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    Lithographic apparatus
    3.
    发明专利
    Lithographic apparatus 有权
    LITHOGRAPHIC设备

    公开(公告)号：JP2012124539A

    公开(公告)日：2012-06-28

    申请号：JP2012071249

    申请日：2012-03-27

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： JACOBS JOHANNES HENRICUS WILHELMUS ,  TEN KATE NICOLAAS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LOOPSTRA ERIK ROELOF ,  VERHAGEN MARTINUS CORNELIS MARIA ,  BOOM HERMAN ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  BOUCHOMS IGOR PETRUS MARIA ,  KEMPER NICOLAAS R ,  OTTENS JOOST JEROEN ,  KOEK YUECEL ,  VAN ES JOHANNES

    IPC: H01L21/027

    CPC classification number: G03F7/70341 ,  G03F7/70716 ,  G03F7/70875

    Abstract: PROBLEM TO BE SOLVED: To provide a system that efficiently and effectively eliminates such energy loss in a lithographic apparatus as occurs by evaporation of a provided liquid which locally cools associated components leading to deformations and deterioration that may cause defocus and lens aberration in immersion lithography where a space between a projection system and a substrate is filled with an immersion liquid to increase the numerical aperture.SOLUTION: A timetable 34 is prepared which comprises information regarding the time and the position, the speed, the acceleration etc. of the substrate W at which evaporation of a provided liquid 11 is most likely to occur. A liquid evaporation controller 30 heats at least a part of the substrate W by a heater or sends humidified air to prevent local evaporation, according to the timetable 34.

    Abstract translation: 要解决的问题：提供一种系统，其有效地和有效地消除光刻设备中的这种能量损失，如通过蒸发局部冷却相关部件的所提供的液体而发生的，导致变形和劣化，这可能导致散焦和透镜像差 浸没光刻，其中投影系统和衬底之间的空间被浸没液体填充以增加数值孔径。 解决方案：制备时间表34，其包括关于最可能发生所提供的液体11的蒸发的基板W的时间和位置，速度，加速度等的信息。 液体蒸发控制器30根据时间表34通过加热器加热至少一部分基板W或者发送加湿空气以防止局部蒸发。版权所有（C）2012，JPO＆INPIT

    Lithographic apparatus and device manufacturing method
    4.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2011238961A

    公开(公告)日：2011-11-24

    申请号：JP2011164018

    申请日：2011-07-27

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VAN DE KERKHOF MARCUS ADRIANUS ,  SIEBE LANDHEER ,  BECKERS MARCEL ,  BRUIJSTENS JEROEN PETER JOHANNES ,  JANSSEN FRANCISCUS JOHANNES JOSEPH

    IPC: H01L21/027

    CPC classification number: G03F7/70341 ,  G03B27/52

    Abstract: PROBLEM TO BE SOLVED: To reduce a heat load applied to a projection system and/or an immersion system.SOLUTION: A lithographic apparatus comprises a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also comprises a barrier member surrounding a space between the substrate in use and the projection system, to define in part with the final element a reservoir for liquid. The barrier member is spaced from the final element to define a gap therebetween. The apparatus further comprises a deformable seal between a radially outer surface of the final element and a radially outer surface of the barrier member. The deformable seal is configured to substantially prevent a gas from flowing past the seal towards or away from the reservoir of liquid.

    Abstract translation: 要解决的问题：减少施加到投影系统和/或浸没系统的热负荷。 解决方案：光刻设备包括投影系统，该投影系统被配置为将图案化的辐射束投影到基板的目标部分上。 投影系统具有最终元素。 该装置还包括围绕使用中的基板和投影系统之间的空间的阻挡构件，以部分地限定最终元件用于液体的储存器。 阻挡构件与最终元件间隔开，以在它们之间形成间隙。 该装置还包括在最终元件的径向外表面和阻挡构件的径向外表面之间的可变形密封件。 可变形密封件被构造成基本上防止气体流过密封件朝向或远离液体容器流动。 版权所有（C）2012，JPO＆INPIT

    Lithographic apparatus and device manufacturing method
    5.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2012069981A

    公开(公告)日：2012-04-05

    申请号：JP2011250615

    申请日：2011-11-16

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： JANSEN HANS ,  STAVENGA MARCO KOERT ,  FELSPINE JACOBUS JOHANNES LEONARDUS HENDRICKS ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  KUIPER ANTONY

