Abstract:
PROBLEM TO BE SOLVED: To provide a discharge forming plasma radiation source, and a method of forming radiation using the discharge forming plasma radiation source to reduce the number of formed high-speed (high-energy) ions. SOLUTION: The discharge forming plasma radiation source includes a laser beam pulse generator constituted so as to induce a pinch in the plasma of the discharge forming plasma radiation source by providing a laser beam pulse. The laser beam pulse generator is constituted so as to provide the laser beam pulse having larger energy than the most suitable laser beam pulse energy corresponding to the maximum output of the radiation of a prescribed wavelength with respect to prescribed discharge energy. COPYRIGHT: (C)2010,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a radiation source that solves one or more problems of conventional techniques, and to provide a radiation source which is the alternative to radiation sources of the conventional techniques. SOLUTION: A radiation source includes a radiation emitter which emits a radiation, a collector which collects the radiation emitted by the radiation emitter, and an outlet configured to introduce a cooling gas in the radiation source during use. COPYRIGHT: (C)2011,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a debris reducing system, used for trapping pollutant materials emitted from a radiation source which generates debris, and can make debris reduction effect improved by a rotation foil trap. SOLUTION: This debris reducing system is provided with a contamination barrier constituted so as to rotate about a shaft, and a magnet structure, constituted so as to provide a magnetic field for deflecting electric charge debris from the radiation source. The magnet structure is constituted so that magnetic field is provided through the contamination barrier. The magnetic field is oriented along a surface which substantially coincides with the rotating shaft of the contamination barrier, when it passes through the contamination barrier. COPYRIGHT: (C)2008,JPO&INPIT
Abstract:
A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector (10A) and a second radiation dose detector (10B), each detector comprising a secondary electron emission surface (11) configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter (13), connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.