公开(公告)号：JP2007019031A

公开(公告)日：2007-01-25

申请号：JP2006211722

申请日：2006-08-03

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： ZUKAVISHVILI GIVI GEORGIEVITCH ,  IVANOV VLADIMIR VITAL EVITCH ,  KOSHELEV KONSTANTIN NIKOLAEVIT ,  KOROB EVGENII DMITREEVITCH ,  BANINE VADIM YEVGENYEVICH ,  PAVEL STANISLAVOVICH ANTSIFERO

IPC: G21K5/00 ,  H05G2/00 ,  F28D15/02 ,  G03F7/20 ,  G21K1/00 ,  G21K5/02 ,  G21K5/08 ,  H01L21/027 ,  H05G1/02 ,  H05H1/24

CPC classification number: H05G2/003 ,  B82Y10/00 ,  F28D15/0266 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70916 ,  H05G2/005

Abstract: PROBLEM TO BE SOLVED: To improve efficiency of conversion of electrical energy to radiation.
SOLUTION: To improve conversion efficiency of a radiation source including an anode and a cathode, the anode and the cathode being configured and arranged to create a discharge in a substance in a space between the anode and cathode and to form plasma so as to generate electromagnetic radiation, the radiation source unit is constructed to have a low inductance and to operate with a minimum of plasma. To improve heat dissipation, a fluid circulation system is created within the radiation source space and a wick by using a fluid in both its vapor and liquid phases. To prevent contamination from entering a lithographic projection apparatus, the radiation source unit is constructed to minimize the production of contamination, and a trap is employed to capture the contamination without interfering with the emitted radiation.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提高电能转换到辐射的效率。 解决方案：为了提高包括阳极和阴极的辐射源的转换效率，阳极和阴极被配置和布置成在阳极和阴极之间的空间中的物质中产生放电并形成等离子体，以便 为了产生电磁辐射，辐射源单元被构造为具有低电感并且以最小的等离子体进行操作。 为了改善散热，在辐射源空间和油雾中通过在气相和液相中使用流体产生流体循环系统。 为了防止污染进入光刻投影装置，辐射源单元被构造成使污染物的产生最小化，并且使用捕集阱来捕获污染物而不干扰所发射的辐射。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2004165160A

公开(公告)日：2004-06-10

申请号：JP2003376283

申请日：2003-09-30

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： ZUKAVISHVILI GIVI GEORGIEVITCH ,  IVANOV VLADIMIR VITAL EVITCH ,  KOSHELEV KONSTANTIN NIKOLAEVIT ,  KOROB EVGENII DMITREEVITCH ,  BANINE VADIM YEVGENYEVICH ,  PAVEL STANISLAVOVICH ANTSIFERO

IPC: G21K5/00 ,  F28D15/02 ,  G03F7/20 ,  G21K5/02 ,  G21K5/08 ,  H01L21/027 ,  H05G2/00 ,  H05H1/24

CPC classification number: H05G2/003 ,  B82Y10/00 ,  F28D15/0266 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70916 ,  H05G2/005

Abstract: PROBLEM TO BE SOLVED: To provide a radiation source that improves the conversion efficiency of electric energy into radiation.
SOLUTION: A radiation source unit comprises an anode and a cathode that are configured and arranged to create discharge in a substance in a space between the anode and the cathode to form plasma so as to generate electromagnetic radiation. The liquid may comprises xenon, indium, lithium, tin, or an arbitrary suitable material. In order to improve the conversion efficiency, the radiation source unit is constructed to have low inductance and operated with the minimum of plasma. In order to improve heat dissipation, a liquid circulation system is created in the radiation source space and a wick by using a fluid in both vapor and liquid phases. In order to prevent contamination from entering a lithographic projection apparatus, the radiation source unit is constructed to minimize the generation of contamination, and a trap is employed to capture the contamination without interfering with the emitted radiation.
COPYRIGHT: (C)2004,JPO

Abstract translation: 要解决的问题：提供一种提高电能转换成辐射的转换效率的辐射源。 解决方案：辐射源单元包括阳极和阴极，其构造和布置成在阳极和阴极之间的空间中的物质中产生放电，以形成等离子体，从而产生电磁辐射。 液体可以包括氙，铟，锂，锡或任意合适的材料。 为了提高转换效率，辐射源单元被构造为具有低电感并且以最小的等离子体运行。 为了改善散热，通过在气相和液相中使用流体，在辐射源空间和芯中产生液体循环系统。 为了防止污染进入光刻投影设备，辐射源单元被构造成使污染物的产生最小化，并且采用陷阱来捕获污染物而不干扰所发射的辐射。 版权所有（C）2004，JPO

公开(公告)号：JP2003007611A

公开(公告)日：2003-01-10

申请号：JP2002001119

申请日：2002-01-08

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： KOSTER NORBERTUS BENEDICTUS ,  MERTENS BASTIAAN MATTHIAS ,  LEENDERS MARTINUS HENDRIKUS AN ,  IVANOV VLADIMIR VITAL EVITCH ,  KOSHELEV KONSTANTIN NIKOLAEVIT ,  BANINE VADIM YEVGENYEVICH

