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    PROJECTION SYSTEM
    1.
    发明申请
    PROJECTION SYSTEM 审中-公开
    投影系统

    公开(公告)号：WO2016087177A1

    公开(公告)日：2016-06-09

    申请号：PCT/EP2015/076637

    申请日：2015-11-16

    Applicant: ASML NETHERLANDS B.V.

    Inventor： BUTLER, Hans ,  KNOPS, Raoul, Maarten, Simon ,  STREEFKERK, Bob ,  VALENTIN, Christiaan, Louis ,  VAN SCHOOT, Jan, Bernard, Plechelmus ,  SIMONS, Wilhelmus, Franciscus, Johannes ,  MERKX, Leon, Leonardus, Franciscus ,  DE JONGH, Robertus, Johannes, Marinus ,  MERRY, Roel, Johannes, Elisabeth ,  YPMA, Michael, Frederik

    IPC: G03F7/20

    CPC classification number: G03F7/70258 ,  G03F7/705 ,  G03F7/706

    Abstract: A projection system (PS1) for a lithographic apparatus comprises: an optical path (100); a plurality of sensors (S1 - S4); one or more actuators (A1 - A4); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a substrate to form an image. The optical path comprises: a plurality of optical elements (M1 - M4), the plurality of optical elements comprising: a first set of at least two optical elements (M1, M4) and a second set of at least one optical element (M2, M3). Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element. The controller is operable to use the one or more actuators to adjust the second set of optical elements in dependence on the determined position of the first set of optical elements so as to at least partially compensate for optical aberrations and/or line-of-sight errors caused by the positions of the first set of optical elements.

    Abstract translation: 用于光刻设备的投影系统（PS1）包括：光路（100）; 多个传感器（S1-S4）; 一个或多个致动器（A1-A4）; 和控制器（CN）。 光路可操作以接收输入辐射束（Bin）并将输出辐射束（Bout）投影到衬底上以形成图像。 光路包括：多个光学元件（M1-M4），所述多个光学元件包括：第一组至少两个光学元件（M1，M4）和第二组至少一个光学元件（M2， M3）。 每个传感器与多个光学元件中的一个相关联，并且可操作以确定该光学元件的位置。 每个致动器与第二组光学元件中的一个相关联，并且可操作以调节该光学元件。 控制器可操作以使用一个或多个致动器来根据所确定的第一组光学元件的位置来调整第二组光学元件，以便至少部分地补偿光学像差和/或视线 由第一组光学元件的位置引起的误差。

    MOVABLE SUPPORT AND LITHOGRAPHIC APPARATUS
    2.
    发明申请
    MOVABLE SUPPORT AND LITHOGRAPHIC APPARATUS 审中-公开
    可移动支持和平面设备

    公开(公告)号：WO2017005387A1

    公开(公告)日：2017-01-12

    申请号：PCT/EP2016/059508

    申请日：2016-04-28

    Applicant: ASML NETHERLANDS B.V.

    Inventor： DE GROOT, Antonius, Franciscus, Johannes ,  RUIJL, Theo, Anjes, Maria ,  VALENTIN, Christiaan, Louis

    IPC: G03F7/20 ,  H02P25/08 ,  H01L21/68

    CPC classification number: G03F7/70758 ,  G03F7/70725 ,  H01L21/68

    Abstract: The present invention relates to a movable support (1) configured to support an object, comprising: a support plane (2) to support the object, an actuator assembly to move the movable support in a first direction and in a second direction perpendicular to the first direction, wherein the first direction and the second direction extend in a plane parallel to the support plane, wherein the actuator assembly comprises: a first actuator (3) configured to exert a first actuation force (F1) in a first actuation direction (A1), said first actuation direction being parallel to the support plane, a second actuator (4) configured to exert a second actuation force (F2) in a second actuation direction (A2), said second actuation direction being parallel to the support plane, wherein the first actuation direction and the second actuation direction are arranged non-parallel and non-perpendicular with respect to each other.

    Abstract translation: 本发明涉及一种构造成支撑物体的可移动支撑件（1），包括：用于支撑物体的支撑平面（2）;致动器组件，用于沿第一方向和垂直于第二方向的第二方向移动可移动支撑件 第一方向，其中所述第一方向和所述第二方向在平行于所述支撑平面的平面中延伸，其中所述致动器组件包括：构造成在第一致动方向（A1）上施加第一致动力（F1）的第一致动器（3） ），所述第一致动方向平行于所述支撑平面;第二致动器（4），构造成在第二致动方向（A2）上施加第二致动力（F2），所述第二致动方向平行于所述支撑平面，其中 第一致动方向和第二致动方向相对于彼此非平行且非垂直。

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