公开(公告)号：DE60120000T2

公开(公告)日：2006-10-19

申请号：DE60120000

申请日：2001-01-12

Applicant: ASML NETHERLANDS BV

Inventor： GROENEVELD ROGIER HERMAN MATHI ,  LOOPSTRA ERIK ROELOF ,  BURGHOORN JACOBUS ,  LEVASIER LEON MARTIN ,  STRAAIJER ALEXANDER

IPC: G01B11/00 ,  G03F9/00 ,  G01B15/00 ,  G03F7/20 ,  G03F7/213 ,  H01L21/027

Abstract: In a lithographic apparatus, a reference grating 11 mounted on the wafer table WT is illuminated with a measurement beam 20 incident in a direction independent of wafer table tilt. The diffraction orders are detected by detector 30 and used to determine the lateral shift in the wafer table resulting from a non-zero Abbe arm, and hence the Abbe arm, for calibration purposes. The detector 30 may be a detector also used for off-axis alignment of the wafer and wafer table.

公开(公告)号：DE60120000D1

公开(公告)日：2006-07-06

申请号：DE60120000

申请日：2001-01-12

Applicant: ASML NETHERLANDS BV

Inventor： GROENEVELD ROGIER HERMAN MATHI ,  LOOPSTRA ERIK ROELOF ,  BURGHOORN JACOBUS ,  LEVASIER LEON MARTIN ,  STRAAIJER ALEXANDER

IPC: G01B11/00 ,  G03F9/00 ,  G01B15/00 ,  G03F7/20 ,  G03F7/213 ,  H01L21/027

Abstract: In a lithographic apparatus, a reference grating 11 mounted on the wafer table WT is illuminated with a measurement beam 20 incident in a direction independent of wafer table tilt. The diffraction orders are detected by detector 30 and used to determine the lateral shift in the wafer table resulting from a non-zero Abbe arm, and hence the Abbe arm, for calibration purposes. The detector 30 may be a detector also used for off-axis alignment of the wafer and wafer table.