    IPC: H01L21/027

    CPC classification number: G03F7/70858 ,  G03F7/2041 ,  G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide an immersion liquid containing one or more additives for solving the problem of stain appearance when drying areas wetted by the liquid in immersion exposure.SOLUTION: A device manufacturing method includes adding a component having a vapor pressure greater than 0.1 IcPa to a liquid and exposing a photosensitive substrate to radiation, in which the radiation passes through the aqueous liquid containing the component before reaching the photosensitive substrate. Since the addition of the component increases an ion concentration in the liquid, the immersion liquid is provided containing an ion-forming component, e.g. an acid or a base having a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.

    Abstract translation: 要解决的问题：提供一种含有一种或多种添加剂的浸渍液体，用于解决在浸渍曝光中被液体润湿的干燥区域时污点外观的问题。 解决方案：一种器件制造方法包括将具有大于0.1IpaPa的蒸气压的组分添加到液体中，并将​​光敏衬底暴露于辐射，其中辐射在到达感光衬底之前通过含有组分的水性液体。 由于添加该组分会增加液体中的离子浓度，因此提供含有离子形成组分的浸渍液，例如， 具有较高蒸气压的酸或碱。 还提供了使用浸液的光刻工艺和光刻系统。 版权所有（C）2012，JPO＆INPIT

    Method for cooling optical element, lithography apparatus and method for manufacturing device
    6.
    发明专利
    Method for cooling optical element, lithography apparatus and method for manufacturing device 有权
    用于冷却光学元件的方法，光刻装置和制造装置的方法

    公开(公告)号：JP2011222992A

    公开(公告)日：2011-11-04

    申请号：JP2011077418

    申请日：2011-03-31

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： JANSSEN FRANCISCUS JOHANNES JOSEPH ,  LOOPSTRA ERIK ROELOF

    IPC: H01L21/027 ,  G02B7/198

    CPC classification number: G03B27/52 ,  F28D15/00 ,  G02B7/181 ,  G03F7/70825 ,  G03F7/70891 ,  G03F7/709

    Abstract: PROBLEM TO BE SOLVED: To provide an improved cooling arrangement for an optical element in a vacuum optical system such as a projection system of an extreme ultraviolet (EUV) lithography apparatus.SOLUTION: Disclosed is a heat adjustment method for an optical element that operates in a vacuum environment. The optical element includes a first main body having at least one optical face and at least one heat transfer surface. The position and/or direction of the first main body 1 is controlled dynamically. The method comprises: a step of controlling the temperature of a second main body having a second heat transfer surface to a desired temperature; a step of positioning the second main body adjacently to the first main body and dynamically controlling the position and/or direction of the second main body so that the first and second heat transfer surfaces are maintained in a substantially fixed arrangement without the contact between the main bodies; and a step of delivering gas as a heat transfer medium into a heat transfer space defined by the first and second heat transfer surfaces while controlling a gas pressure in the heat transfer space to be at a predetermined value between approximately 30 Pa and approximately 300 Pa.

    Abstract translation: 要解决的问题：为真空光学系统（例如极紫外（EUV）光刻设备的投影系统）中的光学元件提供改进的冷却装置。 解决方案：公开了一种在真空环境中工作的光学元件的热调节方法。 光学元件包括具有至少一个光学面和至少一个传热表面的第一主体。 动态地控制第一主体1的位置和/或方向。 该方法包括：将具有第二传热表面的第二主体的温度控制到所需温度的步骤; 将第二主体相对于第一主体定位并动态地控制第二主体的位置和/或方向的步骤，使得第一和第二传热表面保持基本上固定的布置，而不会在主体 身体; 以及将作为传热介质的气体输送到由第一和第二传热表面限定的传热空间，同时将传热空间中的气体压力控制在约30Pa至约300Pa之间的预定值。 版权所有（C）2012，JPO＆INPIT

    Radiation source and lithographic device
    8.
    发明专利
    Radiation source and lithographic device 有权
    辐射源和光刻设备

