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    Barrier member and lithographic apparatus
    1.
    发明专利
    Barrier member and lithographic apparatus 有权
    障碍物成员和平面设备

    公开(公告)号：JP2012142625A

    公开(公告)日：2012-07-26

    申请号：JP2012099767

    申请日：2012-04-25

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BECKERS MARCEL ,  VAN DE KERKHOF MARCUS A ,  SIEBE LANDHEER ,  MAAS WOUTERUS JOHANNES PETRUS MARIA ,  BRUIJSTENS JEROEN PETER JOHANNES ,  THOMAS IVO ADAM JOHANNES ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  VAN OERLE BARTHOLOMEUS MATHIAS

    IPC: H01L21/027

    CPC classification number: G03F7/70341 ,  G03F7/70808 ,  G03F7/70958

    Abstract: PROBLEM TO BE SOLVED: To limit the movement of immersion liquid in a gap between immersion system structure and a projection system, and to reduce the quantity of immersion liquid that escapes the immersion system through the gap.SOLUTION: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The lithographic apparatus also includes a barrier member, surrounding a space between the projection system, and the substrate in use, to define in part with the projection system a reservoir for liquid. A radially outer surface of the barrier member facing a portion of the projection system and a radially outer surface of the portion of the projection system facing the barrier member each have a lyophobic outer surface. The lyophobic outer surface of the barrier member and/or the lyophobic outer surface of the portion of the projection system has an inner edge that defines in part the reservoir.

    Abstract translation: 要解决的问题：为了限制浸没液体在浸没系统结构和投影系统之间的间隙中的移动，并且减少通过间隙逸出浸没系统的浸液的量。 解决方案：光刻设备包括被配置为将图案化的辐射束投影到基板的目标部分上的投影系统。 光刻设备还包括围绕投影系统和使用中的基板之间的空间的阻挡构件，以部分地将投影系统限定为用于液体的储存器。 面向突出系统的一部分的阻挡构件的径向外表面和面向阻挡构件的突出系统的部分的径向外表面各自具有疏液外表面。 屏障构件的疏液外表面和/或突出系统部分的疏液外表面具有部分限定储存器的内边缘。 版权所有（C）2012，JPO＆INPIT

    Lithography device and method of operating lithography device
    2.
    发明专利
    Lithography device and method of operating lithography device 有权
    LITHOGRAPHY设备和操作LITHOGRAPHY设备的方法

    公开(公告)号：JP2010074159A

    公开(公告)日：2010-04-02

    申请号：JP2009208753

    申请日：2009-09-10

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BRUIJSTENS JEROEN PETER JOHANNES ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  SIEBE LANDHEER ,  MEESTER ARNOUT JOHANNES ,  JANSEN BAUKE ,  THOMAS IVO ADAM JOHANNES ,  MIRANDA MARCIO ALEXANDRE CANO ,  TANASA GHEORGHE

    IPC: H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To provide a system that reduces an influence of a droplet on a final optical element, or substantially avoids the formation of such a droplet. SOLUTION: This lithography device includes: a projection system PS; and a liquid confinement structure for at least partially confining an immersion liquid in an immersion space demarcated by the projection system, a liquid confinement structure 12, and also a substrate and/or a substrate table. A wet gas space for confining a wet gas is demarcated among the projection system, the liquid confinement structure, and the immersion liquid in the immersion space. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种降低液滴对最终光学元件的影响的系统，或基本避免形成这样的液滴。 解决方案：该光刻设备包括：投影系统PS; 以及用于至少部分地将浸没液体限制在由投影系统划分的浸没空间中的液体限制结构，液体限制结构12以及基底和/或基底台。 在投影系统，液体限制结构和浸没空间中的浸没液体之间划定用于限制湿气体的湿气空间。 版权所有（C）2010，JPO＆INPIT

    Lithographic device, and method of manufacturing device
    4.
    发明专利
    Lithographic device, and method of manufacturing device 有权
    光刻设备及其制造方法

    公开(公告)号：JP2011003900A

    公开(公告)日：2011-01-06

    申请号：JP2010137799

    申请日：2010-06-17

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： JACOBS JOHANNES HENRICUS WILHELMUS ,  JANSEN HANS ,  BRUIJSTENS JEROEN PETER JOHANNES ,  THOMAS IVO ADAM JOHANNES ,  KUSTERS GERARDUS ADRIANUS ANTONIUS MARIA ,  MIRANDA MARCIO ALEXANDRE CANO ,  TANASA GHEORGHE

    IPC: H01L21/027

    CPC classification number: G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic device capable of keeping the position of a liquid as constant as possible by controlling the position of an immersion liquid in the immersion lithographic device.SOLUTION: The immersion lithographic device includes a curved surface that is curved so that drainage force of surface tension acts in a certain direction on a film of an immersion liquid on the curved surface. In relation to a liquid trapping structure constructed or configured to trap a liquid in an immersion space between a final element of a projection system and a board table and/or a board supported to the board table, a liquid trapping structure is also provided including a curved surface that is curved so that drainage force of surface tension acts in a certain direction on a film of an immersion liquid on the curved surface.

    Abstract translation: 要解决的问题：提供一种能够通过控制浸没式光刻设备中的浸液的位置来保持液体位置尽可能恒定的浸没式光刻设备。解决方案：浸没式光刻设备包括弯曲的曲面 使得表面张力的排水力在弯曲表面上的浸没液体的膜上沿某一方向作用。 关于构造或构造成将液体捕获到投影系统的最终元件和板台之间的浸没空间中的液体捕获结构和/或支撑在板台上的板，还提供了液体捕获结构，其包括 弯曲的曲面，使得表面张力的排水力在一定方向上作用在弯曲表面上的浸没液体的膜上。

    Lithographic apparatus and device manufacturing method
    7.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2011238961A

    公开(公告)日：2011-11-24

    申请号：JP2011164018

    申请日：2011-07-27

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VAN DE KERKHOF MARCUS ADRIANUS ,  SIEBE LANDHEER ,  BECKERS MARCEL ,  BRUIJSTENS JEROEN PETER JOHANNES ,  JANSSEN FRANCISCUS JOHANNES JOSEPH

    IPC: H01L21/027

    CPC classification number: G03F7/70341 ,  G03B27/52

    Abstract: PROBLEM TO BE SOLVED: To reduce a heat load applied to a projection system and/or an immersion system.SOLUTION: A lithographic apparatus comprises a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also comprises a barrier member surrounding a space between the substrate in use and the projection system, to define in part with the final element a reservoir for liquid. The barrier member is spaced from the final element to define a gap therebetween. The apparatus further comprises a deformable seal between a radially outer surface of the final element and a radially outer surface of the barrier member. The deformable seal is configured to substantially prevent a gas from flowing past the seal towards or away from the reservoir of liquid.

    Abstract translation: 要解决的问题：减少施加到投影系统和/或浸没系统的热负荷。 解决方案：光刻设备包括投影系统，该投影系统被配置为将图案化的辐射束投影到基板的目标部分上。 投影系统具有最终元素。 该装置还包括围绕使用中的基板和投影系统之间的空间的阻挡构件，以部分地限定最终元件用于液体的储存器。 阻挡构件与最终元件间隔开，以在它们之间形成间隙。 该装置还包括在最终元件的径向外表面和阻挡构件的径向外表面之间的可变形密封件。 可变形密封件被构造成基本上防止气体流过密封件朝向或远离液体容器流动。 版权所有（C）2012，JPO＆INPIT

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