公开(公告)号：NL2004497A

公开(公告)日：2010-11-02

申请号：NL2004497

申请日：2010-04-01

Applicant: ASML NETHERLANDS BV

Inventor： THOMAS IVO ,  LANDHEER SIEBE ,  MEESTER ARNOUT ,  MIRANDA MARCIO ,  TANASA GHEORGHE

IPC: G03F7/20

公开(公告)号：NL2003395A

公开(公告)日：2010-03-18

申请号：NL2003395

申请日：2009-08-26

Applicant: ASML NETHERLANDS BV

Inventor： BRUIJSTENS JEROEN ,  LEE MAURICE ,  TANASA GHEORGHE ,  NOORDAM LAMBERTUS DOMINICUS ,  BRULS RICHARD ,  JANSEN HANS ,  LANDHEER SIEBE ,  JORRITSMA LAURENTIUS ,  MEESTER ARNOUT ,  JANSEN BAUKE ,  THOMAS IVO ,  MIRANDA MARCIO

IPC: G03F7/20

公开(公告)号：SG158017A1

公开(公告)日：2010-01-29

申请号：SG2009037078

申请日：2009-06-01

Applicant: ASML NETHERLANDS BV

Inventor： JANSSEN FRANCISCUS JOHANNES JOSEPH ,  LANDHEER SIEBE ,  KOEK YUECEL ,  BECKERS MARCEL ,  THOMAS IVO ADAM JOHANNES ,  MIRANDA MARCIO ALEXANDRE CANO

Abstract: A lithographic apparatus of the immersion type is disclosed. In the apparatus, a plurality of heating and/or cooling devices are provided in the vicinity of the final element of the projection system, e.g. in a barrier member of a liquid handling system. The heating and/or cooling devices can be used, for example, to control temperature gradients in the final element of the projection system to control aberrations therein.

公开(公告)号：NL2003392A

公开(公告)日：2010-03-18

申请号：NL2003392

申请日：2009-08-25

Applicant: ASML NETHERLANDS BV

Inventor： BRUIJSTENS JEROEN ,  BRULS RICHARD ,  JANSEN HANS ,  LANDHEER SIEBE ,  MEESTER ARNOUT ,  THOMAS IVO ,  MIRANDA MARCIO ,  TANASA GHEORGHE

IPC: G03F7/20

公开(公告)号：SG177192A1

公开(公告)日：2012-01-30

申请号：SG2011090693

申请日：2009-06-01

Applicant: ASML NETHERLANDS BV

Inventor： JANSSEN FRANCISCUS JOHANNES JOSEPH ,  LANDHEER SIEBE ,  KOEK YUECEL ,  BECKERS MARCEL ,  THOMAS IVO ADAM JOHANNES ,  MIRANDA MARCIO ALEXANDRE CANO

Abstract: A lithographic apparatus of the immersion type is disclosed. In the apparatus, a plurality of heating and/or cooling devices are provided in the vicinity of the final element of the projection system, e.g. in a barrier member of a liquid handling system. The heating and/or cooling devices can be used, for example, to control temperature gradients in the final element of the projection system to control aberrations therein.Fig. 8

公开(公告)号：NL2009844A

公开(公告)日：2013-06-26

申请号：NL2009844

申请日：2012-11-20

Applicant: ASML NETHERLANDS BV

Inventor： THOMAS IVO ,  LANDHEER SIEBE

IPC: G03F7/20

公开(公告)号：NL1035908A1

公开(公告)日：2009-03-26

申请号：NL1035908

申请日：2008-09-09

Applicant: ASML NETHERLANDS BV

Inventor： KERKHOF MARCUS ADRIANUS VAN DE ,  LANDHEER SIEBE ,  BECKERS MARCEL ,  BRUIJSTENS JEROEN PETER JOHANNES ,  JANSSEN FRANCISCUS JOHANNES JOSEPH

IPC: G03F7/20 ,  G03F9/00

公开(公告)号：NL1035757A1

公开(公告)日：2009-02-03

申请号：NL1035757

申请日：2008-07-25

Applicant: ASML NETHERLANDS BV

Inventor： BECKERS MARCEL ,  KERKHOF MARCUS ADRIANUS VAN DE ,  LANDHEER SIEBE ,  MAAS WOUTERUS JOHANNES PETRUS MARIA ,  BRUIJSTENS JEROEN PETER JOHANNES ,  THOMAS IVO ADAM JOHANNES ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  OERLE BARTHOLOMEUS MATHIAS VAN

IPC: G03F7/20 ,  H01L21/027