公开(公告)号：WO2022135948A1

公开(公告)日：2022-06-30

申请号：PCT/EP2021/084913

申请日：2021-12-09

Applicant: ASML NETHERLANDS B.V.

Inventor： XU, Huina ,  MATSUSHITA, Yana ,  HASAN, Tanbir ,  KOU, Ren-Jay ,  GOEL, Namita ,  LI, Hongmei ,  PISARENCO, Maxim ,  KOOIMAN, Marleen ,  BATISTAKIS, Chrysostomos ,  ONVLEE, Johannes

IPC: G06T7/00

Abstract: A method and apparatus for analyzing an input electron microscope image of a first area on a first wafer are disclosed. The method comprises obtaining a plurality of mode images from the input electron microscope image corresponding to a plurality of interpretable modes. The method further comprises evaluating the plurality of mode images, and determining, based on evaluation results, contributions from the plurality of interpretable modes to the input electron microscope image. The method also comprises predicting one or more characteristics in the first area on the first wafer based on the determined contributions. In some embodiments, a method and apparatus for performing an automatic root cause analysis based on an input electron microscope image of a wafer are also disclosed.

公开(公告)号：WO2022101051A1

公开(公告)日：2022-05-19

申请号：PCT/EP2021/080304

申请日：2021-11-02

Applicant: ASML NETHERLANDS B.V.

Inventor： LIN, Chenxi ,  ZOU, Yi ,  HASAN, Tanbir ,  XU, Huina ,  KOU, Ren-Jay ,  MOIN, Nabeel, Noor ,  NAFISI, Kourosh

IPC: G03F7/20

Abstract: A method and apparatus for identifying locations to be inspected on a substrate is disclosed. A defect location prediction model is trained using a training dataset associated with other substrates to generate a prediction of defect or non-defect and a confidence score associated with the prediction for each of the locations based on process-related data associated with the substrates. Those of the locations determined by the defect location prediction model as having confidences scores satisfying a confidence threshold are added to a set of locations to be inspected by an inspection system. After the set of locations are inspected, the inspection results data is obtained, and the defect location prediction model is incrementally trained by using the inspection results data and process-related data for the set of locations as training data.

公开(公告)号：WO2020094385A1

公开(公告)日：2020-05-14

申请号：PCT/EP2019/078689

申请日：2019-10-22

Applicant: ASML NETHERLANDS B.V.

Inventor： HUANG, Wenjin ,  LI, Hongmei ,  XU, Huina ,  LA FONTAINE, Bruno

IPC: G03F7/20

Abstract: Described herein is a method for determining a probabilistic model configured to predict a characteristic (e.g., defects, CD, etc.) of a pattern of a substrate subjected to a patterning process. The method includes obtaining a spatial map of a distribution of a residue corresponding to a characteristic of the pattern on the substrate, determining a zone of the spatial map based on a variation of the distribution of the residue within the spatial map, and determining the probabilistic model based on the zone and the distribution of the residue values or the values of the characteristic of the pattern on the substrate within the zone.

公开(公告)号：EP4244677A1

公开(公告)日：2023-09-20

申请号：EP21802689.6

申请日：2021-11-02

Applicant: ASML Netherlands B.V.

Inventor： LIN, Chenxi ,  ZOU, Yi ,  HASAN, Tanbir ,  XU, Huina ,  KOU, Ren-Jay ,  MOIN, Nabeel, Noor ,  NAFISI, Kourosh

IPC: G03F7/20