公开(公告)号：KR20100130577A

公开(公告)日：2010-12-13

申请号：KR20100110912

申请日：2010-11-09

Applicant: ASML NETHERLANDS BV

Inventor： LIEBREGTS PAULUS MARTINUS MARIA ,  FIEN MENNO ,  LOOPSTRA ERIK ROELOF ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIRECKS DANIEEL JOZEF MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  BRANDS GERT JAN GERARDUS JOHANNES THOMAS ,  STEFFENS KOEN

IPC: H01L21/027

CPC classification number: G03F7/70958 ,  G03F7/70341 ,  G03F7/70866 ,  G03F7/70975 ,  G03F7/70983 ,  H01L21/0274 ,  G03F7/2041 ,  G03F7/70916

Abstract: PURPOSE: A lithographic apparatus having parts with a coated film adhered thereto is provided top protect a negative effect from an UV radiation and an immersion fluid by supporting the coating on at least part of lithography apparatus. CONSTITUTION: A lighting system(IL) conditions radiation beam. A patterning device supporter(MT) supports a patterning device(MA). A substrate supporter supports the substrate. A projection system(PS) projects the patterned radiation beam on the target on the substrate. The adhesive film supports the coating on at least part of a lithography apparatus.

Abstract translation: 目的：提供具有附着有涂膜的部件的光刻设备，其通过将涂层支撑在至少一部分光刻设备上而保护由UV辐射和浸没流体产生的负面影响。 构成：照明系统（IL）规定辐射束。 图案形成装置支撑体（MT）支撑图案形成装置（MA）。 基板支撑件支撑基板。 投影系统（PS）将图案化的辐射束投射到基板上的靶上。 粘合膜在至少部分光刻设备上支撑涂层。

公开(公告)号：KR20100103425A

公开(公告)日：2010-09-27

申请号：KR20100022399

申请日：2010-03-12

Applicant: ASML NETHERLANDS BV

Inventor： STAVENGA MARCO KOERT ,  SHULEPOV SERGEI ,  STEFFENS KOEN ,  VAN LIEROP MATHEUS ANNA KAREL ,  DAVID SAMUEL BERTRAND DOMINIQUE ,  BESSEMS DAVID

IPC: H01L21/027 ,  H01L21/683 ,  H01L21/687

CPC classification number: G03F7/70716 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70866 ,  H01L21/68 ,  H01L21/68735 ,  G03F7/2041 ,  H01L21/682

Abstract: PURPOSE: A substrate table, an immersion lithography apparatus, and a method for manufacturing a device are provided to reduce the generation of defects on images by minimizing bubbles in the immersion lithography apparatus. CONSTITUTION: A pre-set size substrate(W) is contained in a recess(20). The recess includes a supporting region supporting the lower surface of the substrate and an edge. The edge is adjacently arranged to the edge of the substrate. A fluid draining system drains fluid from a gap(26) between the edges of the substrate and the recess. The fluid draining system includes a first duct(32) and a second duct(42) which are open toward the inside gap.

Abstract translation: 目的：提供一种衬底台，浸没式光刻设备及其制造方法，用于通过使浸没式光刻设备中的气泡最小化来减少图像缺陷的产生。 构成：预定尺寸的基板（W）容纳在凹部（20）中。 所述凹部包括支撑所述基板的下表面的支撑区域和边缘。 边缘相邻地布置到基板的边缘。 流体排放系统从衬底的边缘和凹部之间的间隙（26）排出流体。 流体排放系统包括朝向内部间隙开放的第一管道（32）和第二管道（42）。

公开(公告)号：KR20100113043A

公开(公告)日：2010-10-20

申请号：KR20100032831

申请日：2010-04-09

Applicant: ASML NETHERLANDS BV

Inventor： EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA ,  STEFFENS KOEN ,  KANEKO TAKESHI ,  CORCORAN GREGORY MARTIN MASON

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70916 ,  H01L21/0274

Abstract: PURPOSE: An immersion lithography device and a manufacturing method thereof are provided to effectively and efficiently remove undesirable droplets from the surface of a substrate or a substrate table. CONSTITUTION: An immersion lithography device comprises the following: a projection system having an optical axis; a substrate table formed to maintain a substrate, defining the facing surface of the substrate and the substrate table itself; and a fluid handling structure for supplying an immersion liquid to an immersion space located on the surface facing the projection system. The fluid handling structure includes a fluid removal device(400), and a droplet removal device to remove droplets(200) form the immersion liquid.

