公开(公告)号：JP2009182337A

公开(公告)日：2009-08-13

申请号：JP2009099602

申请日：2009-04-16

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LAMBERTUS DONDERS SJOERD NICOL ,  HENDRIK SMULDERS PATRICK J C ,  SMITS PETER ,  HAGE EDWARD ,  VAN DER TOORN JAN-GERARD CORNE

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70716

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus capable of keeping the optical element of a projection system in wet condition during substrate replacement, and to provide a device manufacturing method. SOLUTION: For example, a closing member is used to receive liquid in a liquid confinement structure while the substrate is replaced on a substrate table in an immersion lithographic apparatus. For example, a closing member displacement mechanism using a combination of one or more leaf springs and one or more electromagnets, or a combination of one or more actuators and one or more pins, or a pressure source, is employed to move the closing member to or from the liquid confinement structure. An adjustment plate is used to compensate the varying thickness of the closing member in a closing member receptacle of varying depth on different substrates. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种能够在基板更换期间将投影系统的光学元件保持在湿润状态的光刻设备，并且提供一种器件制造方法。 解决方案：例如，当在浸没式光刻设备中的衬底台上更换衬底时，封闭构件用于接收液体限制结构中的液体。 例如，使用使用一个或多个板簧和一个或多个电磁体的组合的关闭构件移动机构，或者一个或多个致动器和一个或多个销的组合或压力源的组合来将关闭构件移动到 或从液体限制结构。 调整板用于补偿不同基底上不同深度的封闭构件容器中封闭构件的变化厚度。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2006140498A

公开(公告)日：2006-06-01

申请号：JP2005327405

申请日：2005-11-11

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： LAMBERTUS DONDERS SJOERD NICOL ,  HENDRIK SMULDERS PATRICK J C ,  SMITS PETER ,  HAGE EDWARD ,  VAN DER TOORN JAN-GERARD CORNE

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70716

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus capable of keeping the optical element of a projection system in wet condition during substrate replacement, and to provide a device manufacturing method. SOLUTION: For example, a closing member 30 is used to receive liquid in a liquid confinement structure 12 while the substrate is replaced on a substrate table WT2 in an immersion lithographic apparatus. For example, a closing member displacement mechanism using a combination of one or more leaf springs and one or more electromagnets, or a combination of one or more actuators and one more pins, or a pressure source, is employed to move the member 30 to or from the structure 12. An adjustment plate is used to compensate the varying thickness of the closing member in a closing member receptacle of varying depth on different substrates. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种能够在基板更换期间将投影系统的光学元件保持在湿润状态的光刻设备，并提供一种器件制造方法。 解决方案：例如，封闭构件30用于在液体限制结构12中接收液体，同时在浸没式光刻设备中的衬底台WT2上更换衬底。 例如，采用使用一个或多个板簧和一个或多个电磁体的组合的闭合构件移动机构，或者一个或多个致动器和一个以上的销的组合或压力源的组合，以将构件30移动到 调节板用于补偿不同基底上不同深度的封闭构件容器中封闭构件的变化厚度。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005072604A

公开(公告)日：2005-03-17

申请号：JP2004246045

申请日：2004-08-26

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： HAGE EDWARD

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70816

Abstract: PROBLEM TO BE SOLVED: To provide a slide assembly, which is small and rapidly movable, in a stage of lithographic equipment.
SOLUTION: A stage, which moves over a table, has a region 105 that generates repellent force, and a region 115 that generates sucking force at a central portion of the repellent-force generating region 105. A hole array 116 for supplying air is formed in the repellent-force generating region, and a magnet array is formed in the suction-force generating region 115, so that a fixed interval is formed between the table and the stage.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：在平版印刷设备的阶段提供小而快速移动的滑动组件。 解决方案：在桌子上移动的台架具有产生驱避力的区域105，以及在排斥力产生区域105的中心部分处产生吸力的区域115.一种用于供应的孔阵列116 在排斥力产生区域中形成空气，并且在吸力产生区域115中形成磁体阵列，使得在工作台和平台之间形成固定间隔。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：NL2014008A

公开(公告)日：2015-07-20

申请号：NL2014008

申请日：2014-12-18

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  HOON CORNELIUS ADRIANUS LAMBERTUS ,  KERP INGMAR AUGUST ,  MEIJERS PIETER JOHANNES GERTRUDIS ,  OOMS WESLEY ,  STARREVELD JEROEN PIETER ,  HOOPEN DERK ,  DUIJNHOVEN MARTINUS ,  HAGE EDWARD ,  DRAAIJER EVERT HENDRIK JAN

IPC: G03F7/20 ,  H01L21/683