-
公开(公告)号：WO2022008462A1
公开(公告)日：2022-01-13
申请号：PCT/EP2021/068548
申请日：2021-07-05
Applicant: ASML NETHERLANDS B.V.
Inventor： WIELAND, Marco, Jan-Jaco , NIHTIANOV, Stoyan , VEENSTRA, Roy, Ramon , JIANG, Hui
IPC: H01L27/144 , H01L27/146 , H01L31/115 , H01J37/12 , H01J37/153 , H01J37/244 , H01J37/28 , H01J37/317
Abstract: There is provided a detector substrate (or detector array) for use in a charged particle multi-beam assessment tool to detect charged particles from a sample. The detector substrate defines an array of apertures for the beam paths of respective charged particle beams of a multi-beam. The detector substrate comprises: a sensor unit array. A sensor unit of the sensor unit array is adjacent a corresponding aperture of the aperture array. The sensor unit is configured to capture charged particles from the sample. The detector array comprises an amplification circuit associated with each sensor unit in the sensor unit array and proximate to the corresponding aperture in the aperture array. The amplification circuit comprising a Trans Impedance Amplifier and/or an analogue to digital converter.
-
公开(公告)号：WO2022117285A1
公开(公告)日：2022-06-09
申请号：PCT/EP2021/080943
申请日：2021-11-08
Applicant: ASML NETHERLANDS B.V.
Inventor： VEENSTRA, Roy, Ramon
IPC: H01J37/244
Abstract: A multi-beam electron-optical system for a charged-particle assessment tool, the system comprising: an objective lens array assembly comprising a plurality of objective lenses, each configured to project one of a plurality of charged-particle beams onto a sample; a detector array associated with the objective lens array assembly and configured to detect charged-particles emitted from the sample; and a circuit comprising an amplifier in data communication with the detector array; wherein the amplifier is configured to be tunable in order to tune amplification of signals from the detector array.
-
公开(公告)号：WO2022258271A1
公开(公告)日：2022-12-15
申请号：PCT/EP2022/062443
申请日：2022-05-09
Applicant: ASML NETHERLANDS B.V.
Inventor： VAN SOEST, Jurgen , VEENSTRA, Roy, Ramon , SMAKMAN, Erwin, Paul , VAN ZUTPHEN, Tom , MANGNUS, Albertus, Victor, Gerardus
IPC: H01J37/073
Abstract: The disclosure relates to a charged particle beam apparatus configured to project charged particle beams towards a sample. The charged particle beam apparatus comprises: a plurality of charged particle-optical columns configured to project respective charged particle beams towards the sample, wherein each charged particle-optical column comprises: a charged particle source configured to emit the charged particle beam towards the sample, the charged particle sources being comprised in a source array; an objective lens comprising an electrostatic electrode configured to direct the charged particle beam towards the sample; and a detector associated with the objective lens array, configured to detect signal charged particles emitted from the sample. The objective lens is the most down-beam element of the charged particle-optical column configured to affect the charged particle beam directed towards the sample.
-
公开(公告)号：WO2022106143A1
公开(公告)日：2022-05-27
申请号：PCT/EP2021/079201
申请日：2021-10-21
Applicant: ASML NETHERLANDS B.V.
IPC: G01N21/956 , H01J37/244 , H01J37/28
Abstract: Disclosed herein is an inspection tool and a method for identifying defects in a sample. The method includes steps of scanning a first area of a sample with a first detector-beam and scanning a second area of the sample with a second detector-beam, then receiving first and second signals that are derived from the first and second detector-beams. The first and second signals are compared to determine whether a defect is present in the sample.
-
公开(公告)号：EP4176467A1
公开(公告)日：2023-05-10
申请号：EP21742087.6
申请日：2021-07-05
Applicant: ASML Netherlands B.V.
