公开(公告)号：WO2018127565A3

公开(公告)日：2018-07-12

申请号：PCT/EP2018/050278

申请日：2018-01-05

Applicant: ASML NETHERLANDS B.V.

Inventor： LABETSKI, Dzmitry ,  BERENDSEN, Christianus, Wilhelmus, Johannes ,  DUARTE RODRIGES NUNES, Rui, Miguel ,  ERSHOV, Alexander, Igorevich ,  FEENSTRA, Kornelis, Frits ,  FOMENKOV, Igor, Vladimirovich ,  HUMMLER, Klaus, Martin ,  JOHNKADAKSHAM, Arun ,  KRAUSHAAR, Matthias ,  LAFORGE, Andrew, David ,  LANGLOIS, Marc, Guy ,  LOGINOV, Maksim ,  MA, Yue ,  MOJAB, Seyedmohammad ,  NADIR, Kerim ,  SHATALOV, Alexander ,  STEWART, John, Tom, ,  TEGENBOSCH, Henricus, Gerardus ,  XIA, Chunguang

IPC: H05G2/00 ,  G03F7/20

Abstract: A radiation source including a chamber including a plasma formation region, a radiation collector arranged in the chamber, the radiation collector configured to collect radiation emitted at the plasma formation region and to direct the collected radiation to an intermediate focus region, a debris mitigation system configured to direct a first gas flow from the intermediate focus region towards the plasma formation region, and a guiding device arranged in the chamber such that the first gas flow is directed around the guiding device. A system and apparatus for reducing contamination of an inner vessel wall of an EUV vessel is provided. The system and apparatus include inner vessel wall supplies of gas that introduce gas via a plurality of nozzles away from the inner vessel wall. The system and apparatus also optionally include an asymmetric exhaust to exhaust gas from the EUV vessel while providing flow geometries that promote a direction of gas away from the inner vessel wall and an EUV collector within the EUV vessel.

公开(公告)号：WO2018127565A2

公开(公告)日：2018-07-12

申请号：PCT/EP2018/050278

申请日：2018-01-05

Applicant: ASML NETHERLANDS B.V.

Inventor： LABETSKI, Dzmitry ,  BERENDSEN, Christianus, Wilhelmus, Johannes ,  DUARTE RODRIGES NUNES, Rui, Miguel ,  ERSHOV, Alexander, Igorevich ,  FEENSTRA, Kornelis, Frits ,  FOMENKOV, Igor, Vladimirovich ,  HUMMLER, Klaus, Martin ,  JOHNKADAKSHAM, Arun ,  KRAUSHAAR, Matthias ,  LAFORGE, Andrew, David ,  LANGLOIS, Marc, Guy ,  LOGINOV, Maksim ,  MA, Yue ,  MOJAB, Seyedmohammad ,  NADIR, Kerim ,  SHATALOV, Alexander ,  STEWART, John, Tom, ,  TEGENBOSCH, Henricus, Gerardus ,  XIA, Chunguang

IPC: H05G2/00 ,  G03F7/20

CPC classification number: H05G2/005 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916 ,  G03F7/70933 ,  H05G2/008

Abstract: A radiation source including a chamber including a plasma formation region, a radiation collector arranged in the chamber, the radiation collector configured to collect radiation emitted at the plasma formation region and to direct the collected radiation to an intermediate focus region, a debris mitigation system configured to direct a first gas flow from the intermediate focus region towards the plasma formation region, and a guiding device arranged in the chamber such that the first gas flow is directed around the guiding device. A system and apparatus for reducing contamination of an inner vessel wall of an EUV vessel is provided. The system and apparatus include inner vessel wall supplies of gas that introduce gas via a plurality of nozzles away from the inner vessel wall. The system and apparatus also optionally include an asymmetric exhaust to exhaust gas from the EUV vessel while providing flow geometries that promote a direction of gas away from the inner vessel wall and an EUV collector within the EUV vessel.