公开(公告)号：WO2014202585A2

公开(公告)日：2014-12-24

申请号：PCT/EP2014/062691

申请日：2014-06-17

Applicant: ASML NETHERLANDS B.V.

Inventor： NIKIPELOV, Andrey ,  FRIJNS, Olav ,  DE VRIES, Gosse ,  LOOPSTRA, Erik ,  BANINE, Vadim ,  DE JAGER, Pieter ,  DONKER, Rilpho ,  NIENHUYS, Han-Kwang ,  KRUIZINGA, Borgert ,  ENGELEN, Wouter ,  LUITEN, Otger ,  AKKERMANS, Johannes ,  GRIMMINCK, Leonardus ,  LITVINENKO, Vladimir

IPC: H01S3/09

CPC classification number: G03F7/70033 ,  G01J1/0407 ,  G01J1/0418 ,  G01J1/26 ,  G01J1/429 ,  G02B1/06 ,  G02B5/205 ,  G02B26/023 ,  G03F7/70008 ,  G03F7/7055 ,  G03F7/70558 ,  G03F7/7085 ,  G21K1/10 ,  H01S3/005 ,  H01S3/0085 ,  H01S3/0903 ,  H05H7/04

Abstract: A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.

Abstract translation: 一种图案化平版印刷基板的方法，所述方法包括使用自由电子激光器产生EUV辐射并将EUV辐射传送到将EUV辐射投影到平版印刷基板上的光刻设备，其中所述方法还包括减少EUV辐射的功率波动 通过使用基于反馈的控制回路来监测自由电子激光器并相应地调整自由电子激光器的操作而被传送到光刻基片。

公开(公告)号：WO2011104180A1

公开(公告)日：2011-09-01

申请号：PCT/EP2011/052408

申请日：2011-02-18

Applicant: ASML NETHERLANDS B.V. ,  VAN ZWET, Erwin ,  DE JAGER, Pieter ,  ONVLEE, Johannes ,  FRITZ, Erik

Inventor： VAN ZWET, Erwin ,  DE JAGER, Pieter ,  ONVLEE, Johannes ,  FRITZ, Erik

IPC: G03F7/20

CPC classification number: G03F7/704 ,  G03F7/70275 ,  G03F7/70391

Abstract: The invention relates to a lithographic apparatus comprising one or more optical columns capable of projecting a beam on a target portion on a substrate held by the substrate support. The one or more optical columns may comprise one or more self-emissive contrast devices to emit the beam. The optical column may comprise a projection system to project the beam onto the target portion. The target portion has a height in a scanning direction of the substrate and a tangential width mainly perpendicular to the scanning direction, wherein a scanning speed of the substrate in the scanning direction divided by the height substantially corresponds with a rotating speed of the optical column or a part thereof divided by the tangential width of the target portion.

Abstract translation: 本发明涉及一种光刻设备，包括一个或多个能够将光束投射在由基板支撑件保持的基板上的目标部分上的光学柱。 一个或多个光学柱可以包括一个或多个发射光束的自发射对比度装置。 光学柱可以包括将光束投影到目标部分上的投影系统。 目标部分具有基板的扫描方向的高度和主要垂直于扫描方向的切线宽度，其中基板沿扫描方向除以高度的扫描速度基本上对应于光学柱的转速或 其一部分除以目标部分的切线宽度。

公开(公告)号：WO2015067467A1

公开(公告)日：2015-05-14

申请号：PCT/EP2014/072588

申请日：2014-10-22

Applicant: ASML NETHERLANDS B.V.

