公开(公告)号：JP2012134561A

公开(公告)日：2012-07-12

申请号：JP2012084835

申请日：2012-04-03

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  JOHANNES JACOBUS MATHEUS BASELMANS ,  COX HENRIKUS HERMAN MARIE ,  ANTONIUS THEODORUS ANNA MARIA DERKSEN ,  SJOERD NICOLAAS LAMBERTUS DONDERS ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JOERI LOF ,  ERIK ROELOF LOOPSTRA ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  VAN DER MEULEN FRITS ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  GERARDUS PETRUS MATTHIJS VAN NUNEN ,  KLAUS SIMON ,  SLAGHEKKE BERNARDUS ANTONIUS ,  ALEXANDER STOLE YALE ,  VAN DER TOORN JAN-GERARD CORNELIS ,  HOUKES MARTIJN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70425 ,  G03F7/70525 ,  G03F7/709

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus for reducing residual liquid left on a surface of a substrate, after exposure by a projection system.SOLUTION: In a lithographic apparatus, a localized area of a surface of a substrate under a projection system PL is immersed in liquid. Height of a liquid supply system 310 above a surface of a substrate W can be varied by using actuators 314. A control system maintains the liquid supply system 310 at predetermined height above the surface of the substrate W, by using feedforward control or feedback control with input of the surface height of the substrate W.

Abstract translation: 要解决的问题：提供一种用于减少残留在基板表面上的残留液体的光刻设备，在通过投影系统曝光之后。 解决方案：在光刻设备中，将投影系统PL下的基板的表面的局部区域浸入液体中。 可以通过使用致动器314来改变基板W的表面上方的液体供应系统310的高度。控制系统通过使用前馈控制或反馈控制将液体供应系统310保持在基板W的表面上方的预定高度 输入基板W的表面高度。版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012114485A

公开(公告)日：2012-06-14

申请号：JP2012066781

申请日：2012-03-23

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  ALEXEI KOLESNE TCHENKO ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  KLAUS SIMON ,  DE SMIT JOANNES THEODOOR ,  ALEXANDER STOLE YALE ,  STREEFKERK BOB ,  ERIK THEODORUS MARIA BIJLAART ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  HELMAR VAN SANTEN ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  JEROEN JOHANNES SOPHIA MARIA MERTENS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion-type lithography projection device with improved functionality.SOLUTION: An immersion-type lithography projection device comprises: a radiation systems Ex, IL which are provided with a radiation source LA and supply projection beams PB of radiation; a first object table (mask table) MT connected to first positioning means for correctly positioning a mask with respect to a member PL; a second object table (substrate table) WT connected to second positioning means for correctly positioning a substrate with respect to the member PL; and a projection system PL for forming an image of a radiated part of the mask MA on a target part C of a substrate W.

公开(公告)号：JP2012054601A

公开(公告)日：2012-03-15

申请号：JP2011243513

申请日：2011-11-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  ALEXEI KOLESNE TCHENKO ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  KLAUS SIMON ,  DE SMIT JOANNES THEODOOR ,  ALEXANDER STOLE YALE ,  STREEFKERK BOB ,  ERIK THEODORUS MARIA BIJLAART ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  HELMAR VAN SANTEN ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  JEROEN JOHANNES SOPHIA MARIA MERTENS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion-type lithographic projection apparatus with improved functionality.SOLUTION: The immersion-type lithographic projection apparatus comprises: a radiation system Ex which is provided with a radiation source LA and supplies a radiation projection beam PB; an illumination system IL; a first object table (mask table) MT connected to first positioning means for accurately positioning a mask to a member PL; a second object table (substrate table) WT connected to second positioning means for accurately positioning the substrate to the member PL; and a projection system PL for imaging an irradiated part of a mask MA on a target part C of a substrate W. This apparatus also includes at least one sensor that is disposed so as to be illuminated with a radiation projection beam that has passed through an immersion liquid.

Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影设备。 浸渍式光刻投影装置包括：放射线系统Ex，其设置有辐射源LA并提供辐射投射光束PB; 照明系统IL; 连接到第一定位装置的第一目标表（掩模台）MT，用于将掩模精确地定位到构件PL; 连接到第二定位装置的第二对象台（衬底台）WT，用于将衬底精确地定位到构件PL; 以及投影系统PL，用于对基板W的目标部分C上的掩模MA的照射部分进行成像。该装置还包括至少一个传感器，其布置成被辐射投影光束照射， 浸液 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012114484A

公开(公告)日：2012-06-14

申请号：JP2012066780

申请日：2012-03-23

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  ALEXEI KOLESNE TCHENKO ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  KLAUS SIMON ,  DE SMIT JOANNES THEODOOR ,  ALEXANDER STOLE YALE ,  STREEFKERK BOB ,  ERIK THEODORUS MARIA BIJLAART ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  HELMAR VAN SANTEN ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  JEROEN JOHANNES SOPHIA MARIA MERTENS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion-type lithography projection device with improved functionality.SOLUTION: An immersion-type lithography projection device comprises: a radiation systems Ex, IL which are provided with a radiation source LA and supply projection beams PB of radiation; a first object table (mask table) MT connected to first positioning means for correctly positioning a mask with respect to a member PL; a second object table (substrate table) WT connected to second positioning means for correctly positioning a substrate with respect to the member PL; and a projection system PL for forming an image of a radiated part of the mask MA on a target part C of a substrate W.

Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影装置。 解决方案：浸没型光刻投影装置包括：辐射系统Ex，IL，其设置有辐射源LA并且提供放射线的投影束PB; 连接到用于相对于构件PL正确定位掩模的第一定位装置的第一对象表（掩模台）MT; 连接到用于相对于构件PL正确定位衬底的第二定位装置的第二对象台（衬底台）WT; 以及用于在基板W的目标部分C上形成掩模MA的辐射部分的图像的投影系统PL。版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012054602A

公开(公告)日：2012-03-15

申请号：JP2011243516

申请日：2011-11-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JOERI LOF ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  ALEXEI KOLESNE TCHENKO ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  VAN SCHAIK FRANK ,  SENGERS TIMOTHEUS FRANCISCUS ,  KLAUS SIMON ,  DE SMIT JOANNES THEODOOR ,  ALEXANDER STOLE YALE ,  STREEFKERK BOB ,  ERIK THEODORUS MARIA BIJLAART ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  HELMAR VAN SANTEN ,  VAN DE KERKHOF MARCUS ADRIANUS ,  KROON MARK ,  DEN BOEF ARIE JEFFREY ,  OTTENS JOOST JEROEN ,  JEROEN JOHANNES SOPHIA MARIA MERTENS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: PROBLEM TO BE SOLVED: To provide an immersion-type lithographic projection apparatus with improved functionality.SOLUTION: The immersion-type lithographic projection apparatus comprises: a radiation system Ex which is provided with a radiation source LA and supplies a radiation projection beam PB; an illumination system IL; a first object table (mask table) MT connected to first positioning means for accurately positioning a mask to a member PL; a second object table (substrate table) WT connected to second positioning means for accurately positioning the substrate to the member PL; and a projection system PL for imaging an irradiated part of a mask MA on a target part C of a substrate W. This apparatus also includes at least one sensor that is disposed so as to be illuminated with a radiation projection beam that has passed through an immersion liquid.

Abstract translation: 要解决的问题：提供具有改进的功能的浸没式光刻投影设备。 浸渍式光刻投影装置包括：放射线系统Ex，其设置有辐射源LA并提供辐射投射光束PB; 照明系统IL; 连接到第一定位装置的第一目标表（掩模台）MT，用于将掩模精确地定位到构件PL; 连接到第二定位装置的第二对象台（衬底台）WT，用于将衬底精确地定位到构件PL; 以及投影系统PL，用于对基板W的目标部分C上的掩模MA的照射部分进行成像。该装置还包括至少一个传感器，其布置成被辐射投影光束照射， 浸液 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012119720A

公开(公告)日：2012-06-21

申请号：JP2012027270

申请日：2012-02-10

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOF JOERI ,  BIJLAART ERIK THEODORUS MARIA ,  BUTLER HANS ,  DONDERS SJOERD NICOLAAS LAMBERTUS ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  ALEXEI KOLESNE TCHENKO ,  ERIK ROHLOFF ROPESTRA ,  MEIJER HENDRICUS JOHANNES MARIA ,  MERTENS JEROEN JOHANNES SOPHIA M ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  SCHAIK FRANK VAN ,  SENGERS TIMOTHEUS FRANCISCUS ,  KLAUS SIMON ,  DE SMIT JOHANNES THEODOOR ,  ALEXANDER STOLE YALE ,  BOB STREEFKERK ,  VAN SANTEN HELMAR

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F7/70866

Abstract: PROBLEM TO BE SOLVED: To provide a lithography projection apparatus in which the space between the final element of a projection system, where the liquid loss from a supply system is minimized during exposure of the edge part of a substrate, and the substrate is filled with a liquid.SOLUTION: An edge sealing member 17 has an upper primary surface which is substantially in flush with the upper primary surface of a substrate W, and surrounds the substrate W or other object on a substrate table at least partially. Consequently, catastrophic liquid loss is prevented when the image at an edge part of the substrate W is captured or the edge part is illuminated even if the section under a projection lens PL is operated.

