公开(公告)号：WO2023016738A1

公开(公告)日：2023-02-16

申请号：PCT/EP2022/069567

申请日：2022-07-13

Applicant: ASML NETHERLANDS B.V.

Inventor： GUAN, Tiannan ,  HUANG, Zhuangxiong ,  ENGELEN, Johannes, Bernardus, Charles ,  NAKIBOGLU, Günes ,  KRUIZINGA, Matthias ,  VAN GILS, Petrus, Jacobus, Maria ,  TRALLI, Aldo ,  DE VRIES, Sjoerd, Frans ,  TEUNISSEN, Marcel, Maria, Cornelius, Franciscus ,  BRULS, Richard, Joseph ,  VAN DER MEULEN, Frits

IPC: G03F7/20 ,  H01L21/683

Abstract: The invention relates to an electrostatic holder comprising: a body, and a clamping element attached to the body, said clamping element comprising an electrode for applying an attractive force between the clamping element and a first to be clamped object, wherein an outer edge of the body is configured to provide a gap between the outer edge of the body and the first to be clamped object, which gap is configured for outputting a fluid for reducing dust particles reaching the first to be clamped object or a second to be clamped object on an opposite side of the holder.

公开(公告)号：WO2017097502A1

公开(公告)日：2017-06-15

申请号：PCT/EP2016/076352

申请日：2016-11-02

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN SOMMEREN, Daan, Daniel, Johannes, Antonius ,  BALTIS, Coen, Hubertus, Matheus ,  BUDDENBERG, Harold, Sebastiaan ,  GATTOBIGIO, Giovanni, Luca ,  MELMAN, Johannes, Cornelis, Paulus ,  NAKIBOGLU, Günes ,  POLET, Theodorus, Wilhelmus ,  STALS, Walter, Theodorus, Matheus ,  VAN DE VIJVER, Yuri, Johannes, Gabriël ,  VAN LIESHOUT, Josephus, Peter ,  VIEYRA SALAS, Jorge, Alberto ,  ZDRAVKOV, Aleksandar, Nikolov

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70716

Abstract: A substrate table (WT) configured to support a substrate (W) for exposure in an immersion lithographic apparatus, the substrate table comprising: a support body (30) having a support surface (31) configured to support the substrate; and a cover ring (130) fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface (60); wherein at least a portion (61) of the upper surface is configured so as to alter the stability of a meniscus (17) of immersion liquid when moving along the upper surface towards the substrate.

Abstract translation: 一种衬底台（WT），其被配置为支撑用于在浸没式光刻设备中曝光的衬底（W），所述衬底台包括：具有支撑表面（31）的支撑体（30），所述支撑体（30） 支撑基材; 以及盖环（130），其相对于所述支撑体固定并且构造成在平面图中包围支撑在所述支撑表面上的所述基板，其中所述盖环具有上表面（60）; 其中所述上表面的至少一部分（61）被构造成当沿着所述上表面朝向所述衬底移动时改变浸没液体的弯液面（17）的稳定性。

公开(公告)号：WO2015185320A1

公开(公告)日：2015-12-10

申请号：PCT/EP2015/060096

申请日：2015-05-07

Applicant: ASML NETHERLANDS B.V.

Inventor： NAKIBOGLU, Günes ,  BAGGEN, Mark, Constant, Johannes ,  BOOGAARD, Gerard, Johannes ,  COX, Henrikus, Herman, Marie ,  KEMPER, Nicolaas, Rudolf ,  KERSSEMAKERS, Sander ,  RIJS, Robertus, Mathijs, Gerardus ,  VAN BOXTEL, Frank, Johannes, Jacobus ,  VAN DEN BOOGAERT, Erwin, Antonius, Henricus, Franciscus ,  VAN DER WIJST, Marc, Wilhelmus, Maria ,  VAN DUIJNHOVEN, Martinus ,  VERDONSCHOT, Jessica, Henrica, Anna

IPC: G03F7/20

CPC classification number: G03F7/709 ,  G10K11/16 ,  G10K11/168 ,  G10K11/172

Abstract: A lithographic apparatus has a compartment which accommodates a movable object. Movements of the movable object cause acoustic disturbances in the compartment. An acoustic damper is arranged to damp the acoustic disturbances in the compartment and comprises a chamber (100) in communication with the compartment and a perforated plate (101), having a plurality of through-holes (102), between the chamber and the compartment.

