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    SUBSTRATE SUPPORT, METHOD FOR LOADING A SUBSTRATE ON A SUBSTRATE SUPPORT LOCATION, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    1.
    发明申请
    SUBSTRATE SUPPORT, METHOD FOR LOADING A SUBSTRATE ON A SUBSTRATE SUPPORT LOCATION, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
    基板支撑，用于在基板支撑位置上装载基板的方法，地平面设备和装置制造方法

    公开(公告)号：WO2015169616A1

    公开(公告)日：2015-11-12

    申请号：PCT/EP2015/058831

    申请日：2015-04-23

    Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

    Inventor： LEENDERS, Martinus, Hendrikus, Antonius ,  DE KRUIJF, Niek, Elout ,  DUSA, Mircea ,  HOUBEN, Martijn ,  MULDER, Johannes, Gerardus,Maria ,  POIESZ, Thomas ,  VAN DEN HEUVEL, Marco, Adrianus, Peter ,  VAN DONGEN, Paul ,  GERRITZEN, Justin, Johannes, Hermanus ,  VERWEIJ, Antonie, Hendrik ,  SOETHOUDT, Abraham, Alexander

    IPC: G03F7/20

    CPC classification number: G03F7/707 ,  G03F7/70716 ,  G03F7/70783 ,  H01L21/6835 ,  H01L21/6838

    Abstract: A substrate support (1), includes: a substrate support location (4) configured to support a substrate (W), and a vacuum clamping device (7) configured to clamp the substrate on the substrate support location, wherein the vacuum clamping device includes at least one reduced pressure source (8) to create a reduced pressure, at least one vacuum section (9) connected to the at least one reduced pressure source, wherein the at least one vacuum section is configured to attract the substrate towards the substrate support location, and a control device (16) configured to control a spatial pressure profile along the at least one vacuum section with which the substrate is attracted by the vacuum clamping device, wherein the control device includes a substrate shape data input (16a) to receive substrate shape data representing shape data of the substrate to be clamped, and wherein the control device is configured to adapt the spatial pressure profile in dependency of the substrate shape data.

    Abstract translation: 衬底支撑件（1）包括：被配置为支撑衬底（W）的衬底支撑位置（4）和被配置为将衬底夹持在衬底支撑位置上的真空夹紧装置（7），其中真空夹紧装置包括 至少一个减压源（8）以产生减压，连接到所述至少一个减压源的至少一个真空部分（9），其中所述至少一个真空部分被配置为将所述基板吸引到所述基板支撑件 位置和控制装置（16），其被配置为控制沿着所述至少一个真空部分的空间压力分布，所述基板由所述至少一个真空部分被所述真空夹紧装置吸引，其中所述控制装置包括用于接收的基板形状数据输入（16a） 表示要被夹持的基板的形状数据的基板形状数据，并且其中所述控制装置被配置为根据所述基板形状数据来适应所述空间压力分布。

    SUBSTRATE HOLDER AND SUPPORT TABLE FOR LITHOGRAPHY
    2.
    发明申请
    SUBSTRATE HOLDER AND SUPPORT TABLE FOR LITHOGRAPHY 审中-公开
    基板支架和支撑表

    公开(公告)号：WO2015106860A1

    公开(公告)日：2015-07-23

    申请号：PCT/EP2014/075163

    申请日：2014-11-20

    Applicant: ASML NETHERLANDS B.V.

    Inventor： HOUBEN, Martijn ,  POIESZ, Thomas

    IPC: G03F7/20 ,  H01L21/687

    CPC classification number: G03F7/707 ,  G03F7/70783 ,  H01L21/6831 ,  H01L21/68742 ,  H01L21/6875

    Abstract: A substrate table (WT) supports a substrate holder (WH) to which a substrate (W) is clamped for exposure. The substrate table (WT) has a plurality of e-pins (30) spaced apart from and distributed around the center of the substrate holder for receiving and lowering a substrate onto the substrate holder prior to exposure and raising a substrate off the substrate holder after exposure. Tip portions of the e-pins (30) and the corresponding apertures (24) in the substrate holder (WH) have a shape in plan including at least one re-entrant, e.g. a cross shape.

    Abstract translation: 衬底台（WT）支撑衬底保持器（WH），衬底（W）夹在其上用于曝光。 衬底台（WT）具有与衬底保持器的中心间隔开并分布在衬底保持器的中心的多个e形销（30），用于在曝光之前将衬底接收和降低到衬底保持器上，并且在衬底保持器之后将衬底从衬底保持器上抬起， 曝光。 e形销（30）的顶端部分和衬底保持器（WH）中的对应的孔（24）具有平面形状，包括至少一个入口（例如）。 十字形。

    A SUBSTRATE HOLDER, A LITHOGRAPHIC APPARATUS AND METHOD OF MANUFACTURING DEVICES
    5.
    发明申请
    A SUBSTRATE HOLDER, A LITHOGRAPHIC APPARATUS AND METHOD OF MANUFACTURING DEVICES 审中-公开
    基板保持器，平面设备及其制造方法

    公开(公告)号：WO2017001135A1

    公开(公告)日：2017-01-05

    申请号：PCT/EP2016/062371

    申请日：2016-06-01

    Applicant: ASML NETHERLANDS B.V.

