公开(公告)号：WO2013160026A2

公开(公告)日：2013-10-31

申请号：PCT/EP2013/055662

申请日：2013-03-19

Applicant: ASML NETHERLANDS B.V.

Inventor： WILKLOW, Ronald ,  SCHMITZ, Roger ,  NOTENBOOM, Arnoud ,  WILL, Manon, Elise

IPC: G03F7/20

CPC classification number: G03F7/70708 ,  G03F7/70875 ,  H01L21/6831

Abstract: An electrostatic clamp configured to hold an object, the electrostatic clamp comprising an electrode, a resistive portion formed from a resistive material located on the electrode, and a dielectric portion formed from a dielectric material located on the resistive portion.

Abstract translation: 构造成保持物体的静电夹具，所述静电夹具包括电极，由位于所述电极上的电阻材料形成的电阻部分和由位于所述电阻部分上的电介质材料形成的电介质部分。

公开(公告)号：WO2014114395A1

公开(公告)日：2014-07-31

申请号：PCT/EP2013/075619

申请日：2013-12-05

Applicant: ASML NETHERLANDS B.V.

Inventor： KLOMP, Petrus ,  MERTENS, Bastiaan ,  NOTENBOOM, Arnoud

IPC: G03F7/20

CPC classification number: G03F7/70708 ,  H01L21/6831 ,  H01L21/6833 ,  H01L21/6875 ,  H02N13/00

Abstract: An electrostatic clamp (12) comprising an electrode (2), a layer of resistive material (6) located on the electrode, and a layer of dielectric (8) located on the resistive material, wherein the electrostatic clamp further comprises burls (10) which project from the layer of dielectric.

Abstract translation: 包括电极（2），位于电极上的电阻材料层（6）和位于电阻材料上的电介质层（8）的静电夹（12），其中静电夹具还包括孔（10） 该工程从电介质层开始。

公开(公告)号：WO2013050243A1

公开(公告)日：2013-04-11

申请号：PCT/EP2012/068386

申请日：2012-09-19

Applicant: ASML NETHERLANDS B.V.

Inventor： GILISSEN, Noud ,  LOOPSTRA, Erik ,  SIJBEN, Anko ,  CORNELISSEN, Bas ,  VAN SCHOOT, Jan ,  NOTENBOOM, Arnoud ,  VAN DER WILK, Ronald

IPC: G03F7/20

CPC classification number: G03F7/70708 ,  G03F7/707 ,  G03F7/70875 ,  G03F7/70908 ,  G10L15/08 ,  G10L2015/223 ,  H01L21/6831

Abstract: A chuck, chuck control system, lithographic apparatus and method of using a chuck are disclosed. In an embodiment, there is provided a chuck (43) for use in holding a patterning device (MA) or a substrate (W) onto a supporting table (MT, WT) of a lithography apparatus (100) by electrostatic force, in which the patterning device is for imparting a radiation beam (B) with a pattern in its cross-section to form a patterned radiation beam, and the substrate is for receiving the patterned radiation beam; said chuck comprising: a dielectric member (45); a temperature conditioning fluid channel (48) formed within the chuck; a drive electrode (40, 42) for applying a potential difference between the drive electrode and the patterning device or substrate across the dielectric member in order to electrostatically attract the patterning device or substrate towards the drive electrode; and a first shield electrode (60) for reducing or preventing the development of an electric field across temperature conditioning fluid in the temperature conditioning fluid channel due to a voltage applied to the drive electrode, in order to reduce or prevent electrolysis in the fluid.

Abstract translation: 公开了一种卡盘，卡盘控制系统，光刻设备和使用卡盘的方法。 在一个实施例中，提供了一种用于通过静电力将图案形成装置（MA）或基板（W）保持在光刻设备（100）的支撑台（MT，WT）上的卡盘，其中 图案形成装置用于在其横截面中赋予具有图案的辐射束（B）以形成图案化的辐射束，并且该衬底用于接收图案化的辐射束; 所述卡盘包括：电介质构件（45）; 形成在卡盘内的温度调节流体通道（48） 用于在驱动电极和图案形成装置或基板之间跨越电介质构件施加电位差的驱动电极（40,42），以便静电地将图案形成装置或衬底吸引到驱动电极; 以及第一屏蔽电极（60），用于减少或防止由于施加到驱动电极的电压而在温度调节流体通道中的温度调节流体的电场的发展，以便减少或防止流体中的电解。

公开(公告)号：EP2764408A1

公开(公告)日：2014-08-13

申请号：EP12766409.2

申请日：2012-09-19

Applicant: ASML Netherlands B.V.

Inventor： GILISSEN, Noud ,  SIJBEN, Anko ,  CORNELISSEN, Bas ,  NOTENBOOM, Arnoud ,  VAN DER WILK, Ronald ,  SCHMITZ, Roger, Wilhelmus, Antonius, Henricus ,  WILL, Manon, Elise

IPC: G03F7/20

CPC classification number: G03F7/70708 ,  G03F7/707 ,  G03F7/70875 ,  G03F7/70908 ,  G10L15/08 ,  G10L2015/223 ,  H01L21/6831

Abstract: A chuck, chuck control system, lithographic apparatus and method of using a chuck are disclosed. In an embodiment, there is provided a chuck (43) for use in holding a patterning device (MA) or a substrate (W) onto a supporting table (MT, WT) of a lithography apparatus (100) by electrostatic force, in which the patterning device is for imparting a radiation beam (B) with a pattern in its cross-section to form a patterned radiation beam, and the substrate is for receiving the patterned radiation beam; said chuck comprising: a dielectric member (45); a temperature conditioning fluid channel (48) formed within the chuck; a drive electrode (40, 42) for applying a potential difference between the drive electrode and the patterning device or substrate across the dielectric member in order to electrostatically attract the patterning device or substrate towards the drive electrode; and a first shield electrode (60) for reducing or preventing the development of an electric field across temperature conditioning fluid in the temperature conditioning fluid channel due to a voltage applied to the drive electrode, in order to reduce or prevent electrolysis in the fluid.

公开(公告)号：EP2764408B1

公开(公告)日：2019-08-21

申请号：EP12766409.2

申请日：2012-09-19

Applicant: ASML Netherlands B.V.

Inventor： GILISSEN, Noud ,  SIJBEN, Anko ,  CORNELISSEN, Bas ,  NOTENBOOM, Arnoud ,  VAN DER WILK, Ronald ,  SCHMITZ, Roger, Wilhelmus, Antonius, Henricus ,  WILL, Manon, Elise

IPC: G03F7/20

公开(公告)号：EP2948818A1

公开(公告)日：2015-12-02

申请号：EP13799323.4

申请日：2013-12-05

Applicant: ASML Netherlands B.V.

Inventor： KLOMP, Petrus ,  MERTENS, Bastiaan ,  NOTENBOOM, Arnoud

IPC: G03F7/20

CPC classification number: G03F7/70708 ,  H01L21/6831 ,  H01L21/6833 ,  H01L21/6875 ,  H02N13/00

Abstract: An electrostatic clamp (12) comprising an electrode (2), a layer of resistive material (6) located on the electrode, and a layer of dielectric (8) located on the resistive material, wherein the electrostatic clamp further comprises burls (10) which project from the layer of dielectric.

Abstract translation: 一种静电夹持装置，包括电极，位于电极上的电阻材料层和位于电阻材料上的电介质层，其中静电夹持装置还包括凸起， 哪个项目来自电介质层。