Abstract translation: 光刻设备具有容纳可移动物体的隔间。 可移动物体的运动引起隔室中的声学干扰。 声阻尼器布置成阻尼隔室中的声学干扰，并且包括与隔室连通的腔室（100）和多孔板（101），其具有多个通孔（102），位于腔室和隔间 。

公开(公告)号：WO2022223220A1

公开(公告)日：2022-10-27

申请号：PCT/EP2022/057476

申请日：2022-03-22

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DE MEERENDONK, Remco ,  DIRECKS, Daniel, Jozef, Maria ,  NAKIBOGLU, Günes ,  WATERSON, Nicholas, Peter ,  KLUGKIST, Joost, André ,  PEKELDER, Sven ,  VAN DER NET, Antonius, Johannus ,  JACOBS, Johannes, Henricus, Wilhelmus ,  OUDES, Jaap ,  JANSSEN, Gerardus, Arnoldus, Hendricus, Franciscus ,  VAN LIPZIG, Jeroen, Peterus, Johannes ,  VAN SANTVOORT, Johannes, Franciscus, Martinus

IPC: G03F7/20 ,  H01L21/67

Abstract: The invention provides a temperature conditioning system using conditioning liquid to condition a temperature of an object, comprising a conditioning conduit, a return conduit, a supply chamber, and a discharge chamber wherein the temperature conditioning system is arranged to provide a static pressure difference between the supply chamber outlet and the discharge chamber inlet to create a flow through the conditioning conduit. A lithography apparatus and a method of temperature conditioning an object is also described.

公开(公告)号：WO2020164868A1

公开(公告)日：2020-08-20

申请号：PCT/EP2020/051355

申请日：2020-01-21

Applicant: ASML NETHERLANDS B.V.

Inventor： DE HOOGH, Joost ,  NAKIBOGLU, Günes ,  SCHMITZ, Roger, Wilhelmus, Antonius, Henricus ,  VAN DE MOESDIJK, Remco, Yuri ,  KÖK, Yücel ,  TALEBAN FARD, Nafiseh

IPC: G03F7/20

Abstract: A device comprising a compartment, said compartment comprising a wafer stage configured to hold a semiconductor wafer on a clamp, wherein the wafer stage is configured to follow a route within the compartment in operational use, the device comprising: a first component having a first surface facing a first portion of the route; a second component having a second surface facing a second portion of the route; a thermal control system operative to maintain a first temperature of the first surface and a second temperature of the second surface at a common set-point magnitude.

公开(公告)号：WO2018065222A1

公开(公告)日：2018-04-12

申请号：PCT/EP2017/073847

申请日：2017-09-21

Applicant: ASML NETHERLANDS B.V.

Inventor： NAKIBOGLU, Günes ,  WILL, Manon, Elise ,  DERKS, Sander, Catharina, Reinier ,  MOLLEN, Johannes, Wilhelmus

IPC: G03F7/20 ,  G03F9/00

Abstract: A method of performing a lithographic exposure of a substrate, the substrate being held on a substrate table, the substrate table comprising a cooling system operative to cool the substrate table, the method comprising performing an alignment measurement of the substrate, applying heat to the substrate table to reduce cooling of the substrate table provided by the cooling system, the heat being applied between a time at which the alignment measurement is performed and a time at which the lithographic exposure is performed and performing the lithographic exposure of the substrate.

Abstract translation: 一种执行衬底的光刻曝光的方法，所述衬底保持在衬底台上，所述衬底台包括可操作以冷却所述衬底台的冷却系统，所述方法包括执行 所述基板将热量施加到所述基板台以减少由所述冷却系统提供的所述基板台的冷却，所述热量在执行所述对准测量的时间与执行所述光刻曝光的时间之间施加，并且执行所述光刻 曝光基板。

公开(公告)号：WO2017109040A1

公开(公告)日：2017-06-29

申请号：PCT/EP2016/082317

申请日：2016-12-22

Applicant: ASML NETHERLANDS B.V.

Inventor： BERENDSEN, Christianus, Wilhelmus, Johannes ,  NAKIBOGLU, Günes ,  VAN SOMMEREN, Daan, Daniel, Johannes, Antonius ,  RISPENS, Gijsbert ,  BECKERS, Johan, Franciscus, Maria ,  RENCKENS, Theodorus, Johannes, Antonius

IPC: G03F7/16 ,  G03F7/20

CPC classification number: G03F7/2028 ,  G03F7/168

Abstract: The present invention provides a method of processing a substrate comprising: providing a substrate with a layer of photosensitive material on a surface of the substrate; and removing photosensitive material from around an outer edge of the layer of photosensitive material, and controlling the removing so as to generate an edge, having a radial width, around the layer of photosensitive material remaining on the surface of the substrate, wherein the photosensitive material varies in thickness forming a thickness profile across the radial width and the removing is controlled so as to generate variation in the thickness profile along the length of the edge, and/or wherein the removing is controlled so as to generate a rough edge around the layer of photosensitive material remaining on the surface of the substrate.

