中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

14 records (took 0.023 seconds)

    METHOD AND APPARATUS FOR INSPECTION AND METROLOGY
    1.
    发明申请
    METHOD AND APPARATUS FOR INSPECTION AND METROLOGY 审中-公开
    检验和计量方法与装置

    公开(公告)号：WO2016142214A2

    公开(公告)日：2016-09-15

    申请号：PCT/EP2016/054310

    申请日：2016-03-01

    Applicant: ASML NETHERLANDS B.V.

    Inventor： VAN VOORST, Peter, Danny ,  AKBULUT, Duygu ,  VAN BERKEL, Koos ,  VAN DE WIJDEVEN, Jeroen, Johan, Maarten ,  ZIJP, Ferry

    IPC: G03F7/20 ,  G02B21/00 ,  G01N21/956

    CPC classification number: G03F7/70483 ,  G01B11/00 ,  G01N21/956 ,  G02B21/0016 ,  G02B21/33 ,  G02B27/0988 ,  G03F7/70625 ,  G03F7/70633

    Abstract: A method of position control of an optical component relative to a surface is disclosed. The method may include: obtaining a first signal by a first position measurement process; controlling relative movement between the optical component and the surface for a first range of motion using the first signal; obtaining a second signal by a second position measurement process different than the first position measurement process; and controlling relative movement between the optical component and the surface for a second range of motion using the second signal, the second range of motion being nearer the surface than the first range of motion.

    Abstract translation: 公开了一种用于光学部件相对于表面的位置控制的方法。 该方法可以包括：通过第一位置测量处理获得第一信号; 使用所述第一信号控制所述光学部件和所述表面之间的第一运动范围的相对运动; 通过与第一位置测量处理不同的第二位置测量处理获得第二信号; 以及使用所述第二信号控制所述光学部件和所述表面之间的相对运动，所述第二运动范围比所述第一运动范围更靠近所述表面。

    METHOD AND APPARATUS FOR INSPECTION AND METROLOGY
    2.
    发明申请
    METHOD AND APPARATUS FOR INSPECTION AND METROLOGY 审中-公开
    检验和计量方法与装置

    公开(公告)号：WO2016177568A1

    公开(公告)日：2016-11-10

    申请号：PCT/EP2016/058640

    申请日：2016-04-19

    Applicant: ASML NETHERLANDS B.V.

    Inventor： ZIJP, Ferry ,  AKBULUT, Duygu ,  VAN VOORST, Peter, Danny ,  VAN DE WIJDEVEN, Jeroen, Johan, Maarten ,  VAN BERKEL, Koos

    IPC: G03F7/20 ,  G01N21/956 ,  G02B21/00

    CPC classification number: G03F7/70591 ,  G01B11/14 ,  G01N21/956 ,  G02B5/3025 ,  G02B21/0016 ,  G02B21/33 ,  G03F7/70625 ,  G03F7/70633

    Abstract: A method involving providing incident radiation of a first polarization state by an optical component into an interface of an object with an external environment, wherein a surface is provided adjacent the interface and separated by a gap from the interface, detecting, from incident radiation reflected from the interface and from the surface, radiation of a second different polarization state arising from the reflection of incident radiation of the first polarization at the interface as distinct from the radiation of the first polarization state in the reflected radiation, and producing a position signal representative of a relative position between the focus of the optical component and the object.

    Abstract translation: 一种将由光学部件提供的第一偏振状态的入射辐射提供到物体与外部环境的界面的方法，其中，在界面附近设置一个表面，并与该界面间隔开一个间隙， 界面和表面上由与反射辐射中的第一偏振状态的辐射不同的在界面处的第一偏振的入射辐射的反射而产生的第二不同极化状态的辐射，并且产生表示 光学部件的焦点与物体之间的相对位置。

    ILLUMINATION SOURCE FOR AN INSPECTION APPARATUS, INSPECTION APPARATUS AND INSPECTION METHOD
    3.
    发明申请
    ILLUMINATION SOURCE FOR AN INSPECTION APPARATUS, INSPECTION APPARATUS AND INSPECTION METHOD 审中-公开
    检查设备的照明源，检查设备和检查方法

    公开(公告)号：WO2018050350A1

    公开(公告)日：2018-03-22

    申请号：PCT/EP2017/069506

    申请日：2017-08-02

    Applicant: ASML NETHERLANDS B.V.

    Inventor： VAN VOORST, Peter, Danny ,  LIN, Nan ,  ROOBOL, Sander, Bas ,  MATHIJSSEN, Simon, Gijsbert, Josephus ,  VAN DER POST, Sietse, Thijmen

    IPC: G01N21/95 ,  G03F7/20

    Abstract: Disclosed is an inspection apparatus and associated method for measuring a target structure on a substrate. The inspection apparatus comprises an illumination source for generating measurement radiation; an optical arrangement for focusing the measurement radiation onto said target structure; and a compensatory optical device. The compensatory optical device may comprise an SLM operable to spatially modulate the wavefront of the measurement radiation so as to compensate for a non-uniform manufacturing defect in said optical arrangement. In alternative embodiments, the compensatory optical device may be located in the beam of measurement radiation, or in the beam of pump radiation used to generate high harmonic radiation in a HHG source. Where located in in the beam of pump radiation, the compensatory optical device may be used to correct pointing errors, or impart a desired profile or varying illumination pattern in a beam of the measurement radiation.