IPC: B03C3/38 ,  G03F7/20 ,  H01J27/02 ,  H01J37/08 ,  H01L21/027

CPC classification number: G03F7/70908 ,  G03F7/70916 ,  G03F7/70933

Abstract: PROBLEM TO BE SOLVED: To remove unwanted contaminants generated by a radiation source. SOLUTION: Contaminant particles which move together with a projected beam are ionized. A purge gas can be attracted toward a gettering plate provided on the upstream of a purge gas supply source. The ionization of the purge gas is improved, by enclosing electrons generated by an ionizing device by means of a magnetic field. The contaminant particles can be ionized, by generating a plasma in a pipe having a larger length than its width.

Abstract translation: 要解决的问题：去除由辐射源产生的不需要的污染物。 解决方案：与投射光束一起移动的污染物颗粒被电离。 净化气体可以被吸引到设置在净化气体供应源的上游的吸气板。 吹扫气体的电离通过用磁场封闭由电离装置产生的电子而得到改善。 可以通过在具有比其宽度更大的长度的管中产生等离子体来使污染物颗粒离子化。

公开(公告)号：JP2007305992A

公开(公告)日：2007-11-22

申请号：JP2007120962

申请日：2007-05-01

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KOSHELEV KONSTANTIN NIKOLAEVIT ,  BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITAL EVITCH ,  KIEFT ERIK RENE ,  LOOPSTRA ERIK ROELOF ,  STEVENS LUCAS HENRICUS JOHANNE ,  SIDELKOV YURII VICTOROVITCH ,  KOLOSHNIKOV VSEVOLOD GRIGOREVI ,  KRIVTSUN VLADIMIR MIHAILOVITCH ,  GAYAZOV ROBERT RAFILEVITCH ,  FRIJNS OLAV WALDEMAR VLADIMIR

IPC: G21K5/00 ,  H01L21/027 ,  F28D15/02 ,  G03F7/20 ,  G21K5/02 ,  G21K5/08 ,  H05G2/00 ,  H05H1/24

CPC classification number: H05G2/003 ,  B82Y10/00 ,  F28D15/0266 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70916 ,  H05G2/005

Abstract: PROBLEM TO BE SOLVED: To provide a radiation source that actualizes an output level and a repetition rate suitable for manufacturing. SOLUTION: A radiation source comprises an anode and a cathode that are configured and arranged to create a discharge in a gas or a vapor in a space between the anode and cathode for forming a plasma so as to generate electromagnetic radiation. The gas or vapor may contain xenon, indium, lithium and/or tin. To improve heat dissipation, the radiation source comprises multiple plasma discharge elements, each of which is used only for short intervals. After one discharge element is used, another discharge element is selected. To improve an exact timing of pinch formation and thus that of pulse of EUV radiation, the radiation source comprises a triggering device. To improve conversion efficiency, the radiation source is configured to have a low inductance, and operates in a self-triggering mode. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供实现适合于制造的输出电平和重复率的辐射源。 解决方案：辐射源包括阳极和阴极，其构造和布置成在阳极和阴极之间的空间中的气体或蒸汽中产生放电，以形成等离子体，以便产生电磁辐射。 气体或蒸汽可以含有氙，铟，锂和/或锡。 为了改善散热，辐射源包括多个等离子体放电元件，每个等离子体放电元件仅用于短时间间隔。 在使用一个放电元件之后，选择另一个放电元件。 为了提高夹紧形成的准确时间，并且因此提高EUV辐射脉冲的准确时间，辐射源包括触发装置。 为了提高转换效率，辐射源被配置为具有低电感，并以自触发模式工作。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2007110107A

公开(公告)日：2007-04-26

申请号：JP2006258963

申请日：2006-09-25

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITAL EVITCH ,  SMITS JOSEPHUS JACOBUS ,  LAMBERTUS ADRIANUS VAN DEN WIL ,  KRIVTSUN VLADIMIR M ,  STRUYCKEN ALEXANDER MATTHIJS ,  RIDDER JOHANNES B ,  VOORMA HARM-JAN ,  SPEE CAROLUS IDA MARIA ANTONIU ,  KLAAS TIMMER

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/304

CPC classification number: G03B7/20 ,  B08B7/00 ,  G01J1/0271 ,  G03F7/70175 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70975

