公开(公告)号：WO2010010034A1

公开(公告)日：2010-01-28

申请号：PCT/EP2009/059131

申请日：2009-07-16

Applicant: ASML NETHERLANDS B.V. ,  TEGENBOSCH, Henricus, Gerardus ,  STRUYCKEN, Alexander, Matthijs ,  KLEIJN, Jacob ,  BEERENS, Ruud, Antonius, Catharina, Maria ,  VANDERHALLEN, Ivo

Inventor： TEGENBOSCH, Henricus, Gerardus ,  STRUYCKEN, Alexander, Matthijs ,  KLEIJN, Jacob ,  BEERENS, Ruud, Antonius, Catharina, Maria ,  VANDERHALLEN, Ivo

IPC: G03F7/20

CPC classification number: G03F7/70891 ,  G03F7/70175 ,  G03F7/70783 ,  G03F7/70825

Abstract: A mount configured to mount an optical element (1) in a module (70, 170) for a lithographic apparatus. The mount includes a plurality of resilient members (12) constructed and arranged to circumferentially support the optical element (1). Each resilient member (2) includes a plurality of resilient subsections that (4', 4'', 4''') are configured to engage the optical element (1) around a perimeter thereof. Each resilient subsection is configured to flex independent of another resilient subsection.

Abstract translation: 一种安装件，被配置为将光学元件（1）安装在用于光刻设备的模块（70,170）中。 该安装件包括构造和布置成周向支撑光学元件（1）的多个弹性构件（12）。 每个弹性构件（2）包括多个弹性部分，其中（4'，4“，4”'）被构造成围绕其周边接合光学元件（1）。 每个弹性子部分被配置成独立于另一个弹性子部分。

公开(公告)号：WO2018127565A3

公开(公告)日：2018-07-12

申请号：PCT/EP2018/050278

申请日：2018-01-05

Applicant: ASML NETHERLANDS B.V.

Inventor： LABETSKI, Dzmitry ,  BERENDSEN, Christianus, Wilhelmus, Johannes ,  DUARTE RODRIGES NUNES, Rui, Miguel ,  ERSHOV, Alexander, Igorevich ,  FEENSTRA, Kornelis, Frits ,  FOMENKOV, Igor, Vladimirovich ,  HUMMLER, Klaus, Martin ,  JOHNKADAKSHAM, Arun ,  KRAUSHAAR, Matthias ,  LAFORGE, Andrew, David ,  LANGLOIS, Marc, Guy ,  LOGINOV, Maksim ,  MA, Yue ,  MOJAB, Seyedmohammad ,  NADIR, Kerim ,  SHATALOV, Alexander ,  STEWART, John, Tom, ,  TEGENBOSCH, Henricus, Gerardus ,  XIA, Chunguang

IPC: H05G2/00 ,  G03F7/20

Abstract: A radiation source including a chamber including a plasma formation region, a radiation collector arranged in the chamber, the radiation collector configured to collect radiation emitted at the plasma formation region and to direct the collected radiation to an intermediate focus region, a debris mitigation system configured to direct a first gas flow from the intermediate focus region towards the plasma formation region, and a guiding device arranged in the chamber such that the first gas flow is directed around the guiding device. A system and apparatus for reducing contamination of an inner vessel wall of an EUV vessel is provided. The system and apparatus include inner vessel wall supplies of gas that introduce gas via a plurality of nozzles away from the inner vessel wall. The system and apparatus also optionally include an asymmetric exhaust to exhaust gas from the EUV vessel while providing flow geometries that promote a direction of gas away from the inner vessel wall and an EUV collector within the EUV vessel.

公开(公告)号：WO2019185406A1

公开(公告)日：2019-10-03

申请号：PCT/EP2019/056899

申请日：2019-03-20

Applicant: ASML NETHERLANDS B.V.

Inventor： LANGLOIS, Marc, Guy ,  LANSBERGEN, Robert, Gabriël, Maria ,  LEENDERS, Martinus, Hendrikus, Antonius ,  TEGENBOSCH, Henricus, Gerardus

IPC: H05G2/00 ,  G03F7/20

Abstract: Disclosed is an EUV system including measures to accumulate target material debris in a liquid form where the target material is blocked from spitting onto optics and in which the target material may be caused to solidify and then conveyed to a location where it can be melted and permitted to drain away without contaminating the collector.

公开(公告)号：WO2021121814A1

公开(公告)日：2021-06-24

申请号：PCT/EP2020/082053

申请日：2020-11-13

Applicant: ASML NETHERLANDS B.V.

Inventor： KERSSEMAKERS, Sander ,  LANSBERGEN, Robert, Gabriël, Maria ,  LEENDERS, Martinus, Hendrikus, Antonius ,  TEGENBOSCH, Henricus, Gerardus

IPC: G03F7/20 ,  H05G2/00 ,  G03F7/70033 ,  G03F7/70808 ,  G03F7/70841 ,  G03F7/70925 ,  G03F7/70975 ,  H05G2/005 ,  H05G2/008

Abstract: A vessel (16) for an EUV radiation source, the vessel comprising a first opening (30) for accessing an interior (32) of the vessel, a first access member (34) configured to allow or prevent access to the interior of the vessel through the first opening, a second opening (36) for accessing the interior of the vessel, the second opening being arranged in the first access member and a second access member (38) arranged on the first access member and configured to allow or prevent access to the interior of the vessel through the second opening.

公开(公告)号：WO2018127565A2

公开(公告)日：2018-07-12

申请号：PCT/EP2018/050278

申请日：2018-01-05

Applicant: ASML NETHERLANDS B.V.

Inventor： LABETSKI, Dzmitry ,  BERENDSEN, Christianus, Wilhelmus, Johannes ,  DUARTE RODRIGES NUNES, Rui, Miguel ,  ERSHOV, Alexander, Igorevich ,  FEENSTRA, Kornelis, Frits ,  FOMENKOV, Igor, Vladimirovich ,  HUMMLER, Klaus, Martin ,  JOHNKADAKSHAM, Arun ,  KRAUSHAAR, Matthias ,  LAFORGE, Andrew, David ,  LANGLOIS, Marc, Guy ,  LOGINOV, Maksim ,  MA, Yue ,  MOJAB, Seyedmohammad ,  NADIR, Kerim ,  SHATALOV, Alexander ,  STEWART, John, Tom, ,  TEGENBOSCH, Henricus, Gerardus ,  XIA, Chunguang

IPC: H05G2/00 ,  G03F7/20

CPC classification number: H05G2/005 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916 ,  G03F7/70933 ,  H05G2/008

Abstract: A radiation source including a chamber including a plasma formation region, a radiation collector arranged in the chamber, the radiation collector configured to collect radiation emitted at the plasma formation region and to direct the collected radiation to an intermediate focus region, a debris mitigation system configured to direct a first gas flow from the intermediate focus region towards the plasma formation region, and a guiding device arranged in the chamber such that the first gas flow is directed around the guiding device. A system and apparatus for reducing contamination of an inner vessel wall of an EUV vessel is provided. The system and apparatus include inner vessel wall supplies of gas that introduce gas via a plurality of nozzles away from the inner vessel wall. The system and apparatus also optionally include an asymmetric exhaust to exhaust gas from the EUV vessel while providing flow geometries that promote a direction of gas away from the inner vessel wall and an EUV collector within the EUV vessel.