    公开(公告)号：JP2012256887A

    公开(公告)日：2012-12-27

    申请号：JP2012127570

    申请日：2012-06-04

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： MAIKEL ADRIANUS CORNELIS SCHEPERS ,  JULINGS MARCUS FRANCISCUS ANTONIUS ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  BERNARD JACOB ANDRIES STOMMEN ,  HERMANUS JOHANNES MARIA KREUWEL ,  JACOB COHEN ,  PATEL HRISHIKESH ,  JANSEN PEPIN WINAND JOSEPH ,  BORN MARLTEN KEITH YANG

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70575 ,  G03F7/70033 ,  G03F7/70891 ,  G21K1/02 ,  G21K1/067 ,  H05G2/003 ,  H05G2/008

    Abstract: PROBLEM TO BE SOLVED: To provide a radiation source coping with infrared radiation.SOLUTION: A radiation source has a collector comprising a fuel source constituted to supply fuel to a plasma emission position to evaporate the fuel and form a plasma, constituted to collect EUV radiation emitted by the plasma and guide it toward an intermediate focus, and comprising a diffraction grating constituted to diffract infrared radiation emitted by the plasma. The radiation source is also a radiation conduit arranged in front of the intermediate focus, and the radiation conduit comprises an inlet aperture connected to an outlet aperture by a main body tapered inward. The radiation conduit comprises an inner portion and an outer portion. The inner portion is nearer to the intermediate focus than the outer portion, and the inner portion is constituted to reflect incident diffraction infrared radiation toward the outer portion.

    Abstract translation: 要解决的问题：提供应对红外辐射的辐射源。 解决方案：辐射源具有包括燃料源的收集器，燃料源被构造成将燃料供应到等离子体发射位置以蒸发燃料并形成等离子体，其被构造成收集由等离子体发射的EUV辐射并将其引导到中间焦点， 并且包括构成为衍射由等离子​​体发射的红外辐射的衍射光栅。 辐射源也是布置在中间聚焦前面的辐射导管，并且辐射导管包括通过主体向内锥形连接到出口孔的入口孔。 辐射导管包括内部部分和外部部分。 内部部分比外侧部分更靠近中间焦点，并且内部部分构成为朝向外部反射入射的衍射红外辐射。 版权所有（C）2013，JPO＆INPIT

    Barrier member and lithographic apparatus
    10.
    发明专利
    Barrier member and lithographic apparatus 有权
    障碍物成员和平面设备

    公开(公告)号：JP2012142625A

    公开(公告)日：2012-07-26

    申请号：JP2012099767

    申请日：2012-04-25

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BECKERS MARCEL ,  VAN DE KERKHOF MARCUS A ,  SIEBE LANDHEER ,  MAAS WOUTERUS JOHANNES PETRUS MARIA ,  BRUIJSTENS JEROEN PETER JOHANNES ,  THOMAS IVO ADAM JOHANNES ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  VAN OERLE BARTHOLOMEUS MATHIAS

    IPC: H01L21/027

    CPC classification number: G03F7/70341 ,  G03F7/70808 ,  G03F7/70958

    Abstract: PROBLEM TO BE SOLVED: To limit the movement of immersion liquid in a gap between immersion system structure and a projection system, and to reduce the quantity of immersion liquid that escapes the immersion system through the gap.SOLUTION: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The lithographic apparatus also includes a barrier member, surrounding a space between the projection system, and the substrate in use, to define in part with the projection system a reservoir for liquid. A radially outer surface of the barrier member facing a portion of the projection system and a radially outer surface of the portion of the projection system facing the barrier member each have a lyophobic outer surface. The lyophobic outer surface of the barrier member and/or the lyophobic outer surface of the portion of the projection system has an inner edge that defines in part the reservoir.

    Abstract translation: 要解决的问题：为了限制浸没液体在浸没系统结构和投影系统之间的间隙中的移动，并且减少通过间隙逸出浸没系统的浸液的量。 解决方案：光刻设备包括被配置为将图案化的辐射束投影到基板的目标部分上的投影系统。 光刻设备还包括围绕投影系统和使用中的基板之间的空间的阻挡构件，以部分地将投影系统限定为用于液体的储存器。 面向突出系统的一部分的阻挡构件的径向外表面和面向阻挡构件的突出系统的部分的径向外表面各自具有疏液外表面。 屏障构件的疏液外表面和/或突出系统部分的疏液外表面具有部分限定储存器的内边缘。 版权所有（C）2012，JPO＆INPIT

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