Abstract: PROBLEM TO BE SOLVED: To remove a deposit on an optical element such as a radiating condenser of an aligner. SOLUTION: In a method for cleaning a deposit of the radiating condenser; a collector assembly has a radiating condenser, a cover plate, and a support for connecting the radiating condenser to the cover plate. The cover plate is provided so as to cover the opening of a collector chamber 48. The opening may be large enough to allow the passage of the radiating condenser and the support. The radiating condenser is cleaned by different cleaning processing. This processing is performed by a cleaner. The cleaner may include a surrounding cover designed to form a storage capacity surrounding at least the radiating condenser, an inlet configured to supply at least one of cleaning gas and a cleaning solution to the storage capacity to clean at least the radiating condenser, and an outlet configured to remove at least one of the cleaning gas and the cleaning solution from the storage capacity. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：去除诸如对准器的辐射冷凝器的光学元件上的沉积物。 解决方案：用于清洁辐射冷凝器沉积物的方法; 集电器组件具有辐射冷凝器，盖板和用于将辐射冷凝器连接到盖板的支撑件。 盖板设置成覆盖收集器室48的开口。开口可以足够大以允许辐射冷凝器和支撑件通过。 通过不同的清洁处理清洁辐射式冷凝器。 该处理由清洁器执行。 清洁器可以包括设计成形成至少围绕辐射冷凝器的存储容量的周围盖子，被配置为将清洁气体和清洁溶液中的至少一种供应到存储容量以至少清洁辐射冷凝器的入口，以及出口 被配置为从所述存储容量中去除所述清洁气体和所述清洁溶液中的至少一个。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2004165155A

公开(公告)日：2004-06-10

申请号：JP2003363845

申请日：2003-09-17

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： KOSHELEV KONSTANTIN NIKOLAEVIT ,  BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITAL EVITCH ,  KIEFT ERIK RENE ,  LOOPSTRA ERIK ROELOF ,  STEVENS LUCAS HENRICUS JOHANNE ,  SIDELKOV YURII VICTOROVITCH ,  KOLOSHNIKOV VSEVOLOD GRIGOREVI ,  KRIVTSUN VLADIMIR MIHAILOVITCH ,  GAYAZOV ROBERT RAFILEVITCH ,  FRIJNS OLAV WALDEMAR VLADIMIR

IPC: G21K5/00 ,  F28D15/02 ,  G03F7/20 ,  G21K5/02 ,  G21K5/08 ,  H01L21/027 ,  H05G2/00 ,  H05H1/24

CPC classification number: H05G2/003 ,  B82Y10/00 ,  F28D15/0266 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70916 ,  H05G2/005

Abstract: PROBLEM TO BE SOLVED: To provide a radiation source in which an output level and a repeating speed that are suitable for production are realized.
SOLUTION: The radiation source comprises an anode 220 and a cathode 210 that are configured and arranged to create a discharge in a gas or vapor in a space between the anode 220 and cathode 210 to form a plasma pinch so as to generate electromagnetic radiation. The gas or vapor may comprise xenon, indium, lithium, and tin. In order to improve heat dissipation, the radiation source LA comprises a plurality of plasma discharge elements 240, each of which is only used for short intervals, after which another discharge element is selected.
COPYRIGHT: (C)2004,JPO

公开(公告)号：DE60139532D1

公开(公告)日：2009-09-24

申请号：DE60139532

申请日：2001-06-29

Applicant: ASML NETHERLANDS BV

Inventor： KOSHELEV KONSTANTIN NIKOLAEVITCH ,  BIJKERK FREDERIK ,  ZUKAVISHVILI GIVI GEORGIEVITCH ,  KOROP EVGENII DMITREEVITCH ,  IVANOV VLADIMIR VITAL EVITCH

IPC: G21K5/02 ,  H05G2/00 ,  G03F7/20 ,  H01L21/027 ,  H05H1/24

Abstract: A radiation source comprises an anode and a cathode for creating a discharge in a gas or vapor in a space between anode and cathode and to form a plasma of a working gas or vapor so as to generate electromagnetic radiation. The cathode comprises a hollow cavity having an aperture that has a substantially annular configuration around a central axis of said radiation source for initiating the discharge. A driver gas or vapor is supplied to the cathode cavity and the working gas or vapor is supplied in a region around the central axis in between anode and cathode. The working gas or vapor may comprise xenon, lithium vapor and tin vapor.

公开(公告)号：DE60227304D1

公开(公告)日：2008-08-14

申请号：DE60227304

申请日：2002-01-08

Applicant: ASML NETHERLANDS BV

Inventor： KOSTER NORBERTUS BENEDICTUS ,  MERTENS BASTIAAN MATTHIAS ,  LEENDERS MARTINUS HENDRIKUS AN ,  IVANOV VLADIMIR VITAL EVITCH ,  KOSHELEV KONSTANTIN NIKOLAEVIT ,  BANINE VADIM YEVGENYEVICH

IPC: G03F7/20 ,  B03C3/38 ,  H01J27/02 ,  H01J37/08 ,  H01L21/027

Abstract: Contaminant particles travelling with a projection beam in a lithographic projection apparatus are ionized. A purge gas may be attracted towards getter plates provided upstream of the purge gas supply. A magnetic field traps electrons generated by the ionizer to improve the ionization of the purge gas. The contaminant particles can be ionized by generating a plasma in a tube having a greater length than width.