公开(公告)号：WO2018046284A1

公开(公告)日：2018-03-15

申请号：PCT/EP2017/070990

申请日：2017-08-21

Applicant: ASML NETHERLANDS B.V.

Inventor： KUMAR, Nitish ,  SCHELLEKENS, Adrianus, Johannes, Hendrikus ,  VAN DER POST, Sietse, Thijmen ,  ZIJP, Ferry ,  COENE, Willem, Marie, Julia, Marcel ,  VAN VOORST, Peter, Danny ,  AKBULUT, Duygu ,  ROY, Sarathi

IPC: G03F7/20

Abstract: An optical system delivers illuminating radiation and collects radiation after interaction with a target structure on a substrate. A measurement intensity profile is used to calculate a measurement of the property of the structure. The optical system may include a solid immersion lens. In a calibration method, the optical system is controlled to obtain a first intensity profile using a first illumination profile and a second intensity profile using a second illumination profile. The profiles are used to derive a correction for mitigating the effect of ghost reflections. Using, e.g., half-moon illumination profiles in different orientations, the method can measure ghost reflections even where a SIL would cause total internal reflection. The optical system may include a contaminant detection system to control a movement based on received scattered detection radiation. The optical system may include an optical component having a dielectric coating to enhance evanescent wave interaction.

Abstract translation: 光学系统在与基底上的目标结构相互作用之后提供照射辐射并收集辐射。 测量强度分布用于计算结构性质的测量值。 该光学系统可以包括固体浸没式透镜。 在校准方法中，控制光学系统以使用第一照射轮廓获得第一强度轮廓，并使用第二照射轮廓获得第二强度轮廓。 这些配置文件用于推导用于减轻重影反射影响的修正。 使用例如不同取向的半月照明轮廓，该方法即使在SIL会引起全内反射的情况下也可以测量重影反射。 光学系统可以包括污染物检测系统以基于接收到的散射检测辐射来控制移动。 该光学系统可以包括具有介电涂层的光学部件以增强瞬逝波相互作用。

公开(公告)号：WO2020233929A1

公开(公告)日：2020-11-26

申请号：PCT/EP2020/061185

申请日：2020-04-22

Applicant: ASML NETHERLANDS B.V.

Inventor： ZIJP, Ferry

IPC: G03F7/20 ,  G02B27/00

Abstract: A metrology tool, an aplanatic singlet lens, and a method of designing an aplanatic singlet lens are provided. The metrology tool is for determining a characteristic of a structure on a substrate. The metrology tool comprises an optical detection system for detecting radiation over a wavelength range. The optical detection system comprises an aplanatic singlet lens for focusing the radiation on to a detector. The aplanatic singlet lens has an aplanatic wavelength which is within the wavelength range.

公开(公告)号：WO2019238382A1

公开(公告)日：2019-12-19

申请号：PCT/EP2019/063352

申请日：2019-05-23

Applicant: ASML NETHERLANDS B.V.

Inventor： ZIJP, Ferry

IPC: G03F7/20 ,  G01N21/956 ,  G21K1/06

Abstract: A reflector comprising a hollow body having an interior surface defining a passage through the hollow body, the interior surface having at least one optical surface part configured to reflect radiation and a supporter surface part, wherein the optical surface part has a predetermined optical power and the supporter surface part does not have the predetermined optical power. The reflector is made by providing an axially symmetric mandrel; shaping a part of the circumferential surface of the mandrel to form at least one inverse optical surface part that is not rotationally symmetric about the axis of the mandrel; forming a reflector body around the mandrel; and releasing the reflector body from the mandrel whereby the reflector body has an optical surface defined by the inverse optical surface part and a supporter surface part defined by the rest of the outer surface of the mandrel.

公开(公告)号：WO2022069218A1

公开(公告)日：2022-04-07

申请号：PCT/EP2021/075268

申请日：2021-09-15

Applicant: ASML NETHERLANDS B.V.