Abstract translation: 目的：提供一种浸没式光刻设备及其制造方法，以有效且有效地从基板或基板台的表面除去不需要的液滴。 构成：浸没光刻设备包括以下：具有光轴的投影系统; 形成为保持衬底的衬底台，限定衬底的面对表面和衬底台本身; 以及用于将浸没液体供应到位于面向投影系统的表面上的浸没空间的流体处理结构。 流体处理结构包括流体去除装置（400）和用于去除液滴（200）形成浸液的液滴去除装置。

公开(公告)号：KR20100098479A

公开(公告)日：2010-09-07

申请号：KR20100067520

申请日：2010-07-13

Applicant: ASML NETHERLANDS BV

Inventor： BERKVENS PAUL PETRUS JOANNES ,  DE GRAAF ROELOF FREDERIK ,  LEIBREGTS PAULUS MARTINUS MARIA ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIRECKS DANIEL JOZEF MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  SCHOLTES PAUL WILLIAM ,  BRANDS GERT JAN GERARDUS JOHANNES THOMAS ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  VAN LIEROP MATHIEUS ANNA KAREL ,  DE METSENAERE CHRISTOPHE ,  MIRANDA MARCIO ALEXANDRE CANO ,  SPRUYTENBURG PATRICK JOHANNES WILHELMUS ,  VERSTRAETE JORIS JOHAN ANNE MARIE

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  H01L21/0274 ,  H01L21/0275

Abstract: PURPOSE: A lithography apparatus and a method for manufacturing a device are provided to control the flow of fluid through a fluid inlet by varying the flux of the fluid. CONSTITUTION: An illuminator(IL) receives a radiation beam(B) from a radiation source(SO). The illuminator includes an adjusting unit(AD) which adjusts the angular intensity distribution of the radiation beam. The radiation beam passes through a projection system(PS) and is focused on the target parts(C) on a substrate(W). A first location setting unit(PM) accurately locates a pattern device(MA). A substrate table(WT) moves to locate the target parts in the path of the radiation beam.

Abstract translation: 目的：提供一种光刻设备和用于制造器件的方法，以通过改变流体的通量来控制通过流体入口的流体流动。 构成：照射器（IL）从辐射源（SO）接收辐射束（B）。 照明器包括调节单元（AD），该调节单元调节辐射束的角度强度分布。 辐射束通过投影系统（PS）并聚焦在基底（W）上的目标部分（C）上。 第一位置设置单元（PM）精确地定位图案设备（MA）。 衬底台（WT）移动以将目标部件定位在辐射束的路径中。

公开(公告)号：JP2011238918A

公开(公告)日：2011-11-24

申请号：JP2011099033

申请日：2011-04-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN DER HAM RONALD ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  HUBERTUS MULKENS JOHANNES CATHERINUUS ,  RICHARD MURRMANN ,  RIEPEN MICHAEL ,  SERGEI SHULEPOV ,  STEFFENS KOEN ,  JAN WILLEM CROMWIJK ,  JOHANNA ANTOINETTE MARIA SONDAG-HUETHORST ,  MARCO BARAGONA ,  INTO GROEN ROBERTAS LEONARDUS MARIA ,  MAESSEN RALPH THEODORUS HUBERTUS ,  JACOB MARINUS JAN DEN TOONDER ,  MILLIKA KOVACEVICH MILOJEVIC

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/70 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a reduction, if not a complete prevention, of intrusion of bubbles into a light path of a projection beam during exposure, to thereby ease defects.SOLUTION: A fluid handling structure is disclosed. The fluid handling structure is configured to confine immersion liquid to a space defined between a projection system and a facing surface facing a substrate or a space defined between the projection system and a facing surface facing a table supporting the substrate, or a space defined between the projection system and both facing surfaces. The fluid handling structure includes a transponder that melts at least a part of gas within bubbles in the immersion liquid or performs control to prevent the bubbles from intruding into a light path of a beam from the projection system.

