公开(公告)号：JP2012253389A

公开(公告)日：2012-12-20

申请号：JP2012208465

申请日：2012-09-21

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CLOIN CHRISTIAN GERARDUS NORBERTUS HENDRICUS MARIE ,  KATE NICOLAAS TEN ,  KEMPER NICOLAAS R ,  STAVENGA MARCO KOERT ,  EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA ,  RIEPEN MICHAEL ,  ELISSEEVA OLGA VLADIMIROVNA ,  WILFRED MATHIJS GUNTHER TIJMEN ,  VAN DER WEKKEN MICHAEL CHRISTIAAN

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70733

Abstract: PROBLEM TO BE SOLVED: To disclose a lithographic projection apparatus comprising a table, a shutter member, fluid handling structure, and a fluid extraction system.SOLUTION: Fluid handling structure supplies and shuts in liquid between a projection system and (i) a substrate, (ii) a substrate table, (iii) a surface of a shutter member, or (iv) an arbitrary combination selected from (i)-(iii). The surface of the shutter member adjoins a surface of the table and is disposed on the same surface of the table. The surface of the shutter member and the surface of the table can be separated by gap. A fluid extraction system removes the liquid from the gap.

Abstract translation: 要解决的问题：公开一种包括工作台，挡板部件，流体处理结构和流体抽出系统的光刻投影装置。 解决方案：流体处理结构在投影系统和（i）基板之间供应和关闭液体，（ii）基板台，（iii）挡板部件的表面，或（iv）任意组合， （ⅰ） - （ⅲ）。 活门构件的表面与桌子的表面相邻并且设置在桌子的相同表面上。 活门构件的表面和桌子的表面可以通过间隙分开。 流体萃取系统从间隙中除去液体。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：SG176490A1

公开(公告)日：2011-12-29

申请号：SG2011084712

申请日：2009-05-28

Applicant: ASML NETHERLANDS BV

Inventor： CLOIN CHRISTIAN GERARDUS NORBERTUS HENDRICUS MARIE ,  TEN KATE NICOLAAS ,  KEMPER NICOLAAS RUDOLF ,  STAVENGA MARCO KOERT ,  EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA ,  RIEPEN MICHEL ,  ELISSEEVA OLGA VLADIMIROVNA ,  TIJMEN WILFRED MATHIJS GUNTHER ,  VAN DER WEKKEN MICHAEL CHRISTIAAN

Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.Fig. 12b

公开(公告)号：SG157342A1

公开(公告)日：2009-12-29

申请号：SG2009036385

申请日：2009-05-28

Applicant: ASML NETHERLANDS BV

Inventor： CLOIN CHRISTIAN GERARDUS NORBE ,  TEN KATE NICOLAAS ,  KEMPER NICOLAAS RUDOLF ,  STAVENGA MARCO KOERT ,  EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA ,  RIEPEN MICHEL ,  ELISSEEVA OLGA VLADIMIROVNA ,  GUNTHER WILFRED MATHIJS ,  VAN DER WEKKEN MICHAEL CHRISTIAAN

Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)- (iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.