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    LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND ASSOCIATED DATA PROCESSING APPARATUS AND COMPUTER PROGRAM PRODUCT
    1.
    发明申请
    LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND ASSOCIATED DATA PROCESSING APPARATUS AND COMPUTER PROGRAM PRODUCT 审中-公开
    平面设备，设备制造方法和相关数据处理设备和计算机程序产品

    公开(公告)号：WO2016008647A1

    公开(公告)日：2016-01-21

    申请号：PCT/EP2015/062846

    申请日：2015-06-09

    Applicant: ASML NETHERLANDS B.V.

    Inventor： BOGAART, Erik, Willem

    IPC: G03F9/00 ,  G03F7/20

    CPC classification number: G03F7/70525 ,  G03F7/70508 ,  G03F7/70633 ,  G03F9/7026 ,  G03F9/7034 ,  G03F9/7088

    Abstract: A lithographic apparatus includes a number of sensors for measuring positions of features on a substrate prior to applying a pattern. Each sensor comprises an imaging optical system. Position measurements are extracted from pixel data supplied by an image detector in each sensor. The imaging optical system includes one or more light field modulating elements and the processor processes said pixel data as a light-field image to extract said position measurements. The data processor may derive from each light-field image a focused image of a feature on the substrate, measuring positions of several features simultaneously, even though the substrate is not at the same level below all the sensors. The processor can also include corrections to reduce depth dependency of an apparent position of the feature include a viewpoint correction. The data processor can also derive measurements of heights of features on the substrate.

    Abstract translation: 光刻设备包括多个传感器，用于在施加图案之前测量基板上特征的位置。 每个传感器包括成像光学系统。 从每个传感器中的图像检测器提供的像素数据中提取位置测量。 成像光学系统包括一个或多个光场调制元件，并且处理器将所述像素数据处理为光场图像以提取所述位置测量。 数据处理器可以从每个光场图像导出基板上的特征的聚焦图像，同时测量几个特征的位置，即使基板在所有传感器下方都不在相同的水平。 处理器还可以包括校正以减少特征的视在位置的深度依赖性，包括视点校正。 数据处理器还可以导出衬底上特征的高度的测量。

    A RADIATION SOURCE
    3.
    发明申请
    A RADIATION SOURCE 审中-公开
    辐射源

    公开(公告)号：WO2016058746A1

    公开(公告)日：2016-04-21

    申请号：PCT/EP2015/070109

    申请日：2015-09-03

    Applicant: ASML NETHERLANDS B.V.

    Inventor： FRANKEN, Johannes, Christiaan, Leonardus ,  NIKIPELOV, Andrey, ,  SEROGLAZOV, Pavel ,  VAN SCHOOT, Jan, Bernard, Plechelmus ,  VANDERHALLEN, Ivo ,  YAKUNIN, Andrei, Mikhailovich ,  BOGAART, Erik, Willem ,  ZHAO, Chuangxin ,  VELTMAN, Robertus, Wilhelmus ,  JILISEN, Reinier, Theodorus, Martinus

    IPC: G03F7/20 ,  H05G2/00 ,  G21K1/04 ,  H01J37/32

    CPC classification number: G03F7/70916 ,  G03F7/70033 ,  G03F7/70041 ,  G03F7/70983 ,  G21K1/043 ,  H05G2/005 ,  H05G2/008

    Abstract: A radiation source (SO), which is operable to produce pulses of radiation, comprises: a wall (9,21) with an aperture (8,22); a radiation collector; a rotatable shield (200); and a drive mechanism (230) arranged to rotate the shield about a rotation axis (222). The radiation source may be a laser produced plasma source. The radiation collector is arranged to direct pulses of radiation along an optical axis of the radiation collector and focus the pulses of radiation at an intermediate focus, said optical axis passing through the aperture and said intermediate focus being in the vicinity of the aperture. The shield comprises a body (210) with one or more openings, said one or more openings forming a passageway extending through the body. The drive mechanism is arranged to rotate the shield such that the passageway is intermittently aligned with the aperture as each pulse of radiation reaches the shield to allow the pulses of radiation to pass through the aperture in the wall, and the body at least partially covers the aperture in between consecutive pulses of radiation. The rotation axis of the shield is generally perpendicular to the optical axis of the radiation collector.

    Abstract translation: 可操作以产生辐射脉冲的辐射源（SO）包括：具有孔径（8,22）的壁（9,21）; 辐射收集器 可旋转护罩（200）; 以及驱动机构（230），布置成围绕旋转轴线（222）旋转屏蔽件。 辐射源可以是激光产生的等离子体源。 辐射收集器被布置成沿着辐射收集器的光轴引导辐射脉冲，并将辐射脉冲聚焦在中间焦点处，所述光轴穿过孔径并且所述中间焦点在孔附近。 屏蔽包括具有一个或多个开口的主体（210），所述一个或多个开口形成延伸穿过主体的通道。 驱动机构被布置成旋转屏蔽件，使得当辐射的每个脉冲到达屏蔽件时，通道间歇地对准孔，以允许辐射脉冲通过壁中的孔，并且该主体至少部分地覆盖 连续的辐射脉冲之间的孔径。 屏蔽的旋转轴线大致垂直于辐射收集器的光轴。

    RADIATION SYSTEM
    5.
    发明申请
    RADIATION SYSTEM 审中-公开
    辐射系统

    公开(公告)号：WO2016139055A2

    公开(公告)日：2016-09-09

    申请号：PCT/EP2016/053216

    申请日：2016-02-16

    Applicant: ASML NETHERLANDS B.V.