Inventor： ZIJP, Ferry ,  CUNBUL, Ahmet, Burak

IPC: G02B3/04 ,  G01N21/47 ,  G02B3/08 ,  G02B5/00 ,  G02B27/00 ,  G02B27/12 ,  G02B13/00

Abstract: A lens system is disclosed, comprising: a first aspherical axicon lens element comprising a first refractive surface and a second refractive surface; a second aspherical axicon lens element comprising a third refractive surface similar to said second refractive surface and a fourth refractive surface similar to said first refractive surface, and an aperture stop located between the first aspherical axicon lens element and the second aspherical axicon lens element. The first aspherical axicon lens element and second aspherical axicon lens are mutually oriented such that second refractive surface and said third refractive surface are mutually facing. The first aspherical axicon lens element and the second aspherical axicon lens element are configured to minimize chromatic aberration for at least a spectral range of radiation relayed by the lens system.

公开(公告)号：WO2019042809A1

公开(公告)日：2019-03-07

申请号：PCT/EP2018/072432

申请日：2018-08-20

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DER POST, Sietse, Thijmen ,  BÄUMER, Stefan, Michael, Bruno ,  VAN VOORST, Peter, Danny ,  TUKKER, Teunis, Willem ,  ZIJP, Ferry ,  NIENHUYS, Han-Kwang ,  VAN DEN EERENBEEMD, Jacobus, Maria, Antonius

IPC: G21K1/06 ,  G03F7/00 ,  G03F7/20 ,  G02B17/04

Abstract: An optical system (OS) for focusing a beam of radiation (B) on a region of interest in a metrology apparatus is described. The beam of radiation (B) comprises radiation in a soft X-ray or Extreme Ultraviolet spectral range. The optical system (OS) comprises a first stage (S1) for focusing the beam of radiation at an intermediate focus region. The optical system (OS) comprises a second stage (S2) for focusing the beam of radiation from the intermediate focus region onto the region of interest. The first and second stages each comprise a Kirkpatrick-Baez reflector combination. At least one reflector comprises an aberration- correcting reflector.

公开(公告)号：WO2017060087A1

公开(公告)日：2017-04-13

申请号：PCT/EP2016/072412

申请日：2016-09-21

Applicant: ASML NETHERLANDS B.V.

Inventor： ZIJP, Ferry ,  VAN DER POST, Sietse, Thijmen ,  KONG, Fanhe ,  AKBULUT, Duygu

IPC: G03F7/20 ,  G03F9/00 ,  G02B21/24 ,  G01N21/956

CPC classification number: G03F7/70133 ,  G01N21/956 ,  G02B21/242 ,  G03F7/70625 ,  G03F7/70633

Abstract: A method including obtaining a plurality of radiation distributions of measurement radiation redirected by the target, each of the plurality of radiation distributions obtained at a different gap distance between the target and an optical element of a measurement apparatus, the optical element being the nearest optical element to the target used to provide the measurement radiation to the target, and determining a parameter related to the target using data of the plurality of radiation distributions in conjunction with a mathematical model describing the measurement target.

Abstract translation: 一种方法，包括获得由所述目标重定向的测量辐射的多个辐射分布，所述多个辐射分布中的每一个在所述目标和测量装置的光学元件之间的不同间隙距离处获得，所述光学元件是最近的光学元件 到用于向目标提供测量辐射的目标，以及结合描述测量目标的数学模型，使用多个辐射分布的数据来确定与目标相关的参数。

公开(公告)号：WO2017012857A1

公开(公告)日：2017-01-26

申请号：PCT/EP2016/065786

申请日：2016-07-05

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN DER POST, Sietse, Thijmen ,  ZIJP, Ferry ,  ROOBOL, Sander, Bas

IPC: G03F7/20

CPC classification number: G03F7/70633 ,  G03F7/705 ,  G03F7/70625 ,  G03F7/7085

Abstract: A method involving a radiation intensity distribution for a target measured using an optical component at a gap from the target, the method including: determining a value of a parameter of interest using the measured radiation intensity distribution and a mathematical model describing the target, the model including an effective medium approximation for roughness of a surface of the optical component or a part thereof.

