公开(公告)号：JP2008160155A

公开(公告)日：2008-07-10

申请号：JP2008073704

申请日：2008-03-21

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  JOHANNES JACOBUS MATHEUS BASEL ,  COX HENRIKUS HERMAN MARIE ,  ANTONIUS THEODORUS ANNA MARIA ,  SJOERD NICOLAAS LAMBERTUS DOND ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JOERI LOF ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA M ,  VAN DER MEULEN FRITS ,  MULKENS JOHANNES CATHARINUS HU ,  GERARDUS PETRUS MATTHIJS VAN N ,  SIMON KLAUS ,  SLAGHEKKE BERNARDUS ANTONIUS ,  STRAAIJER ALEXANDER ,  VAN DER TOORN JAN-GERARD CORNE ,  HOUKES MARTIJN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70425 ,  G03F7/70525 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus for reducing residual liquid left on the surface of a substrate, after exposure by a projection system. SOLUTION: The lithographic apparatus whose localized area of the substrate surface under a projection system PL is immersed in a liquid. By having the height of a liquid supply system 310 above the surface of a substrate W, the height can be varied by using actuators 314. A control system uses feedforward control or feedback control with input of the surface height of the substrate W, to maintain the liquid supply system 310 at a predetermined height above the surface of the substrate W. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于减少残留在基板表面上的残留液体的光刻设备，在通过投影系统曝光之后。 解决方案：将投影系统PL下的基板表面的局部区域浸入液体中的光刻设备。 通过在基板W的表面上方具有液体供应系统310的高度，可以通过使用致动器314来改变高度。控制系统使用前馈控制或反馈控制与基板W的表面高度的输入来维持 液体供应系统310在衬底W的表面上方的预定高度处。版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2004343114A

公开(公告)日：2004-12-02

申请号：JP2004142059

申请日：2004-05-12

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： STREEFKERK BOB ,  BAKKER LEVINUS PIETER ,  JOHANNES JACOBUS MATHEUS BASEL ,  COX HENRIKUS HERMAN MARIE ,  ANTONIUS THEODORUS ANNA MARIA ,  SJOERD NICOLAAS LAMBERTUS DOND ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JOERI LOF ,  LOOPSTRA ERIK ROELOF ,  JEROEN JOHANNES SOPHIA MARIA M ,  VAN DER MEULEN FRITS ,  MULKENS JOHANNES CATHARINUS HU ,  GERARDUS PETRUS MATTHIJS VAN N ,  SIMON KLAUS ,  SLAGHEKKE BERNARDUS ANTONIUS ,  STRAAIJER ALEXANDER ,  VAN DER TOORN JAN-GERARD CORNE ,  HOUKES MARTIJN

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/70425 ,  G03F7/70525 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus intended to reduce liquid which remains on the surface of a substrate after exposure by a projection system.
SOLUTION: In the lithographic apparatus, a local region on the surface of the substrate under a projection system PL is immersed in a liquid. The height of a liquid feed system 310 above the surface of a substrate W can be varied using an actuator 314. In a control system, the liquid feed system 310 is maintained at a predetermined height above the surface of the substrate W, using feedforward control or feedback control by inputting the height of the surface of the substrate W.
COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：SG116542A1

公开(公告)日：2005-11-28

申请号：SG200402415

申请日：2004-05-06

Applicant: ASML NETHERLANDS BV

Inventor： BOB STREEFKERK ,  ERIK ROELOF LOOPSTRA CHRISTIAA ,  JOHANNES CATHARINUS HUBERTUS M ,  GERARDUS PETRUS MATTHIJS VAN N ,  KLAUS SIMON ,  BERNARDUS ANTONIUS SLAGHEKKE ,  ALEXANDER STRAAIJER ,  JAN-GERARD CORNELIS VAN DER TO ,  MARTIJN HOUKES

IPC: G03F7/20 ,  H01L21/027