公开(公告)号：NL2016631A

公开(公告)日：2016-10-24

申请号：NL2016631

申请日：2016-04-18

Applicant: ASML NETHERLANDS BV

Inventor： SI-HAN ZENG ,  YUE-LIN PENG ,  ARIE JEFFREY DEN BOEF ,  ALEXANDER STRAAIJER ,  JEN-YU FANG ,  CHING-YI HUNG ,  PATRICK WARNAAR

IPC: G03F7/20

Abstract: Disclosed are a method, computer program and associated apparatuses for measuring a parameter of a lithographic process. The method comprising the steps of: obtaining first measurements comprising measurements of structural asymmetry relating to a plurality of first structures, each of said plurality of measurements of structural asymmetry corresponding to a different measurement combination of measurement radiation and a value for at least a first parameter; obtaining a plurality of second measurements of target asymmetry relating to a plurality of targets, each of said plurality of measurements of target asymmetry corresponding to one of said different measurement combinations, determining a relationship function describing the relationship between said first measurements and said second measurements, for each of said measurement combinations; determining, from said relationship function, a corrected overlay value, said corrected overlay value being corrected for structural contribution due to structural asymmetry in at least said first structure.

公开(公告)号：SG116542A1

公开(公告)日：2005-11-28

申请号：SG200402415

申请日：2004-05-06

Applicant: ASML NETHERLANDS BV

Inventor： BOB STREEFKERK ,  ERIK ROELOF LOOPSTRA CHRISTIAA ,  JOHANNES CATHARINUS HUBERTUS M ,  GERARDUS PETRUS MATTHIJS VAN N ,  KLAUS SIMON ,  BERNARDUS ANTONIUS SLAGHEKKE ,  ALEXANDER STRAAIJER ,  JAN-GERARD CORNELIS VAN DER TO ,  MARTIJN HOUKES

IPC: G03F7/20 ,  H01L21/027

公开(公告)号：SG152187A1

公开(公告)日：2009-05-29

申请号：SG2008078792

申请日：2008-10-22

Applicant: ASML NETHERLANDS BV

Inventor： ALEXANDER STRAAIJER

Abstract: A system is configured to measure two separately polarized beams upon diffraction from a substrate in order to determine properties of the substrate. Circularly or elliptically polarized light sources are passed via a fixed phase retarder in order to change the phase of one of two orthogonally polarized radiation beams with respect to the other of the two beams. The relative phases of the two radiation beams and other features of the beams as measured in a detector gives rise to properties of the substrate surface. [Fig.5]

公开(公告)号：SG116555A1

公开(公告)日：2005-11-28

申请号：SG200404063

申请日：2004-06-08

Applicant: ASML NETHERLANDS BV

Inventor： JOERI LOF ,  HANS BUTLER ,  SJOERD NICOLAAS LAMBERTUS DOND ,  ALEKSEY KOLESNYCHENKO ,  ERIK ROELOF LOOPSTRA ,  HENDRICUS JOHANNES MARIA MEIJE ,  JOHANNES CATHARINUS HUBERTUS M ,  ROELOF AEILKO SIEBRAND RITSEMA ,  FRANK VAN SCHAIK ,  TIMOTHEUS FRANCISCUS SENGERS ,  KLAUS SIMON ,  JOANNES THEODOOR DE SMIT ,  ALEXANDER STRAAIJER ,  BOB STREEFKERK ,  ERIK THEODORUS MARIA BIJLAART ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  HELMAR VAN SANTEN ,  MARCUS ADRIANUS KERKHOF ,  MARK KROON ,  ARIE JEFFREY DEN BOEF ,  JOOST JEROEN OTTENS ,  JEROEN JOHANNES SOPHIA MARIA M

IPC: G03F7/20 ,  H01L21/027

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.