Abstract translation: 一种涉及使用与目标间隔的光学部件测量的目标的辐射强度分布的方法，所述方法包括：使用所测量的辐射强度分布和描述所述目标的数学模型来确定感兴趣参数的值，所述模型 包括用于光学部件或其一部分的表面的粗糙度的有效介质近似。

公开(公告)号：WO2016177568A1

公开(公告)日：2016-11-10

申请号：PCT/EP2016/058640

申请日：2016-04-19

Applicant: ASML NETHERLANDS B.V.

Inventor： ZIJP, Ferry ,  AKBULUT, Duygu ,  VAN VOORST, Peter, Danny ,  VAN DE WIJDEVEN, Jeroen, Johan, Maarten ,  VAN BERKEL, Koos

IPC: G03F7/20 ,  G01N21/956 ,  G02B21/00

CPC classification number: G03F7/70591 ,  G01B11/14 ,  G01N21/956 ,  G02B5/3025 ,  G02B21/0016 ,  G02B21/33 ,  G03F7/70625 ,  G03F7/70633

Abstract: A method involving providing incident radiation of a first polarization state by an optical component into an interface of an object with an external environment, wherein a surface is provided adjacent the interface and separated by a gap from the interface, detecting, from incident radiation reflected from the interface and from the surface, radiation of a second different polarization state arising from the reflection of incident radiation of the first polarization at the interface as distinct from the radiation of the first polarization state in the reflected radiation, and producing a position signal representative of a relative position between the focus of the optical component and the object.

Abstract translation: 一种将由光学部件提供的第一偏振状态的入射辐射提供到物体与外部环境的界面的方法，其中，在界面附近设置一个表面，并与该界面间隔开一个间隙， 界面和表面上由与反射辐射中的第一偏振状态的辐射不同的在界面处的第一偏振的入射辐射的反射而产生的第二不同极化状态的辐射，并且产生表示 光学部件的焦点与物体之间的相对位置。

公开(公告)号：WO2016135166A2

公开(公告)日：2016-09-01

申请号：PCT/EP2016/053809

申请日：2016-02-24

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN BERKEL, Koos ,  AKBULUT, Duygu ,  VAN DE WIJDEVEN, Jeroen, Johan, Maarten ,  ZIJP, Ferry

IPC: G03F7/20 ,  G02B21/00 ,  G01N21/956

CPC classification number: G03F7/70775 ,  G01N21/956 ,  G02B21/0016 ,  G03F7/70625 ,  G03F7/70633 ,  G03F9/7019

Abstract: A method and apparatus for position control of a component relative to a surface is disclosed. The method may include calculating an estimated effect of, or derived from, Casimir force acting between the component and the surface, and compensating positioning of the component relative to the surface using the estimated effect.

Abstract translation: 公开了一种用于部件相对于表面的位置控制的方法和设备。 该方法可以包括计算作用于部件和表面之间的卡西米尔力的估计效果或者从其导出的卡西米尔力的估计效果，以及使用所估计的效果补偿部件相对于表面的定位。

公开(公告)号：WO2022117325A1

公开(公告)日：2022-06-09

申请号：PCT/EP2021/081764

申请日：2021-11-16

Applicant: ASML NETHERLANDS B.V.

Inventor： VERSCHUREN, Coen, Adrianus ,  ZIJP, Ferry ,  PANDEY, Nitesh ,  KONIJNENBERG, Alexander, Prasetya

IPC: G03F7/20 ,  G03F9/00 ,  G01N21/956 ,  G02B27/64 ,  G03F1/84

Abstract: Disclosed is an optical imaging system, and associated method, comprising a stage module configured to support an object such that an area of the object is illuminated by an illumination beam; an objective lens configured to collect at least one signal beam, the at least one signal beam originating from the illuminated area of the object; an image sensor configured to capture an image formed by the at least one signal beam collected by the objective lens; and a motion compensatory mechanism operable to compensate for relative motion of the stage module with respect to the objective lens during an image acquisition. The motion compensatory mechanism causes a compensatory motion of one or more of: said objective lens or at least one optical element thereof; said image sensor; and/or an optical element comprised within a detection branch and/or illumination branch of the optical imaging system.