Abstract translation: 要解决的问题：提供一种光刻投影装置，其中在基板的边缘部分的曝光期间来自供应系统的液体损失最小化的投影系统的最终元件之间的空间和基板 充满液体。 解决方案：边缘密封构件17具有与基板W的上主表面基本上齐平的上主表面，并且至少部分地围绕基板W或基板台上的其它物体。 因此，即使拍摄基板W的边缘部分的图像或边缘部分被照亮，即使投影透镜PL下的部分被操作，也可以防止灾难性的液体损失。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012064979A

公开(公告)日：2012-03-29

申请号：JP2011281445

申请日：2011-12-22

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOF JOERI ,  ANTONIUS THEODORUS ANNA MARIA DERKSEN ,  HOOGENDAM CHRISTIAAN ALEXANDER ,  ALEXEI KOLESNE TCHENKO ,  ERIK ROHLOFF ROPESTRA ,  MODDERMAN THEODORUS MARINUS ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  RITSEMA ROELOF AEILKO SIEBRAND ,  KLAUS SIMON ,  DE SMIT JOHANNES THEODOOR ,  ALEXANDER STOLE YALE ,  BOB STREEFKERK ,  VAN SANTEN HELMAR

IPC: H01L21/027 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/7085 ,  G03F9/7088

Abstract: PROBLEM TO BE SOLVED: To provide a lithography projection apparatus in which a space between a substrate and a projection system is filled with a liquid while minimizing a quantity of the liquid required to be accelerated during a stage operation.SOLUTION: In a lithography projection apparatus, a space between a final element of a projection system and a substrate table of the lithography projection apparatus is surrounded by a sealing member. A gas seal is formed between the sealing member and a surface of the substrate and a liquid is confined in the space.

Abstract translation: 要解决的问题：提供一种光刻投影装置，其中衬底和投影系统之间的空间被填充液体，同时使在阶段操作期间需要加速的液体量最小化。 解决方案：在光刻投影装置中，投影系统的最终元件与光刻投影装置的基板台之间的空间被密封构件包围。 在密封构件和基板的表面之间形成气体密封，并且液体被限制在该空间中。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：SG116542A1

公开(公告)日：2005-11-28

申请号：SG200402415

申请日：2004-05-06

Applicant: ASML NETHERLANDS BV

Inventor： BOB STREEFKERK ,  ERIK ROELOF LOOPSTRA CHRISTIAA ,  JOHANNES CATHARINUS HUBERTUS M ,  GERARDUS PETRUS MATTHIJS VAN N ,  KLAUS SIMON ,  BERNARDUS ANTONIUS SLAGHEKKE ,  ALEXANDER STRAAIJER ,  JAN-GERARD CORNELIS VAN DER TO ,  MARTIJN HOUKES

IPC: G03F7/20 ,  H01L21/027

公开(公告)号：SG116555A1

公开(公告)日：2005-11-28

申请号：SG200404063

申请日：2004-06-08

Applicant: ASML NETHERLANDS BV

Inventor： JOERI LOF ,  HANS BUTLER ,  SJOERD NICOLAAS LAMBERTUS DOND ,  ALEKSEY KOLESNYCHENKO ,  ERIK ROELOF LOOPSTRA ,  HENDRICUS JOHANNES MARIA MEIJE ,  JOHANNES CATHARINUS HUBERTUS M ,  ROELOF AEILKO SIEBRAND RITSEMA ,  FRANK VAN SCHAIK ,  TIMOTHEUS FRANCISCUS SENGERS ,  KLAUS SIMON ,  JOANNES THEODOOR DE SMIT ,  ALEXANDER STRAAIJER ,  BOB STREEFKERK ,  ERIK THEODORUS MARIA BIJLAART ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  HELMAR VAN SANTEN ,  MARCUS ADRIANUS KERKHOF ,  MARK KROON ,  ARIE JEFFREY DEN BOEF ,  JOOST JEROEN OTTENS ,  JEROEN JOHANNES SOPHIA MARIA M

IPC: G03F7/20 ,  H01L21/027

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.