公开(公告)号：JP2010251745A

公开(公告)日：2010-11-04

申请号：JP2010085600

申请日：2010-04-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DZIOMKINA NINA VLADIMIROVNA ,  ELISSEEVA OLGA VLADIMIROVNA

IPC: H01L21/027

CPC classification number: G03B27/58 ,  G03F7/70341 ,  G03F7/70716

Abstract: PROBLEM TO BE SOLVED: To increase lyophobic properties of an immersion lithography apparatus surface. SOLUTION: The immersion lithography apparatus has a surface contacted by an immersion liquid when used, and the surface has a surface roughness of 0.2 μm or less. The immersion liquid on the surface may have a contact angle of 60 degrees or higher. The surface may maintain the characteristic so that the immersion liquid has the contact angle enabling the immersion for a long period of time. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提高浸没式光刻设备表面的疏液性。 浸渍式光刻装置在使用时具有与浸渍液体接触的表面，表面粗糙度为0.2μm以下。 表面上的浸液可以具有60度或更高的接触角。 表面可以保持特性，使得浸没液体具有能够长时间浸泡的接触角。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2009290212A

公开(公告)日：2009-12-10

申请号：JP2009126877

申请日：2009-05-26

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CLOIN CHRISTIAN GERARDUS NORBE ,  KATE NICOLAAS TEN ,  KEMPER NICOLAAS R ,  STAVENGA MARCO KOERT ,  EUMMELEN ERIK HENRICUS EGIDIUS ,  RIEPEN MICHEL ,  ELISSEEVA OLGA VLADIMIROVNA ,  GUNTHER WILFRED MATHIJS ,  VAN DER WEKKEN MICHAEL CHRISTI

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70733

Abstract: PROBLEM TO BE SOLVED: To disclose a lithographic projection apparatus that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. SOLUTION: The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the substrate table, or (iii) a surface of the shutter member, or (iv) an arbitrary combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：公开一种包括工作台，活门构件，流体处理结构和流体抽出系统的光刻投影装置。 流体处理结构可以被配置为在投影系统和（i）基板之间供应和限制液体，或（ii）基板台，或（iii）挡板部件的表面，或（iv ）选自（i） - （iii）中的任意组合。 活门构件的表面可以与桌子的表面邻接并且共面。 活门构件和桌子的表面可以间隔开间隙。 流体提取系统可以构造成从间隙去除液体。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2013051444A

公开(公告)日：2013-03-14

申请号：JP2012264036

申请日：2012-12-03

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DZIOMKINA NINA VLADIMIROVNA ,  ELISSEEVA OLGA VLADIMIROVNA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03B27/58 ,  G03F7/70341 ,  G03F7/70716

Abstract: PROBLEM TO BE SOLVED: To increase lyophobic properties of a surface of an immersion lithography apparatus.SOLUTION: An immersion lithography apparatus comprises a surface contacted by immersion liquid when used, and the surface has surface roughness of 0.2 μm or less. The immersion liquid on the surface may have a contact angle of 60° or more. The surface may maintain a characteristic of the surface so that the immersion liquid on the surface has the contact angle enabling immersion for a long period of time in the immersion liquid.

Abstract translation: 要解决的问题：提高浸没式光刻设备的表面的疏液性。 解决方案：浸没式光刻设备包括当使用时与浸液接触的表面，并且表面具有0.2μm或更小的表面粗糙度。 表面上的浸液可以具有60°或更大的接触角。 表面可以保持表面的特性，使得表面上的浸没液体具有能够在浸没液中长时间浸泡的接触角。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2012253389A

公开(公告)日：2012-12-20

申请号：JP2012208465

申请日：2012-09-21

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CLOIN CHRISTIAN GERARDUS NORBERTUS HENDRICUS MARIE ,  KATE NICOLAAS TEN ,  KEMPER NICOLAAS R ,  STAVENGA MARCO KOERT ,  EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA ,  RIEPEN MICHAEL ,  ELISSEEVA OLGA VLADIMIROVNA ,  WILFRED MATHIJS GUNTHER TIJMEN ,  VAN DER WEKKEN MICHAEL CHRISTIAAN

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70733

Abstract: PROBLEM TO BE SOLVED: To disclose a lithographic projection apparatus comprising a table, a shutter member, fluid handling structure, and a fluid extraction system.SOLUTION: Fluid handling structure supplies and shuts in liquid between a projection system and (i) a substrate, (ii) a substrate table, (iii) a surface of a shutter member, or (iv) an arbitrary combination selected from (i)-(iii). The surface of the shutter member adjoins a surface of the table and is disposed on the same surface of the table. The surface of the shutter member and the surface of the table can be separated by gap. A fluid extraction system removes the liquid from the gap.

Abstract translation: 要解决的问题：公开一种包括工作台，挡板部件，流体处理结构和流体抽出系统的光刻投影装置。 解决方案：流体处理结构在投影系统和（i）基板之间供应和关闭液体，（ii）基板台，（iii）挡板部件的表面，或（iv）任意组合， （ⅰ） - （ⅲ）。 活门构件的表面与桌子的表面相邻并且设置在桌子的相同表面上。 活门构件的表面和桌子的表面可以通过间隙分开。 流体萃取系统从间隙中除去液体。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：SG176490A1

公开(公告)日：2011-12-29

申请号：SG2011084712

申请日：2009-05-28

Applicant: ASML NETHERLANDS BV

Inventor： CLOIN CHRISTIAN GERARDUS NORBERTUS HENDRICUS MARIE ,  TEN KATE NICOLAAS ,  KEMPER NICOLAAS RUDOLF ,  STAVENGA MARCO KOERT ,  EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA ,  RIEPEN MICHEL ,  ELISSEEVA OLGA VLADIMIROVNA ,  TIJMEN WILFRED MATHIJS GUNTHER ,  VAN DER WEKKEN MICHAEL CHRISTIAAN

Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.Fig. 12b

公开(公告)号：SG157342A1

公开(公告)日：2009-12-29

申请号：SG2009036385

申请日：2009-05-28

Applicant: ASML NETHERLANDS BV

Inventor： CLOIN CHRISTIAN GERARDUS NORBE ,  TEN KATE NICOLAAS ,  KEMPER NICOLAAS RUDOLF ,  STAVENGA MARCO KOERT ,  EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA ,  RIEPEN MICHEL ,  ELISSEEVA OLGA VLADIMIROVNA ,  GUNTHER WILFRED MATHIJS ,  VAN DER WEKKEN MICHAEL CHRISTIAAN

Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)- (iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.

公开(公告)号：NL1037863A

公开(公告)日：2010-10-12

申请号：NL1037863

申请日：2010-04-06

Applicant: ASML NETHERLANDS BV

Inventor： DZIOMKINA NINA VLADIMIROVNA ,  ELISSEEVA OLGA VLADIMIROVNA

IPC: G03F7/20