Inventor： AKKERMANS, Johannes, ,  AMENT, Lucas ,  BANINE, Vadim ,  COENEN, Teis, Johan ,  DE JAGER, Pieter ,  DE VRIES, Gosse ,  FRIJNS, Olav ,  GRIMMINCK, Leonardus ,  KATALENIC, Andelko ,  LOOPSTRA, Erik ,  LUITEN, Otger ,  NIKIPELOV, Andrey

IPC: H01S3/09 ,  H05H9/00 ,  H01J25/12 ,  H01J23/027 ,  H05H7/12

CPC classification number: H01S3/0903 ,  G03F7/70208 ,  H01J23/027 ,  H01J25/10 ,  H05H9/00

Abstract: A free electron laser comprising: an electron source (21), a linear accelerator (22), an undulator (26), electron beam optics and a deceleration unit (28'). The electron source is operable to produce a bunched electron beam. The linear accelerator arranged to impart energy to electrons in the bunched electron beam produced by the electron source. The undulator is operable to produce a periodic magnetic field and is arranged so as to guide the bunched electron beam along a periodic path about a central axis of the undulator such that they interact with radiation in the undulator, stimulating emission of coherent radiation. The electron beam optics is arranged to direct the bunched electron beam back into the linear accelerator after it leaves the undulator so as to extract energy from electrons in the bunched electron beam. The deceleration unit is arranged to extract energy from electrons in the bunched electron beam after it has left the undulator. The deceleration unit comprises one or more resonant cavities (33), and an energy dissipation mechanism. The bunched electron beam is directed through the one or more resonant cavities so as to excite one or more resonant standing wave modes therein.

Abstract translation: 一种自由电子激光器，包括：电子源（21），线性加速器（22），波动器（26），电子束光学器件和减速单元（28'）。 电子源可操作以产生聚束电子束。 线性加速器被布置成赋予由电子源产生的聚束电子束中的电子能量。 波动器可操作以产生周期性磁场，并且被布置成引导聚束电子束沿着围绕波动器的中心轴线的周期性路径，使得它们与波动器中的辐射相互作用，刺激相干辐射的发射。 电子束光学器件被布置成在聚束束电子束离开波束器之后将聚束电子束引导回线性加速器，以便从束电子束中的电子提取能量。 减速单元被布置成在束状电子束离开波动器之后从电子束中的电子提取能量。 减速单元包括一个或多个谐振腔（33）和能量耗散机构。 聚束电子束被引导通过一个或多个谐振腔，以激发其中的一个或多个共振驻波模式。

公开(公告)号：WO2011104178A1

公开(公告)日：2011-09-01

申请号：PCT/EP2011/052406

申请日：2011-02-18

Applicant: ASML NETHERLANDS B.V. ,  ONVLEE, Johannes ,  DE JAGER, Pieter ,  VAN ZWET, Erwin

Inventor： ONVLEE, Johannes ,  DE JAGER, Pieter ,  VAN ZWET, Erwin

IPC: G03F7/20

CPC classification number: G03F7/704 ,  G03F7/70383 ,  G03F7/70391

Abstract: A lithographic apparatus including an optical column configured to project a beam on a target portion of a substrate is disclosed. A focus controller is provided to control the focus position (906, 920, 924, 930) of the optical column with respect to a reference object, wherein the focus controller comprises a focus measurement device (942) configured to determine a focus quality on the reference object (938), and a focus actuator configured to adjust the focus position of the optical column on the basis of the determined focus quality.

Abstract translation: 公开了一种光刻设备，其包括被配置为将光束投射在基板的目标部分上的光学列。 提供聚焦控制器以相对于参考对象来控制光学列的聚焦位置（906,920,924,930），其中焦点控制器包括焦点测量装置（942），其被配置为确定在第 参考物体（938），以及焦点致动器，其被配置为基于所确定的聚焦质量来调节光学列的聚焦位置。

公开(公告)号：WO2011104173A1

公开(公告)日：2011-09-01

申请号：PCT/EP2011/052401

申请日：2011-02-18

Applicant: ASML NETHERLANDS B.V. ,  ONVLEE, Johannes ,  DE JAGER, Pieter ,  VAN ZWET, Erwin

Inventor： ONVLEE, Johannes ,  DE JAGER, Pieter ,  VAN ZWET, Erwin

IPC: G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70475 ,  G03F7/70258 ,  G03F7/70275 ,  G03F7/70391 ,  G03F7/704

Abstract: A lithographic apparatus includes two or more optical columns configured to project a beam on a target portion of a substrate, each of the two or more optical columns including one or more radiation sources (906) to provide the beam, and a projection system (920, 924, 930) to project the beam onto the target portion; a scanning movement actuator configured to move the substrate with a scanning speed in a scanning direction with respect to the two or more optical columns; and two or more position measurement devices (944) configured to determine a position of the respective two or more optical columns with respect to a reference object (940).

