debris-receiving surface ((33a), (33b)). The debris-receiving surface is heated to a temperature to maintain the fuel layer as a liquid, and to provide a reduced or zero rate of formation gas bubbles within the liquid fuel layer in order to reduce contamination of optical surfaces (14) by secondary debris arising from gas bubble eruption from the liquid fuel layer. Additionally or alternatively, the radiation source may have a debris receiving surface positioned and/or oriented such that substantially all lines normal to the debris receiving surface do not intersect an optically active surface of the radiation source.
Abstract translation: 适于向光刻设备提供辐射的辐射源产生从包括气体的外壳内的燃料（31）产生的等离子体（12）的辐射。 等离子体产生作为燃料层收集的碎屑接收表面（（33a），（33b））上的主要燃料碎片。 碎片接收表面被加热到一个温度以将燃料层保持为液体，并且在液体燃料层内提供降低或零速率的地层气泡，以便减少光学表面（14）由二次碎屑的污染 来自液体燃料层的气泡喷发。 附加地或替代地，辐射源可以具有定位和/或定向的碎片接收表面，使得基本上所有垂直于碎片接收表面的线不与辐射源的光学活性表面相交。
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公开(公告)号：WO2013029898A1
公开(公告)日：2013-03-07
申请号：PCT/EP2012/064793
申请日：2012-07-27
Applicant: ASML Netherlands B.V. , KEMPEN, Antonius , LOOPSTRA, Erik , RENTROP, Corne , DE GRAAF, Dennis , GUBBELS, Frits , HAYES, Gregory, Richard , VAN DE WIEL, Hubertus, Johannes
Inventor： KEMPEN, Antonius , LOOPSTRA, Erik , RENTROP, Corne , DE GRAAF, Dennis , GUBBELS, Frits , HAYES, Gregory, Richard , VAN DE WIEL, Hubertus, Johannes
CPC classification number: H05G2/008 , G03F7/70033 , G03F7/70916 , H05G2/005 , H05G2/006
Abstract: A radiation source having a nozzle configured to direct a stream of fuel droplets along a trajectory towards a plasma formation location, a laser configured to direct laser radiation at the fuel droplets at the plasma formation location to generate, in use, a radiation generating plasma. The nozzle has an internal surface that is configured to prevent contamination present in fuel used to form the fuel droplets from being deposited on that internal surface.
Abstract translation: 一种具有喷嘴的辐射源，所述喷嘴被配置为沿着轨迹朝向等离子体形成位置引导燃料液滴流;激光器，被配置为将等离子体形成位置处的燃料液滴处的激光辐射引导，以在使用中产生辐射产生等离子体。 喷嘴具有内表面，其被构造成防止存在于用于形成燃料液滴的燃料中的污染物沉积在该内表面上。
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公开(公告)号：EP3391138A1
公开(公告)日：2018-10-24
申请号：EP16805430.2
申请日：2016-12-02
Applicant: ASML Netherlands B.V.
Inventor： VAN ZWOL, Pieter-Jan , DE GRAAF, Dennis , JANSSEN, Paul , PÉTER, Mária , VAN DE KERKHOF, Marcus Adrianus , VAN DER ZANDE, Willem Joan , VLES, David Ferdinand , VOORTHUIJZEN, Willem-Pieter
CPC classification number: G03F1/24 , G03F1/62 , G03F7/70916 , G03F7/70983
Abstract: A membrane for EUV lithography, the membrane having a thickness of no more than 200 nm and comprising a stack comprising: at least one silicon layer; and at least one silicon compound layer made of a compound of silicon and an element selected from the group consisting of boron, phosphorous, bromine
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公开(公告)号：EP3254157A2
公开(公告)日：2017-12-13
申请号：EP16702142.7
申请日：2016-02-01
Applicant: ASML Netherlands B.V.
Inventor： BROUNS, Derk Servatius Gertruda , DE GRAAF, Dennis , DE KRUIF, Robertus Cornelis Martinus , JANSSEN, Paul , KRUIZINGA, Matthias , NOTENBOOM, Arnoud Willem , SMITH, Daniel Andrew , VERBRUGGE, Beatrijs Louise Marie-Joseph Katrien , WILEY, James Norman
Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.
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