Abstract translation: 要解决的问题：为了在曝光期间减少（如果不是完全防止）气泡侵入投影光束的光路，从而缓解缺陷。 解决方案：公开了一种流体处理结构。 流体处理结构被配置为将浸没液体限制在限定在投影系统和面向基板的面对面之间的空间或者在投影系统和面向支撑基板的台面的面对面之间限定的空间之间，或者在 投影系统和两个面对面。 流体处理结构包括将浸入液体中的气泡内的至少一部分气体熔化的转发器，或进行控制以防止气泡从投影系统入射到光束的光路中。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011129913A

公开(公告)日：2011-06-30

申请号：JP2010276685

申请日：2010-12-13

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： GOSEN JEROEN GERARD ,  JANSEN ALBERT JOHANNES MARIA ,  KATE NICOLAAS TEN ,  STAVENGA MARCO KOERT ,  STEFFENS KOEN ,  VAN BOKHOVEN LAURENTIUS JOHANNES ADRIANUS ,  CASTELIJNS HENRICUS JOZEF ,  CUYPERS KOEN

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/7085

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus that reduces an latent harmful influence of a droplet left on a sensor and/or a target for the sensor.
SOLUTION: An immersion lithographic apparatus is disclosed that includes a table having a surface and the sensor, or the target for the sensor, or both, the sensor and/or target having a first area which is lyophobic to immersion liquid and a second area which is lyophilic to immersion liquid, and a liquid displacement device configured to displace liquid on the sensor and/or target, wherein the liquid displacement device includes a gas outlet opening configured to direct a gas flow toward the first and second areas. A property of a part of the gas flow introduced into the first area is different from a property of a part of the gas flow introduced into the second area.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种降低传感器和/或传感器目标上剩下的液滴的潜在有害影响的光刻设备。 解决方案：公开了一种浸没式光刻设备，其包括具有表面和传感器的表，或用于传感器的目标或两者，传感器和/或目标具有与浸没液体疏液的第一区域和 第二区域，其与浸没液体是亲液性的;以及液体置换装置，其构造成在所述传感器和/或目标物上移置液体，其中所述液体置换装置包括气体出口，所述气体出口被配置为引导气流朝向所述第一和第二区域。 引入第一区域的气流的一部分的性质与引入第二区域的气流的一部分的性质不同。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2010219525A

公开(公告)日：2010-09-30

申请号：JP2010048479

申请日：2010-03-05

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STAVENGA MARCO KOERT ,  SERGEI SHULEPOV ,  STEFFENS KOEN ,  LIEROP MATHIEUS ANNA KAREL VAN ,  DAVID SAMUEL BERTRAND DOMINIQUE ,  BESSEMS DAVID

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70866 ,  H01L21/68 ,  H01L21/68735

Abstract: PROBLEM TO BE SOLVED: To reduce a possibility or an influence of bubbling in an immersion lithographic apparatus. SOLUTION: A substrate table for an immersion lithographic apparatus has a recessed portion constituted to store a substrate of given size, and a fluid extraction system configured to extract a fluid from a gap between an edge of the substrate and an edge of the recessed portion, wherein the fluid extraction system is characterized in that the flow rate of the fluid extracted from a local part of the gap is larger than the flow rate of the fluid extracted from other parts of the gap. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：降低浸没式光刻设备中冒泡的可能性或影响。 解决方案：用于浸没式光刻设备的衬底台具有构造成存储给定尺寸的衬底的凹部，以及被配置为从衬底的边缘和边缘的间隙中提取流体的流体抽出系统 凹部，其中，所述流体抽出系统的特征在于，从所述间隙的局部部分提取的流体的流量大于从所述间隙的其它部分提取的流体的流量。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009141359A

