中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

10 records (took 0.029 seconds)

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    1.
    发明申请
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：WO2016139012A1

    公开(公告)日：2016-09-09

    申请号：PCT/EP2016/051524

    申请日：2016-01-26

    Applicant: ASML NETHERLANDS B.V.

    Inventor： BUTLER, Hans ,  WIJCKMANS, Maurice, Willem, Jozef, Etiënne ,  VAN DER PASCH, Engelbertus, Antonius, Fransiscus ,  HOOGENDAM, Christiaan, Alexander ,  LUTTIKHUIS, Bernardus, Antonius, Johannes

    IPC: G03F7/20

    CPC classification number: G03F7/70833 ,  G03F7/70725 ,  G03F7/709

    Abstract: A lithographic apparatus comprising: a positioning stage (WT); an isolation frame (300); a projection system (PS), comprising a first frame (210); a second frame (220); a supporting frame (10) for supporting the positioning stage; a first vibration isolation system (250) and a second vibration isolation system (270), wherein the supporting frame and the first frame are coupled via the first vibration isolation system; a stage position measurement system (400) to determine directly the position of a stage reference of an element of the positioning stage in one or more degrees of freedom with respect to an isolation frame reference of an element of the isolation frame; and wherein the first frame and the isolation frame are coupled via the second vibration isolation system.

    Abstract translation: 一种光刻设备，包括：定位台（WT）; 隔离框架（300）; 投影系统（PS），包括第一框架（210）; 第二框架（220）; 用于支撑所述定位台的支撑框架（10） 第一隔振系统（250）和第二隔振系统（270），其中所述支撑框架和所述第一框架经由所述第一隔振系统联接; 阶段位置测量系统（400），用于相对于所述隔离框架的元件的隔离框架参考，以一个或多个自由度直接确定所述定位台的元件的平台基准的位置; 并且其中所述第一框架和所述隔离框架经由所述第二隔振系统联接。

    LITHOGRAPHIC APPARATUS AND METHOD
    2.
    发明申请
    LITHOGRAPHIC APPARATUS AND METHOD 审中-公开
    LITHOGRAPHIC设备和方法

    公开(公告)号：WO2015197260A1

    公开(公告)日：2015-12-30

    申请号：PCT/EP2015/060618

    申请日：2015-05-13

    Applicant: ASML NETHERLANDS B.V.

    Inventor： BASELMANS, Johannes, Jacobus, Matheus ,  BUTLER, Hans ,  HOOGENDAM, Christiaan, Alexander ,  KERSSEMAKERS, Sander ,  SMEETS, Bart ,  VAN BALLEGOIJ, Robertus, Nicodemus, Jacobus ,  VAN BUSSEL, Hubertus, Petrus, Leonardus, Henrica

    IPC: G03F7/20 ,  G02B13/14

    CPC classification number: G03F7/70258 ,  G03F7/70066 ,  G03F7/70141 ,  G03F7/70641

    Abstract: A method of modifying a lithographic apparatus comprising an illumination system for providing a radiation beam, a support structure for supporting a patterning device to impart the radiation beam with a pattern in its cross-section, a first lens for projecting the radiation beam at the patterning device with a first magnification, a substrate table for holding a substrate, and a first projection system for projecting the patterned radiation beam at a target portion of the substrate with a second magnification. The first lens and the first projection system together provide a third magnification. The method comprises reducing by a first factor the first magnification to provide a second lens for projecting the radiation beam with a fourth magnification; and increasing by the first factor the second magnification to provide a second projection system for projecting the patterned radiation beam at the target portion of the substrate with a fifth magnification.

    Abstract translation: 一种修改包括用于提供辐射束的照明系统的光刻设备的方法，用于支撑图案形成装置以将辐射束赋予其横截面图案的支撑结构，用于将辐射束投射在图案化处的第一透镜 具有第一放大率的装置，用于保持基板的基板台，以及用于以第二倍率将图案化的辐射束投影在基板的目标部分的第一投影系统。 第一透镜和第一投影系统一起提供第三放大率。 该方法包括以第一因子减小第一倍率以提供用于以第四放大率投影辐射束的第二透镜; 并且通过第一因子增加第二倍率以提供第二投影系统，用于以第五放大率将图案化的辐射束投影到基板的目标部分。

    MULTIPHASE LINEAR MOTOR, MULTIPHASE PLANAR MOTOR, STAGE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    3.
    发明申请
    MULTIPHASE LINEAR MOTOR, MULTIPHASE PLANAR MOTOR, STAGE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
    多相线性电动机，多相平面电动机，级，光刻设备和器件制造方法

    公开(公告)号：WO2017137181A1

    公开(公告)日：2017-08-17

    申请号：PCT/EP2017/050199

    申请日：2017-01-05

    Applicant: ASML NETHERLANDS B.V.