Abstract translation: 光刻设备包括两个或更多个光学柱，其配置成将光束投影到基板的目标部分上，两个或更多个光柱中的每一个包括一个或多个辐射源（906）以提供光束，以及投影系统（920 ，924,930）将光束投影到目标部分上; 扫描移动致动器，被配置为相对于所述两个或更多个光学柱在扫描方向上以扫描速度移动所述基板; 以及两个或更多个位置测量装置（944），其被配置为确定相对于参考对象（940）的相应的两个或更多个光学列的位置。

公开(公告)号：WO2011104172A1

公开(公告)日：2011-09-01

申请号：PCT/EP2011/052400

申请日：2011-02-18

Applicant: ASML NETHERLANDS B.V. ,  ONVLEE, Johannes ,  DE JAGER, Pieter ,  VAN ZWET, Erwin

Inventor： ONVLEE, Johannes ,  DE JAGER, Pieter ,  VAN ZWET, Erwin

IPC: G03F7/20

CPC classification number: G03F7/7085 ,  G03F7/70275 ,  G03F7/70366 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70516 ,  G03F7/70558

Abstract: The invention relates to a lithographic apparatus comprising an optical column capable of creating a pattern on a target portion of the substrate. The optical column may be provided with a self-emissive contrast device configured to emit a beam and a projection system configured to project the beam onto the target portion. The apparatus may be provided with an actuator to move the optical column or a part thereof with respect to the substrate. An optical sensor device is provided which is movable in respect of the optical columns and has a range of movement which enables the optical sensor device (936) to move through a projection area (940) of each of the optical columns to measure a beam of each of the optical columns.

Abstract translation: 本发明涉及一种光刻设备，其包括能够在基板的目标部分上产生图案的光学柱。 光学柱可以设置有被配置为发射光束的自发射对比度装置和被配置为将光束投射到目标部分上的投影系统。 该装置可以设置有致动器，以相对于基板移动光学柱或其一部分。 提供了一种光学传感器装置，其可相对于光学柱移动，并且具有使得光学传感器装置（936）能够移动通过每个光学列的投影区域（940）的移动范围，以测量光束 每个光学柱。

公开(公告)号：WO2013152877A1

公开(公告)日：2013-10-17

申请号：PCT/EP2013/051800

申请日：2013-01-30

Applicant: ASML NETHERLANDS B.V.

Inventor： BLEEKER, Arno ,  CASTENMILLER, Thomas ,  DE JAGER, Pieter ,  MULDER, Heine ,  ZAAL, Koen ,  CADEE, Theodorus Petrus Maria ,  PHILIPS, Danny ,  BEERENS, Ruud ,  TIMMERMANS, Roger

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/20 ,  G03F7/7005 ,  G03F7/70075 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70366 ,  G03F7/70383 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70425 ,  G03F7/70475

Abstract: A projection system, configured to project a radiation beam onto a target, includes a rotatable frame (8) configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction. Provisions are made to prevent moments to be exerted on the lens held by the rotatable frame.

Abstract translation: 被配置为将辐射束投影到目标上的投影系统包括可旋转的框架（8），其被配置为围绕限定切线方向和径向方向的轴线旋转，其中可旋转框架保持配置成将辐射束聚焦在 只有切向或径向; 以及固定部分，其包括基本上固定的透镜，其被配置为仅将所述辐射束聚焦在所述切向或径向方向中的另一个中。 作出规定以防止由可旋转框架保持的镜片施加力矩。

公开(公告)号：WO2011104177A1

公开(公告)日：2011-09-01

申请号：PCT/EP2011/052405

申请日：2011-02-18

Applicant: ASML NETHERLANDS B.V. ,  VAN ZWET, Erwin ,  DE JAGER, Pieter ,  ONVLEE, Johannes ,  Fritz, Erik

Inventor： VAN ZWET, Erwin ,  DE JAGER, Pieter ,  ONVLEE, Johannes ,  Fritz, Erik

IPC: G03F7/20 ,  G02B7/02

CPC classification number: G03F7/70891 ,  G02B7/028 ,  G03F7/70391 ,  G03F7/704

Abstract: The invention relates to a lithographic apparatus with a substrate table constructed to hold a substrate and an optical column 924, 930) capable of creating a pattern on a target portion of the substrate. The apparatus has an actuator (928) to move the optical column or part thereof with respect to the substrate. The movement of the optical column or part thereof through a medium causes a heat load on the optical column or part thereof. The apparatus is constructed or operated to reduce the influence of the heat load on the operation of the apparatus.

