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    Radiation beam modification apparatus and method
    1.
    发明专利
    Radiation beam modification apparatus and method 审中-公开
    辐射束修改装置及方法

    公开(公告)号：JP2010287892A

    公开(公告)日：2010-12-24

    申请号：JP2010130589

    申请日：2010-06-08

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： DE BOEIJ WILHELMUS PETRUS ,  LEVASIER LEON MARTIN

    IPC: H01L21/027

    CPC classification number: G03B27/54 ,  G03F7/7025

    Abstract: PROBLEM TO BE SOLVED: To provide a radiation beam modification apparatus and method suitable for usage in an EUV lithographic apparatus. SOLUTION: This radiation beam modification apparatus which controls a characteristic of a radiation beam in a lithographic apparatus includes a flexible sheet formed with a plurality of apertures, and a positioning device including a first rotary member and a second rotary member, wherein a first end of the flexible sheet is connected to the first rotary member, a second end of the flexible sheet is connected to the second rotary member, and the central part of the flexible sheet extends between the first rotary member and the second rotary member. The apertures are used for controlling the numerical aperture of a projection system of the lithographic apparatus. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：提供适用于EUV光刻设备的辐射束修改装置和方法。 解决方案：控制光刻设备中的辐射束特性的该辐射束修改装置包括形成有多个孔的柔性片，以及包括第一旋转构件和第二旋转构件的定位装置，其中， 柔性片的第一端连接到第一旋转构件，柔性片的第二端连接到第二旋转构件，柔性片的中心部分在第一旋转构件和第二旋转构件之间延伸。 孔用于控制光刻设备的投影系统的数值孔径。 版权所有（C）2011，JPO＆INPIT

    Lithographic apparatus and device manufacturing method
    2.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2007184576A

    公开(公告)日：2007-07-19

    申请号：JP2006337301

    申请日：2006-12-14

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： SENGERS TIMOTHEUS FRANCISCUS ,  VAN ASTEN NICOLAAS ANTONIUS AL ,  BOX WILHELMUS JOSEPHUS ,  VAN EMPEL TJARKO ADRIAAN RUDOL ,  LEVASIER LEON MARTIN ,  LOOPSTRA ERIK R ,  MUITJES MARCEL JOHANNUS ELISAB ,  OUWEHAND LUBERTHUS ,  VAN DER SCHOOR LEON JOSEPH MAR ,  BECKERS MARCEL ,  JANSEN ROB ,  VAN LOENHOUT ELKE

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70883 ,  G03F7/7075 ,  G03F7/70858 ,  G03F9/7011 ,  G03F9/7034

    Abstract: PROBLEM TO BE SOLVED: To provide a method of highly precisely adjusting a measuring optical system of a lithographic apparatus. SOLUTION: In the lithographic apparatus, a substrate table constituted to hold a substrate is movable to transfer the substrate between a substrate measuring position and a substrate processing position. The lithographic apparatus also includes a measuring system constituted to measure at least one aspect or a characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is constituted to guide at least one measuring beam and/or a field toward the front surface of the substrate. A projection system is constituted to project a patterned radiation beam onto the target of the substrate when the substrate table holds the substrate in the substrate processing position. An adjusting system is constituted to supply adjusting fluid to at least a part of the path of the measuring beam and/or the field of the measuring system to adjust the part of the path. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种高精度地调整光刻设备的测量光学系统的方法。 解决方案：在光刻设备中，用于保持衬底的衬底台可移动以在衬底测量位置和衬底处理位置之间传送衬底。 光刻设备还包括测量系统，该测量系统构成为当衬底台将衬底保持在测量位置时测量衬底的至少一个方面或特性。 测量系统被构造成朝向基板的前表面引导至少一个测量光束和/或场。 投影系统被构造成当衬底台将衬底保持在衬底处理位置时，将图案化的辐射束投影到衬底的靶上。 调整系统被构造成将调节流体提供给测量光束的路径的至少一部分和/或测量系统的场以调整路径的一部分。 版权所有（C）2007，JPO＆INPIT

    Projection system and its using method
    3.
    发明专利
    Projection system and its using method 审中-公开
    投影系统及其使用方法