Inventor： WIELAND, Marco, Jan-Jaco , NIHTIANOV, Stoyan , VEENSTRA, Roy, Ramon , JIANG, Hui
IPC: H01L27/144 , H01L27/146 , H01L31/115 , H01J37/12 , H01J37/153 , H01J37/244 , H01J37/28 , H01J37/317
-
Patent Agency Ranking
公开(公告)号：EP4020565A1
公开(公告)日：2022-06-29
申请号：EP20217152.6
申请日：2020-12-23
Applicant: ASML Netherlands B.V.
Inventor： WIELAND, Marco, Jan-Jaco , NIHTIANOV, Stoyan , VEENSTRA, Roy, Ramon , JIANG, Hui
IPC: H01L27/144 , H01L27/146 , H01L31/115 , H01J37/12 , H01J37/153 , H01J37/244 , H01J37/28 , H01J37/317
Abstract: There is provided a detector substrate for use in a charged particle multi-beam assessment tool to detect charged particles from a sample. The detector substrate defines an array of apertures for the beam paths of respective charged particle beams of a multi-beam. The detector substrate comprises: a sensor unit array. A sensor unit of the sensor unit array is adjacent a corresponding aperture of the aperture array. The sensor unit is configured to capture charged particles from the sample. The detector array comprises an amplification circuit associated with each sensor unit in the sensor unit array and proximate to the corresponding aperture in the aperture array. The amplification circuit comprising a Trans Impedance Amplifier and/or an analogue to digital converter.
-
公开(公告)号：EP4391009A1
公开(公告)日：2024-06-26
申请号：EP22215638.2
申请日：2022-12-21
Applicant: ASML Netherlands B.V.
Inventor： SMAKMAN, Erwin, Paul , VEENSTRA, Roy, Ramon , REN, Yan
CPC classification number: H01J2237/03620130101 , H01J37/28 , H01J37/12
Abstract: The present invention provides a charged particle device for projecting a multi-beam of charged particles towards a sample. The device comprises a plurality of sources configured to emit a respective source beam of charged particles along a respective path of a beam grid, comprising a plurality of charged particle beams, toward the sample. The device further comprises one or more elements in which an array of apertures is defined. The one or more elements respectively comprising a plurality of beam areas assigned to an individual source beam. The one or more elements is configured to operate on the charged particle beams in the beam grids of the individual source beam. Each element is separated from an adjoining element by a spacer, the spacer having at least one aperture positioned to correspond to the position of at least two beam areas.
-
公开(公告)号：EP4009348A1
公开(公告)日：2022-06-08
申请号：EP20210844.5
申请日：2020-12-01
Applicant: ASML Netherlands B.V.
Inventor： VEENSTRA, Roy, Ramon
IPC: H01J37/244
Abstract: A multi-beam electron-optical system for a charged-particle assessment tool, the system comprising:
an objective lens array assembly comprising a plurality of objective lenses, each configured to project one of a plurality of charged-particle beams onto a sample;
a detector array associated with the objective lens array assembly and configured to detect charged-particles emitted from the sample; and
a circuit comprising an amplifier in data communication with the detector array;
wherein the amplifier is configured to be tunable in order to tune amplification of signals from the detector array.-
公开(公告)号：EP4352773A1
公开(公告)日：2024-04-17
申请号：EP22728202.7
申请日：2022-05-09
Applicant: ASML Netherlands B.V.
Inventor： VAN SOEST, Jurgen , VEENSTRA, Roy, Ramon , SMAKMAN, Erwin, Paul , VAN ZUTPHEN, Tom , MANGNUS, Albertus, Victor, Gerardus
IPC: H01J37/073
CPC classification number: H01J37/073 , H01J2237/063520130101 , H01J2237/281720130101 , H01J2237/3177420130101
-
公开(公告)号：EP4256600A1
公开(公告)日：2023-10-11
申请号：EP21809980.2
申请日：2021-11-08
Applicant: ASML Netherlands B.V.
Inventor： VEENSTRA, Roy, Ramon
IPC: H01J37/244
-
-
-
-
-
-
-
-
-
Search Results
11
records
(took 0.026 seconds)
