公开(公告)号：JP2005045227A

公开(公告)日：2005-02-17

申请号：JP2004192858

申请日：2004-06-30

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： DRAAIJER EVERT HENDRIK JAN ,  CUIJPERS MARTINUS AGNES WILLEM ,  FIEN MENNO ,  BREUKERS MARCUS JOSEPH ELISABE ,  HOUKES MARTIJN ,  VAN DONKELAAR EDWIN TEUNIS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70733

Abstract: PROBLEM TO BE SOLVED: To provide a lithography projection apparatus having an exposure device and a measurement device the accuracy and the device manufacturing method of which have been improved.
SOLUTION: The exposure device projects patterned beams to the target part of a first substrate and on the other hand, the measurement device projects measurement beams to the target part of a second substrate. When a movable part of the device moves, due to the displacement of air, for example, a disturbance is caused to occur at the other movable part of the device. This error can be corrected by calculating a correction signal that is a function of a state of either or both of the movable parts.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：为了提供具有曝光装置和测量装置的光刻投影装置，其精度和装置制造方法已得到改进。 解决方案：曝光装置将图案化的光束投射到第一基板的目标部分，另一方面，测量装置将测量光束投射到第二基板的目标部分。 当装置的可移动部分移动时，由于空气的位移，例如，在装置的另一个可移动部分发生扰动。 可以通过计算作为可动部件中的一个或两者的状态的函数的校正信号来校正该误差。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2006279044A

公开(公告)日：2006-10-12

申请号：JP2006084505

申请日：2006-03-27

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VAN DER TOORN JAN-GERARD CORNE ,  BUTLER HANS ,  COX HENRIKUS HERMAN MARIE ,  DRAAIJER EVERT HENDRIK JAN ,  KATE NICOLAAS TEN ,  VAN DER MEULEN FRITS ,  FRENCKEN MARK JOHANNES H ,  HOUKES MARTIJN ,  ARENDS ANTONIUS H ,  CUPERUS MINNE

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithography apparatus having an improved positioning method of a liquid supply system. SOLUTION: The lithography apparatus includes a substrate table for holding a substrate, and a projection system for projecting a radiation beam patterned in a target portion of the substrate. The lithography apparatus has a fluid supply system for supplying fluid between the substrate and a final optical element of the projection system, and a positional control system for controlling a position of the fluid supply system. The positional control system is formed such that it is provided with a positional amount of the substrate, adds offset of a position to the positional amount of the substrate and thus determines a desirable position of the fluid supply system, and performs positioning of the fluid supply system based on the desirable position. The positional amount may include all or one of a position of the substrate, a rotational position of the substrate table, and a height function of height of the substrate. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种具有改进的液体供应系统的定位方法的浸没式光刻设备。 解决方案：光刻设备包括用于保持基板的基板台和用于投影图案化在基板的目标部分中的辐射束的投影系统。 光刻设备具有用于在基板和投影系统的最终光学元件之间供应流体的流体供应系统和用于控制流体供应系统的位置的位置控制系统。 位置控制系统形成为使得其具有基板的位置量，将位置的偏移增加到基板的位置量，从而确定流体供应系统的期望位置，并且执行流体供应 系统基于理想的位置。 位置量可以包括基板的位置，基板台的旋转位置和基板的高度的高度函数的全部或者一个。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007005796A

公开(公告)日：2007-01-11

申请号：JP2006168255

申请日：2006-06-19

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS ,  DRAAIJER EVERT HENDRIK JAN ,  BREUKERS MARCUS JOSEPH E G

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70725

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus, a projection apparatus and a method of manufacturing the same. SOLUTION: A lithographic apparatus has a control system to control a position of a substrate table. The control system includes: a first detection device for generating a projection system position signal showing a position of a projection system; a second detection device for generating a projection system feed/forward signal; a comparison unit for deducting a signal showing the actual position of the substrate table from a substrate table position reference signal, and generating a servo error signal by adding the projection system position signal; a control unit for generating a first control signal based on the servo error signal; an addition unit for generating a second control signal by adding the feed/forward signal and the first control signal; and an actuator unit for driving the substrate table to a desired substrate table position based on a second control signal. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻设备，投影设备及其制造方法。 解决方案：光刻设备具有控制衬底台的位置的控制系统。 所述控制系统包括：第一检测装置，用于产生表示投影系统的位置的投影系统位置信号; 用于产生投影系统进给/转发信号的第二检测装置; 比较单元，用于从衬底台位置参考信号中扣除表示衬底台的实际位置的信号，并通过加上投影系统位置信号产生伺服误差信号; 控制单元，用于基于所述伺服误差信号产生第一控制信号; 加法单元，用于通过将所述进给/前向信号和所述第一控制信号相加来产生第二控制信号; 以及用于基于第二控制信号将衬底台驱动到期望的衬底台位置的致动器单元。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006313903A

公开(公告)日：2006-11-16

申请号：JP2006123381

申请日：2006-04-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN DONKELAAR EDWIN T ,  DRAAIJER EVERT HENDRIK JAN ,  LEVASIER LEON M ,  LALLEMANT NICOLAS A ,  DE ROOIJ GERARDUS MARTINUS ANT

