公开(公告)号：SG152216A1

公开(公告)日：2009-05-29

申请号：SG2008083131

申请日：2008-11-06

Applicant: ASML NETHERLANDS BV

Inventor： VAN DER HEIJDEN MARCUS THEODOOR WILHELMUS ,  STAVENGA MARCO KOERT ,  WONG PATRICK ,  VAN DEN BOGAARD FREDERIK JOHANNES ,  DE VRIES DIRK ,  BESSEMS DAVID ,  MYCKE JACQUES ROGER ALICE

Abstract: Method of Preparing a Substrate for Lithography, a Substrate a Device Manufacturing Method, a Sealing Coating Applicator and a Sealing Coating Measurement Apparatus A substrate for use in a lithographic projection apparatus. The substrate includes a sealing coating that covers at least a part of a first interface between two layers on the substrate, or between a layer and the substrate, and does not extend to a central portion of the substrate.

公开(公告)号：SG148971A1

公开(公告)日：2009-01-29

申请号：SG2008048233

申请日：2008-06-25

Applicant: ASML NETHERLANDS BV

Inventor： DE JONG ANTHONIUS MARTINUS CORNELIS PETRUS ,  BOUCHOMS IGOR PETRUS MARIA ,  BRULS RICHARD JOSEPH ,  JANSEN HANS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  WANTEN PETER FRANCISCUS ,  VAN DER HEIJDEN MARCUS THEODOOR WILHELMUS ,  VAN DER DONCK JACQUES COR JOHAN ,  VAN DEN BOGAARD FREDERIK JOHANNES ,  GROENEWOLD JAN ,  VAN DER GRAAF SANDRA ,  ZOLDESI CARMEN JULIA

Abstract: Substrates and Methods of Using Those Substrates A method of removing contamination from an apparatus used in lithography is disclosed. The method includes loading a substrate into the apparatus, the substrate comprising a rigid support layer and a deformable layer provided on the rigid support layer, bringing the deformable layer of the substrate into contact with a surface of the apparatus from which contamination is to be removed, introducing relative movement between the deformable layer and the surface of the apparatus from which contamination is to be removed to dislodge contamination from the surface for removal, and removing the dislodged contamination. Other aspects of the invention are also described and claimed.