    Inventor： POIESZ, Thomas ,  HOUBEN, Martijn ,  SOETHOUDT, Abraham, Alexander

    IPC: G03F7/20 ,  H01L21/687

    CPC classification number: H01L21/6875 ,  B23H7/26 ,  G03F7/2002 ,  G03F7/2004 ,  G03F7/707 ,  G03F7/70783 ,  H01L21/0274 ,  H01L21/6831 ,  H01L21/6838

    Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder comprising: a main body having a main body surface; and a plurality of burls projecting from the main body surface; wherein each burl has a distal end configured to engage with the substrate; the distal ends of the burls substantially conform to a support plane whereby a substrate can be supported in a substantially flat state on the burls; a frictional force between the distal end of each burl and a substrate engaged therewith arises in a direction parallel to the support plane in the event of a relative movement of the substrate and substrate holder in the direction; and distal end surfaces of the burls are provided with a release structure configured so that the frictional force is less than would arise in the absence of the release structure.

    Abstract translation: 一种用于光刻设备并被配置为支撑衬底的衬底保持器，所述衬底保持器包括：主体，其具有主体表面; 以及从所述主体表面突出的多个毛刺; 其中每个毛刺具有构造成与所述基底接合的远端; 毛边的远端基本上与支撑平面一致，由此基底可以以基本平坦的状态支撑在毛刺上; 在基板和基板保持器沿该方向的相对移动的情况下，每个凸起的远端和与其接合的基板之间的摩擦力产生在平行于支撑平面的方向上; 并且毛边的远端表面设置有释放结构，其被构造成使得摩擦力小于在不存在释放结构时会产生的摩擦力。

    SYSTEM FOR POSITIONING AN OBJECT IN LITHOGRAPHY
    6.
    发明申请
    SYSTEM FOR POSITIONING AN OBJECT IN LITHOGRAPHY 审中-公开
    用于定位对象的系统

    公开(公告)号：WO2015090753A1

    公开(公告)日：2015-06-25

    申请号：PCT/EP2014/074583

    申请日：2014-11-14

    Applicant: ASML NETHERLANDS B.V.

    Inventor： HEMPENIUS, Peter, Paul ,  HOUBEN, Martijn ,  KEMPER, Nicolaas, Rudolf ,  RIJS, Robertus, Mathijs, Gerardus ,  DE WIT, Paul, Corné, Henri ,  BOERE, Stijn, Willem ,  DE VOS, Youssef, Karel, Maria ,  VAN DER MEULEN, Frits

    IPC: G03F7/20

    CPC classification number: G03F7/70875 ,  G03F7/70775 ,  G03F7/709

    Abstract: The invention relates to a lithographic apparatus comprising: - an object (OB) that is moveable in at least one direction (X, Y); - a control system to move the object in the at least one direction, wherein the control system is arranged to control movement of the object in the at least one direction in a frequency range of interest; - a conduit (CC) provided with a fluid (CF); wherein the conduit is arranged on or in the object in a pattern, wherein the pattern is such that an acceleration of the object in the at least one direction causes an acceleration pressure profile in the fluid along the conduit, wherein the acceleration pressure profile does not match with a resonance pressure profile that corresponds to a standing wave mode in the fluid with a resonance frequency in the frequency range of interest.

    Abstract translation: 本发明涉及一种光刻设备，包括： - 可在至少一个方向（X，Y）上移动的物体（OB）; - 控制系统，用于在所述至少一个方向上移动所述物体，其中所述控制系统被布置成控制所述物体在感兴趣的频率范围内的所述至少一个方向上的移动; - 设有流体（CF）的管道（CC）; 其中所述导管以图案布置在所述物体上或所述物体中，其中所述图案使得所述物体在所述至少一个方向上的加速度导致沿着所述导管的所述流体中的加速度压力分布，其中所述加速度压力分布不 与在感兴趣的频率范围内具有共振频率的流体中的驻波模式相对应的共振压力分布匹配。

    SUPPORT TABLE FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    7.
    发明申请
    SUPPORT TABLE FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
    平面设备支持表，平面设备和设备制造方法

    公开(公告)号：WO2015043890A1

    公开(公告)日：2015-04-02

    申请号：PCT/EP2014/068575

    申请日：2014-09-02

    Applicant: ASML NETHERLANDS B.V.

    Inventor： HOUBEN, Martijn ,  DE KOCK, Alwin ,  VAN ABEELEN, Hendrikus, Johannes, Marinus ,  VAN DEN HEUVEL, Marco, Adrianus, Peter

    IPC: G03F7/20

    CPC classification number: G03F7/70716 ,  G03F7/707 ,  G03F7/70875 ,  H01L21/6875

    Abstract: A support table (WT) to support a surface of a substrate (W), wherein the support table comprises: a base surface (22) substantially parallel to the surface of the substrate, a plurality of burls (20) protruding above the base surface, each of the burls having a respective distal end and a first height above the base surface, the burls arranged such that, when the substrate is supported by the support table, the substrate is supported by the respective distal ends, and a plurality of elongate raised protrusions (45) separated by gaps, each of the elongate raised protrusions having a second height above the base surface, wherein the elongate raised protrusions protrude above the base surface between the burls, and the second height is less than the first height; wherein the protrusions (45) are arranged such that a plurality of the gaps are aligned to form a straight gas flow path (82) towards an edge of the base surface.

    Abstract translation: 一种用于支撑衬底（W）的表面的支撑台（WT），其中所述支撑台包括：基本平行于所述衬底的表面的基底表面（22），在所述基底表面上方突出的多个毛刺（20） 每个所述毛坯具有相应的远端和在所述基面上方的第一高度，所述毛边被布置成使得当所述基底由所述支撑台支撑时，所述基底由相应的远端支撑，并且多个细长 由间隙分开的凸起突起（45），每个细长凸起突起在基底表面上方具有第二高度，其中细长凸起突起在孔之间突出在基面上方，第二高度小于第一高度; 其中所述突起（45）被布置成使得多个所述间隙对齐以朝向所述基部表面的边缘形成直的气体流动路径（82）。

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