公开(公告)号：WO2013029879A1

公开(公告)日：2013-03-07

申请号：PCT/EP2012/064452

申请日：2012-07-24

Applicant: ASML NETHERLANDS B.V. ,  BLEEKER, Arno ,  LOOPSTRA, Erik ,  VAN DER SCHOOT, Harmen ,  PHILIPS, Danny ,  BEERENS, Ruud

Inventor： BLEEKER, Arno ,  LOOPSTRA, Erik ,  VAN DER SCHOOT, Harmen ,  PHILIPS, Danny ,  BEERENS, Ruud

IPC: G03F7/20

CPC classification number: G03F7/70641 ,  G03F7/7005 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70308 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70825

Abstract: A lithographic apparatus having a programmable patterning device and a projection system. The programmable patterning device is configured to provide a plurality of radiation beams. The projection system has a lens group array configured to project the plurality of radiation beams onto a substrate. The projection system further includes a focus adjuster in an optical path corresponding to a lens group of the lens group array. The focus adjuster has an optical element having substantially zero optical power.

Abstract translation: 一种具有可编程图案形成装置和投影系统的光刻设备。 可编程图案形成装置被配置为提供多个辐射束。 投影系统具有配置成将多个辐射束投影到基板上的透镜组阵列。 投影系统还包括对应于透镜组阵列的透镜组的光路中的焦点调节器。 焦点调节器具有基本上为零光功率的光学元件。

公开(公告)号：WO2013152877A1

公开(公告)日：2013-10-17

申请号：PCT/EP2013/051800

申请日：2013-01-30

Applicant: ASML NETHERLANDS B.V.

Inventor： BLEEKER, Arno ,  CASTENMILLER, Thomas ,  DE JAGER, Pieter ,  MULDER, Heine ,  ZAAL, Koen ,  CADEE, Theodorus Petrus Maria ,  PHILIPS, Danny ,  BEERENS, Ruud ,  TIMMERMANS, Roger

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/20 ,  G03F7/7005 ,  G03F7/70075 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70366 ,  G03F7/70383 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70425 ,  G03F7/70475

Abstract: A projection system, configured to project a radiation beam onto a target, includes a rotatable frame (8) configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction. Provisions are made to prevent moments to be exerted on the lens held by the rotatable frame.

Abstract translation: 被配置为将辐射束投影到目标上的投影系统包括可旋转的框架（8），其被配置为围绕限定切线方向和径向方向的轴线旋转，其中可旋转框架保持配置成将辐射束聚焦在 只有切向或径向; 以及固定部分，其包括基本上固定的透镜，其被配置为仅将所述辐射束聚焦在所述切向或径向方向中的另一个中。 作出规定以防止由可旋转框架保持的镜片施加力矩。