公开(公告)号：KR20100103425A

公开(公告)日：2010-09-27

申请号：KR20100022399

申请日：2010-03-12

Applicant: ASML NETHERLANDS BV

Inventor： STAVENGA MARCO KOERT ,  SHULEPOV SERGEI ,  STEFFENS KOEN ,  VAN LIEROP MATHEUS ANNA KAREL ,  DAVID SAMUEL BERTRAND DOMINIQUE ,  BESSEMS DAVID

IPC: H01L21/027 ,  H01L21/683 ,  H01L21/687

CPC classification number: G03F7/70716 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70866 ,  H01L21/68 ,  H01L21/68735 ,  G03F7/2041 ,  H01L21/682

Abstract: PURPOSE: A substrate table, an immersion lithography apparatus, and a method for manufacturing a device are provided to reduce the generation of defects on images by minimizing bubbles in the immersion lithography apparatus. CONSTITUTION: A pre-set size substrate(W) is contained in a recess(20). The recess includes a supporting region supporting the lower surface of the substrate and an edge. The edge is adjacently arranged to the edge of the substrate. A fluid draining system drains fluid from a gap(26) between the edges of the substrate and the recess. The fluid draining system includes a first duct(32) and a second duct(42) which are open toward the inside gap.

Abstract translation: 目的：提供一种衬底台，浸没式光刻设备及其制造方法，用于通过使浸没式光刻设备中的气泡最小化来减少图像缺陷的产生。 构成：预定尺寸的基板（W）容纳在凹部（20）中。 所述凹部包括支撑所述基板的下表面的支撑区域和边缘。 边缘相邻地布置到基板的边缘。 流体排放系统从衬底的边缘和凹部之间的间隙（26）排出流体。 流体排放系统包括朝向内部间隙开放的第一管道（32）和第二管道（42）。

公开(公告)号：JP2010219525A

公开(公告)日：2010-09-30

申请号：JP2010048479

申请日：2010-03-05

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STAVENGA MARCO KOERT ,  SERGEI SHULEPOV ,  STEFFENS KOEN ,  LIEROP MATHIEUS ANNA KAREL VAN ,  DAVID SAMUEL BERTRAND DOMINIQUE ,  BESSEMS DAVID

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70866 ,  H01L21/68 ,  H01L21/68735

Abstract: PROBLEM TO BE SOLVED: To reduce a possibility or an influence of bubbling in an immersion lithographic apparatus. SOLUTION: A substrate table for an immersion lithographic apparatus has a recessed portion constituted to store a substrate of given size, and a fluid extraction system configured to extract a fluid from a gap between an edge of the substrate and an edge of the recessed portion, wherein the fluid extraction system is characterized in that the flow rate of the fluid extracted from a local part of the gap is larger than the flow rate of the fluid extracted from other parts of the gap. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：降低浸没式光刻设备中冒泡的可能性或影响。 解决方案：用于浸没式光刻设备的衬底台具有构造成存储给定尺寸的衬底的凹部，以及被配置为从衬底的边缘和边缘的间隙中提取流体的流体抽出系统 凹部，其中，所述流体抽出系统的特征在于，从所述间隙的局部部分提取的流体的流量大于从所述间隙的其它部分提取的流体的流量。 版权所有（C）2010，JPO＆INPIT