    Inventor： NIENHUYS, Han-Kwang ,  BOGAART, Erik, Willem ,  DONKER, Rilpho, Ludovicus ,  KRUIZINGA, Borgert ,  LOOPSTRA, Erik, Roelof ,  BOTMA, Hako ,  DE VRIES, Gosse, Charles ,  FRIJNS, Olav, Waldemar, Vladimir ,  BASELMANS, Johannes, Jacobus, Matheus

    IPC: G03F7/20

    CPC classification number: G03F7/70191 ,  G02B5/0221 ,  G02B5/0268 ,  G02B5/0284 ,  G03F7/70025 ,  G03F7/7005 ,  G03F7/70075 ,  G03F7/70991 ,  H01S3/2308 ,  H05G2/008

    Abstract: A radiation system comprising a beam splitting apparatus configured to receive a main radiation beam and split the main radiation beam into a plurality of branch radiation beams and a radiation alteration device arranged to receive an input radiation beam and output a modified radiation beam, wherein the radiation alteration device is configured to provide an output modified radiation beam which has an increased etendue, when compared to the received input radiation beam, wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a main radiation beam and the radiation alteration device is configured to provide a modified main radiation beam to the beam splitting apparatus, or wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a branch radiation beam output from the beam splitting apparatus.

    Abstract translation: 包括配置成接收主辐射束并将主辐射束分成多个分支辐射束的分束装置和配置成接收输入辐射束并输出辐射的辐射改变装置的辐射系统， 修改的辐射束，其中所述辐射改变装置被配置为提供输出的改进的辐射束，所述输出的改进的辐射束在与所接收的输入辐射束相比时具有增加的集光率，其中所述辐射改变装置被布置成使得所接收的输入辐射束 通过所述辐射改变装置是主辐射束并且所述辐射改变装置被配置为向所述分束装置提供改变的主辐射束，或者其中所述辐射改变装置被设置成使得由所述辐射接收的所述输入辐射束 改变装置是从分束装置输出的分支辐射束。

    METHOD AND APPARATUS FOR MEASURING ASYMMETRY OF A MICROSTRUCTURE, POSITION MEASURING METHOD, POSITION MEASURING APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    7.
    发明申请
    METHOD AND APPARATUS FOR MEASURING ASYMMETRY OF A MICROSTRUCTURE, POSITION MEASURING METHOD, POSITION MEASURING APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
    用于测量微结构不对称的方法和装置，位置测量方法，位置测量装置，平面设备和装置制造方法

    公开(公告)号：WO2014026819A2

    公开(公告)日：2014-02-20

    申请号：PCT/EP2013/065069

    申请日：2013-07-17

    Applicant: ASML NETHERLANDS B.V.

    Inventor： MATHIJSSEN, Simon, Gijsbert, Josephus ,  BOGAART, Erik, Willem ,  TINNEMANS, Patricius Aloysius Jacobus ,  DEN BOEF, Arie, Jeffrey

    IPC: G03F9/00

    CPC classification number: G01B11/14 ,  G01B9/02 ,  G01B11/27 ,  G03F7/70058 ,  G03F7/70625 ,  G03F7/70633 ,  G03F9/7069 ,  G03F9/7088

    Abstract: A lithographic apparatus includes an alignment sensor including a self-referencing interferometer for reading the position of an alignment target comprising a periodic structure. An illumination optical system for focusing radiation into a spot on said structure. An asymmetry detection optical system receives a share of positive and negative orders of radiation diffracted by the periodic structure, and forms first and second images of said spot on first and second detectors respectively, wherein said negative order radiation is used to form the first image and said positive order radiation is used to form the second image. A processor for processing together signals from said first and second detectors representing intensities of said positive and negative orders to produce a measurement of asymmetry in the periodic structure. The asymmetry measurement can be used to improve accuracy of the position read by the alignment sensor.

    Abstract translation: 光刻设备包括对准传感器，其包括用于读取包括周期性结构的对准目标位置的自参考干涉仪。 一种照明光学系统，用于将辐射聚焦到所述结构上的光斑中。 不对称检测光学系统接收通过周期性结构衍射的辐射的正数和负数的共享，并分别在第一和第二检测器上形成所述光斑的第一和第二图像，其中所述负序辐射用于形成第一图像， 所述正阶辐射用于形成第二图像。 用于处理来自所述第一和第二检测器的信号的处理器，其表示所述正序和负序的强度，以产生周期性结构中的不对称性的测量。 可以使用不对称测量来提高由对准传感器读取的位置的精度。

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