Abstract translation: 本发明提供了一种处理基板的方法，包括：在基板的表面上提供具有光敏材料层的基板; 以及从感光材料层的外边缘周围去除感光材料，并且控制该去除以便在保留在基板表面上的感光材料层周围产生具有径向宽度的边缘，其中感光材料 厚度变化形成横跨径向宽度的厚度轮廓，并且控制去除以沿着边缘的长度产生厚度轮廓的变化，和/或其中控制去除以便围绕层产生粗糙的边缘 的光敏材料留在基片表面上。

公开(公告)号：WO2021013441A1

公开(公告)日：2021-01-28

申请号：PCT/EP2020/066871

申请日：2020-06-18

Applicant: ASML NETHERLANDS B.V.

Inventor： NAKIBOGLU, Günes ,  WATERSON, Nicholas, Peter ,  VAN DE MEERENDONK, Remco ,  BRUST, Steve, Gregory ,  JAKOBS, Dirk, Martinus, Gerardus, Petrus, Wilhelmus ,  KOTTAPALLI, Shravan

IPC: G03F7/20

Abstract: Disclosed herein is a passive flow induced vibration (FIV) reduction system for use in a temperature conditioning system that controls the temperature of at least one component within a lithographic apparatus. This FIV reduction system comprises: a conduit that provides a flow path for a liquid through the system; a liquid filled cavity in fluid connection with the conduit, wherein the fluid connection is provided via one or more openings in the wall of the conduit; a membrane configured such that it separates the liquid in the liquid filled cavity from a gas at a substantially ambient pressure and the membrane is configured such that the compliance of the membrane reduces at least the low frequency FIVs in the liquid flowing through the conduit; and an end-stop located on the gas side of the membrane, wherein the end-stop is configured to limit the extent of deflection of the membrane.

公开(公告)号：WO2018234061A1

公开(公告)日：2018-12-27

申请号：PCT/EP2018/065113

申请日：2018-06-08

Applicant: ASML NETHERLANDS B.V.

Inventor： PATEL, Hrishikesh ,  MA, Yue ,  NAKIBOGLU, Günes ,  RIJPMA, Albert, Pieter ,  VAN DER NET, Antonius, Johannus ,  VERHEES, Rens, Henricus ,  YANG, Zongquan

IPC: G03F7/20 ,  H05G2/00

Abstract: A radiation source (SO) comprising: • a fuel supply device (3) configured to supply fuel; • an excitation device (1) configured to excite the fuel into a plasma (7); • a collector (5) configured to collect radiation emitted by the plasma and to direct the radiation to a beam exit; • a debris mitigation system (20) configured to collect debris generated by the plasma, the debris mitigation system having a component (3, 9B, 21, 22, 23, 24, 27, 28, 29) having a conduit (301) passing therethrough; and • a temperature control system (300) configured to selectively increase or decrease the temperature of the component by selectively heating or cooling a thermal transfer fluid circulating through the conduit.

公开(公告)号：WO2017153085A1

公开(公告)日：2017-09-14

申请号：PCT/EP2017/051603

申请日：2017-01-26

Applicant: ASML NETHERLANDS B.V.

Inventor： NIENHUYS, Han-Kwang ,  NAKIBOGLU, Günes ,  PETIT, Rita, Marguerite, Albin, Lambertine ,  PEN, Hermen, Folken ,  VAN DE MOESDIJK, Remco, Yuri ,  VAN BOXTEL, Frank, Johannes, Jacobus ,  KRUIZINGA, Borgert

IPC: G03F7/20 ,  G03F1/84

Abstract: A measurement system to determine a deformation of an object having a front surface and a back surface and being provided with a pattern is described, the measurement system comprising: ∙ a processor and ∙ an interferometer system comprising a light source and a detector system; the light source being configured to emit, to each of a plurality of locations on the object, measurement beams in order to generate, at each of the respective plurality of locations, reflected measurement beams off the front and back surfaces of the object respectively; the detector system being configured to receive the respective reflected measurement beams and output signals representative of the received reflected measurement beams to the processor; the processor being configured to: ∙ receive the signals; ∙ determine, based on the signals as received, a characteristic of the object; and ∙ determine a deformation of the pattern based on the characteristic.

Abstract translation: 描述了一种用于确定具有前表面和后表面并且设置有图案的物体的变形的测量系统，所述测量系统包括：处理器和干涉仪系统，所述干涉仪系统包括 光源和检测器系统; 所述光源被配置为向所述物体上的多个位置中的每一个发射测量光束，以便在所述相应的多个位置中的每一个处分别产生从所述物体的前表面和后表面离开的反射测量光束; 所述检测器系统被配置为接收相应的反射测量光束并将代表所接收的反射测量光束的信号输出到所述处理器; 该处理器被配置为：·接收信号; ∙根据收到的信号确定物体的特性; 并根据特性确定图案的变形。