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    Lithographic apparatus and device manufacturing method
    2.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2010109395A

    公开(公告)日：2010-05-13

    申请号：JP2010032113

    申请日：2010-02-17

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： KEMPER NICOLAAS RUDOLF ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  TEN KATE NICOLAAS ,  VAN DER MEULEN FRITS

    IPC: H01L21/027

    CPC classification number: G03F7/70866 ,  G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus improved from a liquid supply system configured to supply immersion liquid into interspace between a terminal element of a projection system and a substrate, so as to efficiently remove the liquid from the vicinity of the substrate. SOLUTION: The liquid supply system includes a sealing member for forming a seal between its own undersurface and the substrate to substantially store the liquid in the space. A recess is formed in the undersurface and connected to a first pressure source and a second pressure source for extracting the liquid and/or gas. The first pressure source has lower pressure than the second pressure source, gas flow generated from the second pressure source to the first pressure source, and the liquid and/or gas extracted by the flow. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种从液体供应系统改进的光刻设备，其配置为将浸没液体供应到投影系统的端子元件和基板之间的间隙中，以便有效地从液体供应系统 基质。 解决方案：液体供应系统包括用于在其自身的下表面和基底之间形成密封的密封构件，以将液体基本上储存在空间中。 凹槽形成在下表面中并连接到第一压力源和用于抽出液体和/或气体的第二压力源。 第一压力源具有比第二压力源低的压力，从第二压力源产生的气流到第一压力源，以及由流提取的液体和/或气体。 版权所有（C）2010，JPO＆INPIT

    Lithography apparatus and device manufacturing method
    3.
    发明专利
    Lithography apparatus and device manufacturing method 有权
    LITHOGRAPHY设备和设备制造方法

    公开(公告)号：JP2006196905A

    公开(公告)日：2006-07-27

    申请号：JP2006005636

    申请日：2006-01-13

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： KEMPER NICOLAAS RUDOLF ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  TEN KATE NICOLAAS ,  VAN DER MEULEN FRITS

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70866 ,  G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus, having a liquid feed system configured to supply immersion liquid to spacing between the final element and substrate of the projection system, for which the improvement is made so that the liquid from the near-by area of the substrate can be removed efficiently. SOLUTION: This liquid feed system comprises a seal component for forming a sealing between the lower surface of the system and the substrate that virtually accommodates the liquid in the spacing. A concave section is formed on the lower surface, and the concave section is connected with a first pressure source and a second pressure source for extracting the liquid and/or gas. The first pressure source is set to be at a lower pressure level than that of the second pressure source so that the gas flow is produced, from the second pressure source to the first pressure source. The liquid and/or gas can be extracted due to this flow. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种光刻设备，其具有液体供给系统，该液体供给系统构造成将浸没液体供应到投影系统的最终元件和基板之间的间隔，其中进行改进使得来自近处的液体 可以有效地去除衬底的面积。 解决方案：该液体供给系统包括用于在系统的下表面和基本上容纳间隔的液体的基底之间形成密封的密封部件。 在下表面上形成凹部，凹部与用于取出液体和/或气体的第一压力源和第二压力源连接。 第一压力源设定在比第二压力源低的压力水平，从而从第二压力源到第一压力源产生气体流。 由于这种流动，液体和/或气体可以被提取。 版权所有（C）2006，JPO＆NCIPI

    Lithography equipment and method of manufacturing device
    5.
    发明专利
    Lithography equipment and method of manufacturing device 有权
    LITHOGRAPHY EQUIPMENT AND METHODS MANUFACTURING DEVICE

    公开(公告)号：JP2007005795A

    公开(公告)日：2007-01-11

    申请号：JP2006168236

    申请日：2006-06-19

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： JACOBS JOHANNES HENRICUS WILHE ,  TEN KATE NICOLAAS ,  LEENDERS MARTINUS HENDRIKUS AN ,  LOOPSTRA ERIK ROELOF ,  VERHAGEN MARTINUS CORNELIS MAR ,  BOOM HERMAN ,  JANSSEN FRANCISCUS JOHANNES JO ,  BOUCHOMS IGOR PETRUS MARIA ,  KEMPER NICOLAAS R ,  OTTENS JOOST JEROEN ,  KOEK YUECEL ,  VAN ES JOHANNES

    IPC: H01L21/027

    CPC classification number: G03F7/70341 ,  G03F7/70716 ,  G03F7/70875

    Abstract: PROBLEM TO BE SOLVED: To provide a system efficiently and effectively eliminating an energy loss in lithography equipment when a relevant component is locally cooled by the evaporation of a supplied liquid, and defocus and lens aberration are caused by transformation and alteration in immersion lithography for filling a gap between a projection system and a substrate with an immersion liquid in order to increase the number of holes. SOLUTION: A timetable 34 is prepared having information on time at which the evaporation of a supplied liquid 11 is the most likely caused, the position of a substrate W, a speed, an acceleration speed and the like. The evaporation of a local area is prevented by heating at least a portion of the substrate W by using a heater according to the timetable 34 by using a liquid evaporation control device 30 or sending humidified air. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：当通过供应液体的蒸发局部冷却相关部件时，为了提供高效且有效地消除光刻设备中的能量损失的系统，并且散焦和透镜像差是由浸渍的变换和变化引起的 用于通过浸没液体填充投影系统和基板之间的间隙以增加孔的数量的光刻。 解决方案：制备时间表34，其具有关于供应的液体11的蒸发最可能引起的时间的信息，基板W的位置，速度，加速度等。 通过使用液体蒸发控制装置30或发送加湿空气根据时间表34的加热器加热基板W的至少一部分来防止局部区域的蒸发。 版权所有（C）2007，JPO＆INPIT

