公开(公告)号：JP2009117832A

公开(公告)日：2009-05-28

申请号：JP2008282841

申请日：2008-11-04

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN DER HEIJDEN MARCUS THEODOO ,  STAVENGA MARCO KOERT ,  WONG PATRICK ,  VAN DEN BOGAARD FREDERICK JOHA ,  DE VRIES DIRK ,  BESSEMS DAVID ,  MYCKE JACQUES ROGER ALICE

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70916 ,  G03F7/11 ,  G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a substrate for reducing a contamination source to be used for a lithography projection device. SOLUTION: The substrate W comprises a sealing coating 106 covering at least part of a first interface between two layers 100, 102 on the substrate or between each layer and the substrate without extending to a central portion of the substrate. The sealing coating is used for providing the substrate which is used for the lithography projection device for reducing a risk of contaminating one or more components of immersion liquid and a lithography device, and a device manufacturing method. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于减少用于光刻投影装置的污染源的基板。 解决方案：衬底W包括密封涂层106，其覆盖衬底上的两个层100,102之间或每个层与衬底之间的第一界面的至少一部分而不延伸到衬底的中心部分。 密封涂层用于提供用于光刻投影装置的基板，用于降低污染浸入液体的一种或多种组分和光刻装置的风险，以及装置制造方法。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009177162A

公开(公告)日：2009-08-06

申请号：JP2008328877

申请日：2008-12-25

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DE VRIES DIRK ,  MOERMAN RICHARD ,  GROUWSTRA CEDRIC DESIRE ,  VAN ROOY MICHEL FRANCISCUS JOH

IPC: H01L21/027

CPC classification number: G03F7/70916 ,  G03F7/70341 ,  G03F7/70608

Abstract: PROBLEM TO BE SOLVED: To reduce the presence of particles in an immersion system, and/or at least obtain information indicative of a defect so that it may be better understood with the aim of reducing its occurrence or number.
SOLUTION: A method is disclosed that obtains information related to a defect 110 present during irradiation of a substrate W coated with a layer of radiation sensitive material using immersion lithography. The method includes irradiating an area of the radiation sensitive material with a non-patterned radiation beam, the area being irradiated with a dose which is sufficient for the radiation sensitive material to be substantially removed during subsequent development of the radiation sensitive material if the radiation sensitive material is a positive radiation sensitive material, or with a dose which is sufficient for the radiation sensitive material to be substantially insoluble during subsequent development of the radiation sensitive material if the radiation sensitive material is a negative radiation sensitive material. The method further includes developing the radiation sensitive material and obtaining information at least indicative of the topography of radiation sensitive material remaining on the substrate after the radiation sensitive material has been developed in order to obtain information related to the defect.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：为了减少沉浸系统中的颗粒的存在，和/或至少获得指示缺陷的信息，以便可以更好地理解为了减少其发生或数量。 解决方案：公开了一种方法，其获得与使用浸渍光刻法涂覆有辐射敏感材料层的基板W的照射期间存在的缺陷110相关的信息。 该方法包括用未图案化的辐射束照射辐射敏感材料的区域，如果辐射敏感材料的辐射敏感材料的后续显影期间，该辐射敏感材料的辐射敏感材料的辐射敏感材料的辐照敏感材料的辐射敏感材料的辐照敏感材料 材料是正的辐射敏感材料，或者如果辐射敏感材料是负辐射敏感材料，则辐射敏感材料在辐射敏感材料的后续显影期间足以使辐射敏感材料基本上不溶的剂量。 该方法还包括开发辐射敏感材料并获得至少指示辐射敏感材料已被开发之后剩余在基底上的辐射敏感材料的形貌的信息，以获得与该缺陷有关的信息。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：SG152216A1

公开(公告)日：2009-05-29

申请号：SG2008083131

申请日：2008-11-06

Applicant: ASML NETHERLANDS BV

Inventor： VAN DER HEIJDEN MARCUS THEODOOR WILHELMUS ,  STAVENGA MARCO KOERT ,  WONG PATRICK ,  VAN DEN BOGAARD FREDERIK JOHANNES ,  DE VRIES DIRK ,  BESSEMS DAVID ,  MYCKE JACQUES ROGER ALICE

Abstract: Method of Preparing a Substrate for Lithography, a Substrate a Device Manufacturing Method, a Sealing Coating Applicator and a Sealing Coating Measurement Apparatus A substrate for use in a lithographic projection apparatus. The substrate includes a sealing coating that covers at least a part of a first interface between two layers on the substrate, or between a layer and the substrate, and does not extend to a central portion of the substrate.