公开(公告)日：2009-06-25

申请号：JP2008308934

申请日：2008-12-03

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STEFFENS KOEN ,  LIEBREGTS PAULUS MARTINUS MARI ,  VAN DER HAM RONALD ,  DIREKS DANIEL JOSEPH MARIA ,  BRANDS GERT-JAN GERARDUS JOHAN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a liquid handling system which reduces or prevents the occurrence of dry contamination on a substrate. SOLUTION: The liquid handling system is disclosed in which an extractor to contain liquid in a space between the projection system of a lithographic apparatus and a substrate has, in plan, a shape with a single corner. The extractor is provided in a rotatable part of a liquid handling system. The rotatable part is rotated under the control of a controller. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种减少或防止在基板上发生干污染的液体处理系统。 解决方案：公开了一种液体处理系统，其中在平版印刷设备的投影系统和基板之间的空间中容纳液体的提取器在平面上具有单个角的形状。 提取器设置在液体处理系统的可旋转部分中。 可旋转部分在控制器的控制下旋转。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009111349A

公开(公告)日：2009-05-21

申请号：JP2008227986

申请日：2008-09-05

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BERKVENS PAUL PETRUS JOANNES ,  DE GRAAF ROELOF FREDERIK ,  LIEBREGTS PAULUS MARTINUS MARI ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JO ,  DIREKS DANIEL JOSEPH MARIA ,  JANSSEN FRANCISCUS JOHANNES JO ,  SCHOLTES PAUL WILLIAM ,  BRANDS GERT-JAN GERARDUS JOHAN ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  LIEROP MATHIEUS ANNA KAREL VAN ,  METSENAERE CHRISTOPHE DE ,  MIRANDA MARCIO ALEXANDRE CANO ,  SPRUYTENBURG PATRICK JOHANNES ,  VERSTRAETE JORIS JOHAN ANNE-MA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an apparatus in which a barrier member is combined with a shutter member so as to keep a final element of the projection system wet during substrate swap. SOLUTION: An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种装置，其中阻挡构件与挡板构件组合，以便在衬底互换期间使投影系统的最终元件保持湿润。 解决方案：公开了一种浸没式光刻设备，其包括被配置为将流体限制在投影系统和基板之间的空间的流体限制系统。 流体限制系统包括用于供应流体的流体入口，流体入口连接到入口端口和出口端口。 浸没式光刻设备还包括流体供应系统，其构造成通过改变提供给入口的流体的流量和从出口移除的流体的流速来控制流过流体入口的流体流动。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2011097107A

公开(公告)日：2011-05-12

申请号：JP2011026014

申请日：2011-02-09

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： RIEPEN MICHEL ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  LIEBREGTS PAULUS MARTINUS MARIA ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIREKS DANIEL JOSEPH MARIA ,  BERKVENS PAUL PETRUS JOANNES ,  MONDT EVA ,  BRANDS GERT-JAN GERARDUS JOHANEES THOMAS ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA

IPC: H01L21/027 ,  G03F7/20

Abstract: PROBLEM TO BE SOLVED: To provide a liquid supply system for nailing liquid meniscus at a prescribed position in a space between a final element of a projection system and a substrate. SOLUTION: A liquid confinement system used for immersion lithography where a liquid meniscus between a liquid confinement system and a substrate is substantially nailed in a prescribed position by a meniscus nailing form is disclosed. The meniscus nailing form has a plurality of discrete outlets arranged in a polygon. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于在投影系统的最终元件和基板之间的空间中的指定位置处用于钉液面弯液面的液体供应系统。 解决方案：公开了一种用于浸没式光刻的液体限制系统，其中液体限制系统和衬底之间的液体弯液面通过弯液面钉形式基本上钉在规定的位置。 半月板钉形式具有以多边形排列的多个分立出口。 版权所有（C）2011，JPO＆INPIT