    Lithographic apparatus and device manufacturing method
    7.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2009094532A

    公开(公告)日：2009-04-30

    申请号：JP2008311424

    申请日：2008-12-05

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： HOOGENDAM CHRISTIAAN A ,  JACOBS JOHANNES HENRICUS WILHE ,  TEN KATE NICOLAAS ,  VAN DER MEULEN FRITS

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide a liquid supply system that can be operated continuously, irrespective of changes in scan direction of a substrate relative to a projection system, while ensuring thorough refreshment of a liquid reservoir. SOLUTION: In a scanning immersion lithographic apparatus, immersion liquid is supplied on one side of the space between the projection system and the substrate and drained on the other side so that the flow of liquid is substantially perpendicular to the scan direction. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种可以连续操作的液体供应系统，而不管基板相对于投影系统的扫描方向如何变化，同时确保液体储存器的充分刷新。 解决方案：在扫描浸没式光刻设备中，浸没液体被供应在投影系统和基板之间的空间的一侧，并在另一侧被排出，使得液体的流动基本上垂直于扫描方向。 版权所有（C）2009，JPO＆INPIT

    Lithographic apparatus
    8.
    发明专利
    Lithographic apparatus 有权
    LITHOGRAPHIC设备

    公开(公告)号：JP2012124539A

    公开(公告)日：2012-06-28

    申请号：JP2012071249

    申请日：2012-03-27

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： JACOBS JOHANNES HENRICUS WILHELMUS ,  TEN KATE NICOLAAS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LOOPSTRA ERIK ROELOF ,  VERHAGEN MARTINUS CORNELIS MARIA ,  BOOM HERMAN ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  BOUCHOMS IGOR PETRUS MARIA ,  KEMPER NICOLAAS R ,  OTTENS JOOST JEROEN ,  KOEK YUECEL ,  VAN ES JOHANNES

    IPC: H01L21/027

    CPC classification number: G03F7/70341 ,  G03F7/70716 ,  G03F7/70875

    Abstract: PROBLEM TO BE SOLVED: To provide a system that efficiently and effectively eliminates such energy loss in a lithographic apparatus as occurs by evaporation of a provided liquid which locally cools associated components leading to deformations and deterioration that may cause defocus and lens aberration in immersion lithography where a space between a projection system and a substrate is filled with an immersion liquid to increase the numerical aperture.SOLUTION: A timetable 34 is prepared which comprises information regarding the time and the position, the speed, the acceleration etc. of the substrate W at which evaporation of a provided liquid 11 is most likely to occur. A liquid evaporation controller 30 heats at least a part of the substrate W by a heater or sends humidified air to prevent local evaporation, according to the timetable 34.

    Abstract translation: 要解决的问题：提供一种系统，其有效地和有效地消除光刻设备中的这种能量损失，如通过蒸发局部冷却相关部件的所提供的液体而发生的，导致变形和劣化，这可能导致散焦和透镜像差 浸没光刻，其中投影系统和衬底之间的空间被浸没液体填充以增加数值孔径。 解决方案：制备时间表34，其包括关于最可能发生所提供的液体11的蒸发的基板W的时间和位置，速度，加速度等的信息。 液体蒸发控制器30根据时间表34通过加热器加热至少一部分基板W或者发送加湿空气以防止局部蒸发。版权所有（C）2012，JPO＆INPIT

    Lithographic apparatus, and device manufacturing method
    10.
    发明专利
    Lithographic apparatus, and device manufacturing method 有权
    LITHOGRAPHIC设备和设备制造方法

    公开(公告)号：JP2009158976A

    公开(公告)日：2009-07-16

    申请号：JP2009094993

    申请日：2009-04-09

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： KEMPER NICOLAAS RUDOLF ,  DONDERS SJOERD NICOLAAS LAMBER ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  TEN KATE NICOLAAS ,  VAN DER MEULEN FRITS

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70866 ,  G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus, having a liquid feed system configured to supply immersion liquid to spacing between a final element of a projection system and a substrate, for which the improvement is made so that the liquid from the near-by area of the substrate can be removed efficiently. SOLUTION: This liquid feed system comprises a seal member for forming a seal between the undersurface of itself and the substrate to virtually store the liquid in the spacing. A recessed section is formed on the undersurface, and the recessed section of the undersurface is connected with a first pressure source and a second pressure source for extracting the liquid and/or gas. The first pressure source is set at a lower pressure level than that of the second pressure source so that the gas flow is produced, from the second pressure source to the first pressure source, and the liquid and/or gas can be extracted by this flow. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种光刻设备，其具有配置成将浸没液体供应到投影系统的最终元件与基板之间的间隔的液体供给系统，其中进行改进，使得来自 可以有效地除去基板的近区域。 解决方案：该液体供给系统包括用于在其本身的下表面和基底之间形成密封件的密封构件，以在间隔中虚拟存储液体。 在下表面上形成凹部，下表面的凹部与第一压力源和用于抽出液体和/或气体的第二压力源连接。 第一压力源被设定在比第二压力源低的压力水平，使得从第二压力源到第一压力源产生气流，并且可以通过该流来提取液体和/或气体 。 版权所有（C）2009，JPO＆INPIT

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