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公开(公告)号：WO2022106143A1
公开(公告)日：2022-05-27
申请号：PCT/EP2021/079201
申请日：2021-10-21
Applicant: ASML NETHERLANDS B.V.
IPC: G01N21/956 , H01J37/244 , H01J37/28
Abstract: Disclosed herein is an inspection tool and a method for identifying defects in a sample. The method includes steps of scanning a first area of a sample with a first detector-beam and scanning a second area of the sample with a second detector-beam, then receiving first and second signals that are derived from the first and second detector-beams. The first and second signals are compared to determine whether a defect is present in the sample.
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公开(公告)号：WO2022117295A1
公开(公告)日：2022-06-09
申请号：PCT/EP2021/081134
申请日：2021-11-09
Applicant: ASML NETHERLANDS B.V.
Inventor： SLOT, Erwin , MANGNUS, Albertus, Victor, Gerardus , SMAKMAN, Erwin, Paul , REN, Yan , SCOTUZZI, Marijke
IPC: H01J37/304
Abstract: A charged-particle tool configured to generate a plurality of sub- beams from a beam of charged particles and direct the sub-beams downbeam toward a sample (600) position, the tool charged-particle tool comprising at least three charged-particle-optical components (201,111,235,234); a detector module (240); and a controller. The detector module is configured to generate a detection signal in response to charged particles that propagate upbeam from the direction of the sample position. The controller is configured to operate the tool in a calibration mode.. The charged-particle-optical components include: a charged-particle source 201 configured to emit a beam of charged particles and a beam generator (111) configured to generate the sub-beams. The detection signal contains information about alignment of at least two of the charged-particle-optical components. The charged-particle optical components comprise two or more charged-particle optical elements comprising an array of apertures for which the charged particles may be monitored.
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公开(公告)号：WO2022058111A1
公开(公告)日：2022-03-24
申请号：PCT/EP2021/072787
申请日：2021-08-17
Applicant: ASML NETHERLANDS B.V.
Inventor： KURGANOVA, Evgenia , SCOTUZZI, Marijke , FARAMARZI, Vina , VAN DEN BROEK, Bastiaan, Maurice
Abstract: Methods of performing metrology are disclosed. In one arrangement a substrate is provided that has a layer formed on the substrate. The layer comprises a two-dimensional material. A target portion of the layer is illuminated with a beam of radiation and a distribution of radiation in a pupil plane is detected to obtain measurement data. The measurement data is processed to obtain metrology information about the target portion of the layer. The illuminating, detecting and processing are performed for plural different target portions of the layer to obtain metrology information for the plural target portions of the layer.
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公开(公告)号：EP4256601A1
公开(公告)日：2023-10-11
申请号：EP21810001.4
申请日：2021-11-09
Applicant: ASML Netherlands B.V.
Inventor： SLOT, Erwin , MANGNUS, Albertus, Victor, Gerardus , SMAKMAN, Erwin, Paul , REN, Yan , SCOTUZZI, Marijke
IPC: H01J37/304
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公开(公告)号：EP4345861A1
公开(公告)日：2024-04-03
申请号：EP22198397.6
申请日：2022-09-28
Applicant: ASML Netherlands B.V.
Inventor： KUIPER, Vincent, Sylvester , SCOTUZZI, Marijke
IPC: H01J37/20
Abstract: The present invention provides a charged particle apparatus for projecting multiple beam grids of charged particle beams towards a plurality of samples. The apparatus comprises: a stage configured to support a plurality of samples at respective sample positions; and an array of charged particle devices respectively configured to project a plurality of charged particle beams in a beam grid towards the respective the sample positions. The charged particle devices respectively comprise: an objective lens configured to direct the beam grid of the charged particle device on a sample at the respective sample position; and a detector configured to detect signal particles from the sample. The stage is configured to be actuated relative to the array of charged particle devices. The stage and the array of charged particle devices are configured such that the array of charged particle devices scan relative to the plurality of samples simultaneously.
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Patent Agency Ranking
公开(公告)号：EP3971555A1
公开(公告)日：2022-03-23
申请号：EP20196358.4
申请日：2020-09-16
Applicant: ASML Netherlands B.V.
Inventor： KURGANOVA, Evgenia , SCOTUZZI, Marijke , FARAMARZI, Vina , VAN DEN BROEK, Bastiaan, Maurice
Abstract: Methods of performing metrology are disclosed. In one arrangement a substrate is provided that has a layer formed on the substrate. The layer comprises a two-dimensional material. A target portion of the layer is illuminated with an incoherent beam of radiation and radiation redirected by the target portion of the layer is detected to obtain measurement data. The measurement data is processed to obtain metrology information about the target portion of the layer. The illuminating, detecting and processing are performed for plural different target portions of the layer to obtain metrology information for the plural target portions of the layer.
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公开(公告)号：EP4449469A1
公开(公告)日：2024-10-23
申请号：EP22818444.6
申请日：2022-11-22
Applicant: ASML Netherlands B.V.
IPC: H01J37/04
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8.发明公开
公开(公告)号：EP4199028A1
公开(公告)日：2023-06-21
申请号：EP21216063.4
申请日：2021-12-20
Applicant: ASML Netherlands B.V.
IPC: H01J37/04 , H01J37/12 , H01J37/244 , H01J37/26 , H01J37/28 , H01J37/317
Abstract: There is provided a charged particle device for a charged particle inspection apparatus for projecting an array of sub-beams towards a sample, the charged particle device comprising: a charged particle optical element and a detector. The charged particle optical element has an up beam surface having a plurality of openings to generate an array of sub-beams from a charged particle beam. In the charged particle optical element are defined: sub-beam apertures and monitoring apertures. The sub-beam aperture extend through the charged particle element for paths of the array of sub-beams towards a sample, The monitoring aperture extends through the charged particle element. The detector is in the monitoring aperture. At least part of the detector is down-beam of the up beam surface. The detector measures a parameter of a portion of the charged particle beam incident on the detector.
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公开(公告)号：EP4199031A1
公开(公告)日：2023-06-21
申请号：EP21215700.2
申请日：2021-12-17
Applicant: ASML Netherlands B.V.
IPC: H01J37/22
Abstract: A charged-particle optical apparatus configured to project a multi-beam of charged particles, the apparatus comprising:
a charged particle device switchable between (i) an operational configuration in which the device is configured to project the multi-beam to a sample along an operational beam path extending from a source of the multi-beam to the sample and (ii) a monitoring configuration in which the device is configured to project the multi-beam to a detector along a monitoring beam path extending from the source to the detector;
wherein the monitoring beam path diverts from the inspection beam path part way along the operational beam path.-
10.发明公开
公开(公告)号：EP4199027A1
公开(公告)日：2023-06-21
申请号：EP21215703.6
申请日：2021-12-17
Applicant: ASML Netherlands B.V.
IPC: H01J37/04
Abstract: A charged-particle apparatus generates a plurality of sub-beams from a source beam of charged particles and direct the sub-beams downbeam toward a sample position. The charged-particle apparatus comprises a charged particle source, an aperture array and a charged particle optical component. The charged-particle source comprises an emitter to emit a source beam of charged particles along a divergent path. The aperture array is positioned in the divergent path so the aperture array generates sub-beams from the source beam. The charged-particle-optical component acts on the source beam upbeam of the aperture array. The charged-particle-optical component comprises a multipole and/or a charged-particle lens. The multipole operates on the source beam to vary the position of the divergent path at the aperture array. The multipole may vary a cross-sectional shape of the divergent path at the aperture array. The charged-particle-optical lens compensates for variations in distance between the emitter and the aperture array.
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