    公开(公告)号：JP2004343075A

    公开(公告)日：2004-12-02

    申请号：JP2004102336

    申请日：2004-03-31

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： LEENDERS MARTINUS HENDRIKUS AN ,  COX HENRIKUS HERMAN MARIE ,  LEVASIER LEON MARTIN

    IPC: G02F1/13 ,  F16F15/02 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

    CPC classification number: G03F9/7019 ,  G03F7/70258 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/709 ,  G03F9/7011

    Abstract: PROBLEM TO BE SOLVED: To provide a projection system exhibiting a lower sensitivity to vibration and disturbance.
    SOLUTION: The projection system PL comprising at least one projector 10 arranged to receive a projection beam PB coming from a first object MA and to project that projection beam to a second object W is further provided with a sensor 11 for measuring a spatial orientation of the at least one projector 10, and a processing unit 40 arranged to be connected with at least one sensor 11. The processing unit 40 is further arranged to be connected with positioning units PW and PM for adjusting the position of at least one of the first object MA and the second object W based on the spatial orientation of at least one projector 10 thus measured.
    COPYRIGHT: (C)2005,JPO&NCIPI

    Abstract translation: 要解决的问题：提供对振动和干扰具有较低灵敏度的投影系统。 解决方案：包括至少一个投影仪10的投影系统PL还设置有用于接收来自第一物体MA的投影束PB并且将该投影光束投射到第二物体W的投影仪10，该传感器11用于测量空间 至少一个投影仪10的取向以及被布置成与至少一个传感器11连接的处理单元40.处理单元40还被布置成与定位单元PW和PM连接，用于调整至少一个 基于如此测量的至少一个投影仪10的空间取向的第一对象MA和第二对象W。 版权所有（C）2005，JPO＆NCIPI

    Projection system
    6.
    发明专利
    Projection system 审中-公开
    投影系统

    公开(公告)号：JP2006114927A

    公开(公告)日：2006-04-27

    申请号：JP2005353206

    申请日：2005-12-07

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： LEENDERS MARTINUS HENDRIKUS AN ,  COX HENRIKUS HERMAN MARIE ,  LEVASIER LEON MARTIN

    IPC: G02F1/13 ,  H01L21/027 ,  F16F15/02 ,  G03F7/20 ,  G03F9/00

    CPC classification number: G03F9/7019 ,  G03F7/70258 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/709 ,  G03F9/7011

    Abstract: PROBLEM TO BE SOLVED: To provide a projection system having lower sensitivity with respect to vibration and disturbance.
    SOLUTION: The projection system comprises at least one projection device 10, configured to receive a projection beam PB coming from a first object MA and to project the projection beam to a second object W. The projection system PL further comprises a sensor 11 for measuring the spatial orientation of the at least one projection device 10. The projection system PL comprises a processing unit 40 which is arranged to communicate with the at least one sensor 11. The processing unit 40 is further arranged to communicate with positioning devices PW and PM, which are arranged to adjust the position of at least one of the first MA and second object W, based on the measured spatial orientation of the at least one projection device 10.
    COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供相对于振动和干扰具有较低灵敏度的投影系统。 解决方案：投影系统包括至少一个投影装置10，其被配置为接收来自第一物体MA的投影光束PB，并将投影光束投影到第二物体W.投影系统PL还包括传感器11 用于测量至少一个投影装置10的空间取向。投影系统PL包括处理单元40，其被配置为与至少一个传感器11通信。处理单元40还被布置成与定位装置PW和 PM，其被布置为基于所测量的至少一个投影设备10的空间取向来调整第一MA和第二物体W中的至少一个的位置。版权所有：（C）2006，JPO＆NCIPI

    10.
    发明专利
    未知

    公开(公告)号：DE602005019500D1

    公开(公告)日：2010-04-08

    申请号：DE602005019500

    申请日：2005-07-19

    Applicant: ASML NETHERLANDS BV

    Inventor： LOOPSTRA ERIK ROELOF ,  OESTERHOLT RENE ,  LEVASIER LEON MARTIN

    IPC: G03F7/20

    Abstract: A method for calibrating an encoder in a lithographic apparatus, the encoder including a sensor and a grating, the encoder configured to measure a position of a moveable support of the lithographic apparatus, the method comprising: measuring a position of the moveable support using an interferometer; and calibrating the encoder based on the position of the moveable support measured by the interferometer.

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