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    Lithographic apparatus and method of manufacturing device using interferometric exposure and other exposure
    1.
    发明专利
    Lithographic apparatus and method of manufacturing device using interferometric exposure and other exposure 有权
    平版印刷设备及使用干涉曝光及其他曝光制造设备的方法

    公开(公告)号：JP2007305987A

    公开(公告)日：2007-11-22

    申请号：JP2007120524

    申请日：2007-05-01

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： GREENEICH JAMES SHERWOOD ,  BASELMANS JOHANNES JACOBUS MAT ,  KARS ZEGER TROOST

    IPC: H01L21/027

    CPC classification number: G03F7/70408

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus which produces downsized devices at low cost without increasing a processing time. SOLUTION: The lithographic apparatus includes an exposure unit 10 that exposes parallel lines on a target area of a substrate W by projecting two beams of radiation 12, 13 onto the substrate. The two beams of radiation 12, 13 are projected such that they interfere with each other to form a plurality of parallel lines. An actuator 17 continuously moves the substrate W relative to the exposure unit, while the exposure unit 10 exposes the parallel lines on the target areas on the substrate. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种在不增加处理时间的情况下以低成本生产尺寸小的装置的光刻设备。 解决方案：光刻设备包括曝光单元10，其通过将两束辐射12,13投射到基板上而使基板W的目标区域上的平行线曝光。 两个辐射束12,13被投影使得它们彼此干涉以形成多条平行线。 致动器17相对于曝光单元连续地移动基板W，而曝光单元10将平行线暴露在基板上的目标区域上。 版权所有（C）2008，JPO＆INPIT

    Variable illumination source
    2.
    发明专利
    Variable illumination source 有权
    可变照明源

    公开(公告)号：JP2007266155A

    公开(公告)日：2007-10-11

    申请号：JP2006086914

    申请日：2006-03-28

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： FLAGELLO DONIS GEORGE ,  SOCHA ROBERT JOHN ,  GREENEICH JAMES SHERWOOD

    IPC: H01L21/027 ,  G03F7/20

    Abstract: PROBLEM TO BE SOLVED: To provide an illumination source which is controlled variably for usage in lithography equipment. SOLUTION: A device includes a variable illumination field to be used for lithographic plotting in order to manufacture a semiconductor. Concerning the device and its method, an illumination system is arranged, which includes a variable optical element having the array of address capable of designating elements which are respectively arranged and constituted to have variable transmittance. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供可变地控制用于光刻设备的照明源。 解决方案：为了制造半导体，器件包括用于光刻绘图的可变照明场。 关于该装置及其方法，布置了照明系统，其包括具有地址阵列的可变光学元件，其可以指定分别布置和构造为具有可变透射率的元件。 版权所有（C）2008，JPO＆INPIT

    Exposure apparatus employing multiple exposure times and multiple exposure types, and device manufacturing method
    3.
    发明专利
    Exposure apparatus employing multiple exposure times and multiple exposure types, and device manufacturing method 审中-公开
    使用多次曝光时间和多次曝光类型的曝光装置，以及装置制造方法

    公开(公告)号：JP2007194608A

    公开(公告)日：2007-08-02

    申请号：JP2006342096

    申请日：2006-12-20

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： KARS ZEGER TROOST ,  BASELMANS JOHANNES JACOBUS MAT ,  BLEEKER ARNO J ,  GREENEICH JAMES SHERWOOD

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70291 ,  G03F7/70275 ,  G03F7/70283 ,  G03F7/70466 ,  G03F7/70508

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography system and a method thereof capable of realizing a more minute structure and a flexible lithography system. SOLUTION: An exposure apparatus has at least one individually controllable element array for exposing a pattern on a substrate by combining first and second exposures. By the exposure apparatus in the first exposure, the individual controllable element array 11 of the exposure apparatus modulates a radiation beam and projects it on a substrate, and a repetitive pattern is formed. Also in the second exposure, the individually controllable element array 21 of the exposure apparatus modulates a radiation beam and projects it on a substrate W. A size of an exposure area on the substrate corresponding to one individually controllable element is larger in the second exposure than in the first exposure. The pattern to be projected on the substrate by the first exposure has a comparatively high resolution. On the contrary to this, the second exposure has a comparatively low resolution, but it can improve flexibility. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 解决的问题：提供能够实现更细微结构和柔性光刻系统的光刻系统及其方法。 解决方案：曝光装置具有至少一个可单独控制的元件阵列，用于通过组合第一和第二曝光来曝光衬底上的图案。 通过第一曝光中的曝光装置，曝光装置的各个可控元件阵列11调制辐射束并将其投影在基板上，形成重复图案。 此外，在第二曝光中，曝光装置的独立可控元件阵列21调制辐射束并将其投射在基板W上。对应于一个独立可控元件的基板上的曝光区域的尺寸在第二曝光中大于 在第一次曝光。 通过第一曝光在基板上投影的图案具有相对较高的分辨率。 与此相反，第二次曝光具有较低的分辨率，但可提高灵活性。 版权所有（C）2007，JPO＆INPIT

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