    Inventor： KIMMAN, Maarten, Hartger ,  BRAAKSMA, Dave ,  HEIJMANS, Peter, Michel, Silvester, Maria ,  HOOGENDAM, Christiaan, Alexander

    IPC: H02K41/03 ,  H02K3/28 ,  H02K29/03 ,  H02K7/09

    CPC classification number: H02K41/031 ,  H02K3/28 ,  H02K7/09 ,  H02K29/03 ,  H02K2201/18 ,  H02K2213/03

    Abstract: An electromagnetic motor is described, the electromagnetic motor comprising: a magnet assembly configured to generate a two-dimensional alternating magnetic field having a pitch Pm1 in a first direction and a pitch Pm2 in a second direction; a coil assembly configured to co-operate with the magnet assembly to generate a first force in the first direction and a second force in the second direction, wherein the coil assembly comprises a first coil set comprising a plurality of first coils for generating the first force and a second coil set comprising a plurality of second coils for generating the second force, wherein a ratio R1 of a coil pitch Pc1 in the first coil set in the first direction over Pm1 is different from a ratio R2 of a coil pitch Pc2 in the second coil set in the second direction over Pm2.

    Abstract translation: 描述了一种电磁电动机，所述电磁电动机包括：磁体组件，所述磁体组件被配置为产生具有沿第一方向的节距Pm1和沿第二方向的节距Pm2的二维交变磁场; 线圈组件，所述线圈组件被配置为与所述磁体组件协作以在所述第一方向上产生第一力并且在所述第二方向上产生第二力，其中所述线圈组件包括第一线圈组，所述第一线圈组包括用于产生所述第一力的多个第一线圈 以及第二线圈组，其包括用于产生第二力的多个第二线圈，其中第一方向上的第一线圈组中的线圈节距Pc1与第一方向上的线圈节距Pc1之比R1与第一方向上的线圈节距Pc2之比R1 第二个线圈设置在第二个方向上超过Pm2。

    LITHOGRAPHIC APPARATUS AND METHOD
    7.
    发明申请
    LITHOGRAPHIC APPARATUS AND METHOD 审中-公开
    LITHOGRAPHIC设备和方法

    公开(公告)号：WO2016005117A1

    公开(公告)日：2016-01-14

    申请号：PCT/EP2015/062504

    申请日：2015-06-04

    Applicant: ASML NETHERLANDS B.V.

    Inventor： KERSSEMAKERS, Sander ,  DE BOEIJ, Wilhelmus, Petrus ,  DE LANGE, Gerben, Frank ,  HOOGENDAM, Christiaan, Alexander ,  VAN GILS, Petrus, Franciscus ,  KAMMINGA, Jelmer, Mattheüs ,  KUIT, Jan Jaap ,  SCHOORMANS, Carolus, Johannes, Catharina

    IPC: G03F7/20 ,  G03F1/00

    CPC classification number: G03F7/70425 ,  G03F7/70433 ,  G03F7/707 ,  G03F7/70716

    Abstract: A lithographic apparatus comprising a support structure configured to be moved by a first scan distance during a single scanning operation when supporting a patterning device having a first extent in the scanning direction and to be moved by a second scan distance during a single scanning operation when supporting a patterning device having a second extent in the scanning direction, and a substrate table configured to be moved by a third scan distance during a single scanning operation when the support structure supports a patterning device having the first extent in the scanning direction and to be moved by a fourth scan distance during a single scanning operation when the support structure supports a patterning device having the second extent in the scanning direction.

    Abstract translation: 一种光刻设备，包括支撑结构，该支撑结构构造成在单次扫描操作期间，当在单次扫描操作期间支撑具有第一扫描方向的扫描距离的图案形成装置时，在单次扫描操作期间移动第一扫描距离， 在扫描方向上具有第二范围的图案形成装置以及在单次扫描操作期间被移动第三扫描距离的基板台，当支撑结构支撑具有在扫描方向上具有第一范围的图案形成装置并被移动时 当支撑结构支撑具有在扫描方向上的第二范围的图案形成装置时，在单次扫描操作期间第四扫描距离。

    SUBSTRATE TABLE SYSTEM, LITHOGRAPHIC APPARATUS AND SUBSTRATE TABLE SWAPPING METHOD
    9.
    发明申请
    SUBSTRATE TABLE SYSTEM, LITHOGRAPHIC APPARATUS AND SUBSTRATE TABLE SWAPPING METHOD 审中-公开

    公开(公告)号：WO2013143777A3

    公开(公告)日：2013-10-03

    申请号：PCT/EP2013/053084

    申请日：2013-02-15

    Applicant: ASML NETHERLANDS B.V.

    Inventor： VAN DE VEN, Bastiaan, Lambertus, Wilhelmus, Marinus ,  DE GROOT, Antonius, Franciscus, Johannes ,  HOOGENDAM, Christiaan, Alexander ,  LOOPSTRA, Erik, Roelof ,  BUTLER, Hans

    IPC: G03F7/20

    Abstract: A substrate table system includes a substrate table (WT) and a dual directional motor for moving the substrate table in a plane of movement. The plane of movement is defined by a first direction and a second direction perpendicular to the first direction. The dual directional motor includes: a first pusher structure (FPS) extending in the first direction, the substrate table being movable in respect of the first pusher structure, the first pusher structure and the substrate table being arranged to cooperate so as to form a first motor arranged to exert a force between the first pusher structure and the substrate table in the first direction; and a second pusher structure (SPS) extending in the first direction, the substrate table being movable in respect of the second pusher structure (along the first and second directions), the second pusher structure and the substrate table being arranged to cooperate so as to form a second motor arranged to exert a force between the second pusher structure and the substrate table in the second direction.

Patent Agency Ranking