公开(公告)号：KR20100103425A

公开(公告)日：2010-09-27

申请号：KR20100022399

申请日：2010-03-12

Applicant: ASML NETHERLANDS BV

Inventor： STAVENGA MARCO KOERT ,  SHULEPOV SERGEI ,  STEFFENS KOEN ,  VAN LIEROP MATHEUS ANNA KAREL ,  DAVID SAMUEL BERTRAND DOMINIQUE ,  BESSEMS DAVID

IPC: H01L21/027 ,  H01L21/683 ,  H01L21/687

CPC classification number: G03F7/70716 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70866 ,  H01L21/68 ,  H01L21/68735 ,  G03F7/2041 ,  H01L21/682

Abstract: PURPOSE: A substrate table, an immersion lithography apparatus, and a method for manufacturing a device are provided to reduce the generation of defects on images by minimizing bubbles in the immersion lithography apparatus. CONSTITUTION: A pre-set size substrate(W) is contained in a recess(20). The recess includes a supporting region supporting the lower surface of the substrate and an edge. The edge is adjacently arranged to the edge of the substrate. A fluid draining system drains fluid from a gap(26) between the edges of the substrate and the recess. The fluid draining system includes a first duct(32) and a second duct(42) which are open toward the inside gap.

Abstract translation: 目的：提供一种衬底台，浸没式光刻设备及其制造方法，用于通过使浸没式光刻设备中的气泡最小化来减少图像缺陷的产生。 构成：预定尺寸的基板（W）容纳在凹部（20）中。 所述凹部包括支撑所述基板的下表面的支撑区域和边缘。 边缘相邻地布置到基板的边缘。 流体排放系统从衬底的边缘和凹部之间的间隙（26）排出流体。 流体排放系统包括朝向内部间隙开放的第一管道（32）和第二管道（42）。

公开(公告)号：NL2006244A

公开(公告)日：2011-09-19

申请号：NL2006244

申请日：2011-02-18

Applicant: ASML NETHERLANDS BV

Inventor： ROSET NIEK ,  KATE NICOLAAS ,  SHULEPOV SERGEI ,  LAFARRE RAYMOND

IPC: G03F7/20 ,  G03F9/00

公开(公告)号：SG164338A1

公开(公告)日：2010-09-29

申请号：SG2010009934

申请日：2010-02-12

Applicant: ASML NETHERLANDS BV

Inventor： STAVENGA MARCO KOERT ,  KEMPER NICOLAAS RUDOLF ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LIEBREGTS PAULUS MARTINUS MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA ,  MOERMAN RICHARD ,  RIEPEN MICHEL ,  SHULEPOV SERGEI ,  BRANDS GERT-JAN GERARDUS JOHANNES THOMAS ,  STEFFENS KOEN ,  CROMWIJK JAN WILLEM ,  MEIJERS RALPH JOSEPH ,  EVANGELISTA FABRIZIO ,  BESSEMS DAVID ,  LI HUA ,  JOCHEMSEN MARINUS ,  GUNTER PIETER LEIN JOSEPH ,  BELL FRANCISCUS WILHELMUS ,  WITBERG ERIK ,  SMITS MARCUS AGNES JOHANNES ,  MA ZHENHUA

Abstract: A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.

公开(公告)号：NL2007439A

公开(公告)日：2012-04-23

申请号：NL2007439

申请日：2011-09-19

Applicant: ASML NETHERLANDS BV

Inventor： BOXTEL FRANK ,  DAM MARINUS ,  JASPER JOHANNES ,  HAM RONALD ,  SHULEPOV SERGEI ,  PIETERSE GERBEN ,  BARAGONA MARCO ,  DEBRAUWER PIETER ,  STEEN ANTONIUS

IPC: G03F7/20

Abstract: A gas manifold to direct a gas flow between two plates of an optical component of a lithographic apparatus, the gas manifold having an inlet, a diffuser downstream of the inlet, a flow straightener downstream of the inlet, a contractor downstream of the flow straightener, and an outlet downstream of the contractor.

公开(公告)号：NL2004305A

公开(公告)日：2010-09-14

申请号：NL2004305

申请日：2010-02-26

Applicant: ASML NETHERLANDS BV

Inventor： STAVENGA MARCO ,  SHULEPOV SERGEI ,  STEFFENS KOEN ,  LIEROP MATHIEUS ,  DAVID SAMUEL ,  BESSEMS DAVID

IPC: G03F7/20 ,  G03F9/00

Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.

公开(公告)号：NL2005951A

公开(公告)日：2011-08-03

申请号：NL2005951

申请日：2011-01-05

Applicant: ASML NETHERLANDS BV

Inventor： DIRECKS DANIEL ,  EUMMELEN ERIK ,  SCHEPERS MAIKEL ,  DUNGEN CLEMENS ,  SHULEPOV SERGEI ,  MULDER PIETER ,  BESSEMS DAVID ,  BARAGONA MARCO

IPC: G03F7/20

公开(公告)号：SG128649A1

公开(公告)日：2007-01-30

申请号：SG200604387

申请日：2006-06-27

Applicant: ASML NETHERLANDS BV

Inventor： KEMPER NICOLAAS RUDOLF ,  DONDERS SJOERD NICOLAAS LAMBER ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  TEN KATE NICOLAAS ,  SHULEPOV SERGEI

公开(公告)号：NL2006272A

公开(公告)日：2011-11-07

申请号：NL2006272

申请日：2011-02-22

Applicant: ASML NETHERLANDS BV

Inventor： HAM RONALD ,  BARAGONA MARCO ,  GROEN ROBERTUS ,  MAESSEN RALPH ,  TOONDER JACOB ,  KOVACEVIC-MILIVOJEVIC MILICA ,  LEENDERS MARTINUS ,  MULKENS JOHANNES ,  MOERMAN RICHARD ,  RIEPEN MICHEL ,  SHULEPOV SERGEI ,  STEFFENS KOEN ,  CROMWIJK JAN ,  SONDAG-HUETHORST JEANNET

IPC: G03F7/20

公开(公告)号：SG157327A1

公开(公告)日：2009-12-29

申请号：SG2009034802

申请日：2009-05-21

Applicant: ASML NETHERLANDS BV

Inventor： CASTELIJNS HENRICUS JOZEF ,  TEN KATE NICOLAAS ,  SHULEPOV SERGEI ,  ARTS PETRUS MARTINUS GERARDUS

Abstract: A table is disclosed in which an opening is provided for the provision of immersion fluid onto a top surface of the table. In an embodiment, there are two such openings. The first of the openings surrounds a substrate support of the table and the second of the openings extends around an outer edge of the table.