    Abstract translation: 公开了一种用于测量基板上的目标结构的检查设备和相关联的方法。 检查设备包括用于产生测量辐射的照明源; 用于将测量辐射聚焦到所述目标结构上的光学装置; 和补偿光学装置。 补偿光学装置可以包括SLM，SLM可操作用于空间调制测量辐射的波前，以补偿所述光学装置中的不均匀制造缺陷。 在替代实施例中，补偿光学装置可以位于测量辐射束中，或位于用于在HHG源中产生高次谐波辐射的泵浦辐射束中。 在位于泵浦辐射光束中的情况下，补偿光学装置可以用于校正指向误差，或者在测量辐射光束中赋予期望的轮廓或变化的照明图案。

    METHOD AND APPARATUS FOR DERIVING CORRECTIONS, METHOD AND APPARATUS FOR DETERMINING A PROPERTY OF A STRUCTURE, DEVICE MANUFACTURING METHOD
    4.
    发明申请
    METHOD AND APPARATUS FOR DERIVING CORRECTIONS, METHOD AND APPARATUS FOR DETERMINING A PROPERTY OF A STRUCTURE, DEVICE MANUFACTURING METHOD 审中-公开
    用于导出校正的方法和装置，用于确定结构特性的方法和装置，装置制造方法

    公开(公告)号：WO2018046284A1

    公开(公告)日：2018-03-15

    申请号：PCT/EP2017/070990

    申请日：2017-08-21

    Applicant: ASML NETHERLANDS B.V.

    Inventor： KUMAR, Nitish ,  SCHELLEKENS, Adrianus, Johannes, Hendrikus ,  VAN DER POST, Sietse, Thijmen ,  ZIJP, Ferry ,  COENE, Willem, Marie, Julia, Marcel ,  VAN VOORST, Peter, Danny ,  AKBULUT, Duygu ,  ROY, Sarathi

    IPC: G03F7/20

    Abstract: An optical system delivers illuminating radiation and collects radiation after interaction with a target structure on a substrate. A measurement intensity profile is used to calculate a measurement of the property of the structure. The optical system may include a solid immersion lens. In a calibration method, the optical system is controlled to obtain a first intensity profile using a first illumination profile and a second intensity profile using a second illumination profile. The profiles are used to derive a correction for mitigating the effect of ghost reflections. Using, e.g., half-moon illumination profiles in different orientations, the method can measure ghost reflections even where a SIL would cause total internal reflection. The optical system may include a contaminant detection system to control a movement based on received scattered detection radiation. The optical system may include an optical component having a dielectric coating to enhance evanescent wave interaction.

    Abstract translation: 光学系统在与基底上的目标结构相互作用之后提供照射辐射并收集辐射。 测量强度分布用于计算结构性质的测量值。 该光学系统可以包括固体浸没式透镜。 在校准方法中，控制光学系统以使用第一照射轮廓获得第一强度轮廓，并使用第二照射轮廓获得第二强度轮廓。 这些配置文件用于推导用于减轻重影反射影响的修正。 使用例如不同取向的半月照明轮廓，该方法即使在SIL会引起全内反射的情况下也可以测量重影反射。 光学系统可以包括污染物检测系统以基于接收到的散射检测辐射来控制移动。 该光学系统可以包括具有介电涂层的光学部件以增强瞬逝波相互作用。

    OPTICAL SYSTEM, METROLOGY APPARATUS AND ASSOCIATED METHOD
    5.
    发明申请
    OPTICAL SYSTEM, METROLOGY APPARATUS AND ASSOCIATED METHOD 审中-公开

    公开(公告)号：WO2020057870A1

    公开(公告)日：2020-03-26

    申请号：PCT/EP2019/071830

    申请日：2019-08-14

    Applicant: ASML NETHERLANDS B.V.

    Inventor： VAN VOORST, Peter, Danny

    IPC: G03F7/20 ,  G01N21/88 ,  G01N21/95 ,  G02B17/02 ,  G01N21/956

    Abstract: There is described an optical system (400) for focusing a beam of radiation (B) on a region of interest of a substrate in a metrology apparatus. The beam of radiation comprises radiation in a soft X-ray or Extreme Ultraviolet spectral range. The optical system comprises a first reflector system (410) and a second reflector system (412). Each of the first and second reflector systems (410, 412) comprises a finite-to-finite Wolter reflector system. The optical system (400) is configured to form, on the region of interest, a demagnified image (414) of an object (416) comprising an apparent source of the beam of radiation (B).

Patent Agency Ranking