Abstract translation: 本发明涉及一种光刻设备，其具有用于保持基板的基板台和能够在基板的目标部分上产生图案的光学柱924,930。 该装置具有致动器（928），用于相对于基板移动光学柱或其一部分。 光学柱或其部分通过介质的移动导致光学柱或其一部分上的热负荷。 该装置被构造或操作以减少热负荷对装置的操作的影响。

公开(公告)号：WO2011104175A1

公开(公告)日：2011-09-01

申请号：PCT/EP2011/052403

申请日：2011-02-18

Applicant: ASML Netherlands B.V. ,  VAN ZWET ,  DE JAGER, Pieter ,  ONVLEE, Johannes ,  FRITZ, Erik ,  DEKKER, Albert ,  P. F. SPIERDIJK, Johannus ,  DE MAN, Hendrik

Inventor： DE JAGER, Pieter ,  ONVLEE, Johannes ,  FRITZ, Erik ,  DEKKER, Albert ,  P. F. SPIERDIJK, Johannus ,  DE MAN, Hendrik

IPC: G03F7/20

CPC classification number: G03F7/704 ,  G03F7/70258 ,  G03F7/70391

Abstract: The invention relates to a lithographic apparatus comprising an optical column capable of creating a pattern on a target portion of a substrate. The optical column may be provided with a self emissive contrast device configured to emit beam and a projection system configured to project the beam onto the target portion. The apparatus may be provided with an actuator to move the optical column or a part thereof with respect to the substrate. The projection system further comprises an adjustable member (936) to adjust a position of at least one lens (930) of the movable optical column or part thereof in respect of the movable optical column or part thereof.

Abstract translation: 本发明涉及一种光刻设备，其包括能够在基板的目标部分上产生图案的光学柱。 光学柱可以设置有被配置为发射光束的自发射对比度装置和被配置为将光束投影到目标部分上的投影系统。 该装置可以设置有致动器，以相对于基板移动光学柱或其一部分。 投影系统还包括可调节构件（936），用于相对于可移动光学柱或其一部分来调节可移动光学柱或其部分的至少一个透镜（930）的位置。

公开(公告)号：WO2011098325A2

公开(公告)日：2011-08-18

申请号：PCT/EP2011/050600

申请日：2011-02-02

Applicant: ASML NETHERLANDS B.V. ,  VAN ZWET, Erwin ,  DE JAGER, Pieter ,  ONVLEE, Johannes ,  FRITZ, Erik

Inventor： VAN ZWET, Erwin ,  DE JAGER, Pieter ,  ONVLEE, Johannes ,  FRITZ, Erik

IPC: G03F7/20

CPC classification number: G03F7/70366 ,  G03F7/70275 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70491 ,  G03F7/70883

Abstract: A lithographic apparatus comprising an optical column capable of creating a pattern on a target portion of a substrate is disclosed. The optical column may have a self emissive contrast device configured to emit a beam, and a projection system configured to project the beam onto the target portion. The apparatus may also have an actuator to move the optical column or a part thereof with respect to the substrate. The apparatus may be constructed to reduce the optical effect of density variation in a medium around the moving part of the optical column on the beam.

Abstract translation: 公开了一种包括能够在基板的目标部分上形成图案的光学柱的光刻设备。 光学柱可以具有被配置为发射光束的自发射对比度装置，以及被配置为将光束投影到目标部分上的投影系统。 该装置还可以具有致动器以相对于基板移动光学柱或其一部分。 该装置可以被构造成减小在光束上的光学柱的移动部分周围的介质中的密度变化的光学效应。