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公开(公告)号：WO2018127565A3
公开(公告)日：2018-07-12
申请号：PCT/EP2018/050278
申请日：2018-01-05
Applicant: ASML NETHERLANDS B.V.
Inventor： LABETSKI, Dzmitry , BERENDSEN, Christianus, Wilhelmus, Johannes , DUARTE RODRIGES NUNES, Rui, Miguel , ERSHOV, Alexander, Igorevich , FEENSTRA, Kornelis, Frits , FOMENKOV, Igor, Vladimirovich , HUMMLER, Klaus, Martin , JOHNKADAKSHAM, Arun , KRAUSHAAR, Matthias , LAFORGE, Andrew, David , LANGLOIS, Marc, Guy , LOGINOV, Maksim , MA, Yue , MOJAB, Seyedmohammad , NADIR, Kerim , SHATALOV, Alexander , STEWART, John, Tom, , TEGENBOSCH, Henricus, Gerardus , XIA, Chunguang
Abstract: A radiation source including a chamber including a plasma formation region, a radiation collector arranged in the chamber, the radiation collector configured to collect radiation emitted at the plasma formation region and to direct the collected radiation to an intermediate focus region, a debris mitigation system configured to direct a first gas flow from the intermediate focus region towards the plasma formation region, and a guiding device arranged in the chamber such that the first gas flow is directed around the guiding device. A system and apparatus for reducing contamination of an inner vessel wall of an EUV vessel is provided. The system and apparatus include inner vessel wall supplies of gas that introduce gas via a plurality of nozzles away from the inner vessel wall. The system and apparatus also optionally include an asymmetric exhaust to exhaust gas from the EUV vessel while providing flow geometries that promote a direction of gas away from the inner vessel wall and an EUV collector within the EUV vessel.
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公开(公告)号：WO2017023950A2
公开(公告)日：2017-02-09
申请号：PCT/US2016/045200
申请日：2016-08-02
Applicant: ASML NETHERLANDS B.V.
Inventor： DE DEA, Silvia , XIA, Chunguang , WILSON, Gregory, James , VERHOFF, Brandon, Wilson
IPC: G03F7/20
CPC classification number: B08B5/02 , G01F1/00 , G03F7/70925 , G03F7/70933
Abstract: A fluid is directed toward a surface of an optical element based on a first flow pattern, the surface of the optica! element including debris and the fluid directed based on the first flow pattern moving at least some of the debris to a first stagnation region at the surface of ths opficai eiement; and the fluid is directed toward the optical element based on a second flow pattern, the fluid directed based on the second flow pattern moving at least some of the debris to a second stagnation region on the surface of the optical element, the second stagnation region and the first stagnation region being different locations at the surface of the optical element. Directing the fluid toward the surface of the optical element based on the second flow pattern removes at least some of the debris from the first stagnation region.
Abstract translation: 基于第一流动模式将流体指向光学元件的表面，光学元件的表面 包括碎屑和基于第一流动图案引导的流体将至少一些碎片移动到第一流动区域的第一停滞区域; 并且基于第二流动图案将流体引向光学元件，基于第二流动图案指向的流体将至少一些碎片移动到光学元件的表面上的第二停滞区域，第二停滞区域和 第一停滞区域是在光学元件的表面处不同的位置。 基于第二流动模式将流体引导到光学元件的表面去除了来自第一停滞区域的至少一些碎屑。
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公开(公告)号：WO2019158492A1
公开(公告)日：2019-08-22
申请号：PCT/EP2019/053350
申请日：2019-02-12
Applicant: ASML NETHERLANDS B.V.
Inventor： XIA, Chunguang , BAEK, Jonghoon , STEWART IV, John, Tom , LAFORGE, Andrew, David , VAN HEIJNSBERGEN, Deniz , EVANS, David, Robert , DZIOMKINA, Nina, Vladimirovna , MA, Yue
Abstract: In some general aspects, a surface of a structure within a chamber of an extreme ultraviolet (EUV) light source is cleaned using a method. The method includes generating a plasma state of a material that is present at a location adjacent to a non-electrically conductive body that is within the chamber. The generation of the plasma state of the material includes electromagnetically inducing an electric current at the location adjacent the non-electrically conductive body to thereby transform the material that is adjacent the non-electrically conductive body from a first state into the plasma state. The plasma state of the material includes plasma particles, at least some of which are free radicals of the material. The method also includes enabling the plasma particles to pass over the structure surface to remove debris from the structure surface without removing the structure from the chamber of the EUV light source.
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公开(公告)号：WO2018127565A2
公开(公告)日：2018-07-12
申请号：PCT/EP2018/050278
申请日：2018-01-05
Applicant: ASML NETHERLANDS B.V.
Inventor： LABETSKI, Dzmitry , BERENDSEN, Christianus, Wilhelmus, Johannes , DUARTE RODRIGES NUNES, Rui, Miguel , ERSHOV, Alexander, Igorevich , FEENSTRA, Kornelis, Frits , FOMENKOV, Igor, Vladimirovich , HUMMLER, Klaus, Martin , JOHNKADAKSHAM, Arun , KRAUSHAAR, Matthias , LAFORGE, Andrew, David , LANGLOIS, Marc, Guy , LOGINOV, Maksim , MA, Yue , MOJAB, Seyedmohammad , NADIR, Kerim , SHATALOV, Alexander , STEWART, John, Tom, , TEGENBOSCH, Henricus, Gerardus , XIA, Chunguang
CPC classification number: H05G2/005 , G03F7/70033 , G03F7/70175 , G03F7/70916 , G03F7/70933 , H05G2/008
Abstract: A radiation source including a chamber including a plasma formation region, a radiation collector arranged in the chamber, the radiation collector configured to collect radiation emitted at the plasma formation region and to direct the collected radiation to an intermediate focus region, a debris mitigation system configured to direct a first gas flow from the intermediate focus region towards the plasma formation region, and a guiding device arranged in the chamber such that the first gas flow is directed around the guiding device. A system and apparatus for reducing contamination of an inner vessel wall of an EUV vessel is provided. The system and apparatus include inner vessel wall supplies of gas that introduce gas via a plurality of nozzles away from the inner vessel wall. The system and apparatus also optionally include an asymmetric exhaust to exhaust gas from the EUV vessel while providing flow geometries that promote a direction of gas away from the inner vessel wall and an EUV collector within the EUV vessel.
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