IPC: H01L21/027 ,  G01B11/00 ,  G03F7/20

CPC classification number: G03F7/70858 ,  G03F7/70775

Abstract: PROBLEM TO BE SOLVED: To provide lithography equipment comprising a position amount deciding system for deciding a position amount of a movable part which is at least partially surrounded by an area containing a fluid in operation. SOLUTION: The position amount deciding system comprises an interferometer system, a global sensor for deciding the local value of the physical value of the fluid in the area, and a local sensor for deciding the local value of the physical value of the fluid in a part of the area. The position amount deciding system is constituted so as to decide the position amount from the output of an interferometer, the global value of the physical value, and the local value of the physical value. The physical value sometimes contains pressure, temperature, etc. A local physical value deciding system can contain a sensor such as a high speed sensor and a computation hydrokinetics model or a linear approximation model. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供光刻设备，其包括位置量决定系统，用于确定至少部分地被包含在操作中的流体的区域包围的可移动部分的位置量。 位置量决定系统包括干涉仪系统，用于确定该区域中的流体的物理值的局部值的全局传感器，以及用于确定流体的物理值的局部值的局部传感器 在该地区的一部分。 位置量决定系统构成为从干涉仪的输出，物理值的全局值和物理值的局部值决定位置量。 物理值有时包含压力，温度等。局部物理值决定系统可以包含诸如高速传感器和计算氢动力学模型或线性近似模型的传感器。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：DE60120825T2

公开(公告)日：2007-06-28

申请号：DE60120825

申请日：2001-04-06

Applicant: ASML NETHERLANDS BV

Inventor： SCHEIBERLICH ARIE CORNELIS ,  FIEN MENNO ,  DRAAIJER EVERT HENDRIK JAN

IPC: G01B21/00 ,  G03F7/20 ,  G01B21/22 ,  G03F9/00 ,  H01L21/027

Abstract: On-the-Fly leveling in a lithographic apparatus is conducted using a setpoint derived by filtering the output of the combination of the output of a level sensor and another position sensor (LVDT or IFM). The level sensor may include look-ahead. The filter may be a low pass filter to cut-off level variations of wavelength shorter than the width of the slit during a scanning exposure. The filter may also be selected to reduce cross-talk between tilt movements and horizontal displacements.

公开(公告)号：NL2014008A

公开(公告)日：2015-07-20

申请号：NL2014008

申请日：2014-12-18

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  HOON CORNELIUS ADRIANUS LAMBERTUS ,  KERP INGMAR AUGUST ,  MEIJERS PIETER JOHANNES GERTRUDIS ,  OOMS WESLEY ,  STARREVELD JEROEN PIETER ,  HOOPEN DERK ,  DUIJNHOVEN MARTINUS ,  HAGE EDWARD ,  DRAAIJER EVERT HENDRIK JAN

IPC: G03F7/20 ,  H01L21/683

公开(公告)号：SG138458A1

公开(公告)日：2008-01-28

申请号：SG2004040713

申请日：2004-06-28

Applicant: ASML NETHERLANDS BV

Inventor： DRAAIJER EVERT HENDRIK JAN ,  CUIJPERS MARTINUS AGNES WILLEM ,  FIEN MENNO ,  BREUKERS MARCUS JOSEPH ELISABE ,  HOUKES MARTIJN ,  VAN DONKELAAR EDWIN TEUNIS

IPC: H01L21/027 ,  G03F7/20

Abstract: A lithographic projection apparatus comprises an exposure system and a measurement system. The exposure system projects a patterned beam onto a target portion of a first substrate, while the measurement system projects a measurement beam on a target portion of a second substrate. Movement of a movable part of the apparatus generates a disturbance in a position of another movable part of the apparatus, e.g. due to displacement of air. This error can be compensated by calculating a compensation signal which is a function of states of one or both of the movable parts.

公开(公告)号：SG126100A1

公开(公告)日：2006-10-30

申请号：SG200601932

申请日：2006-03-23

Applicant: ASML NETHERLANDS BV

Inventor： TOORN VAN DER JAN-GERARD CORNE ,  BUTLER HANS ,  COX HENRIKUS HERMAN MARIE ,  DRAAIJER EVERT HENDRIK JAN ,  KATE TEN NICOLAAS ,  MEULEN VAN DER FRITS ,  ENCKEN MARK JOHANNES HERMANUS ,  HOUKES MARTIJN ,  ARENDS ANTONIUS HENRICUS ,  CUPERUS MINNE

公开(公告)号：DE60120825D1

公开(公告)日：2006-08-03

申请号：DE60120825

申请日：2001-04-06

Applicant: ASML NETHERLANDS BV

Inventor： SCHEIBERLICH ARIE CORNELIS ,  FIEN MENNO ,  DRAAIJER EVERT HENDRIK JAN

IPC: G01B21/00 ,  G03F7/20 ,  G01B21/22 ,  G03F9/00 ,  H01L21/027

Abstract: On-the-Fly leveling in a lithographic apparatus is conducted using a setpoint derived by filtering the output of the combination of the output of a level sensor and another position sensor (LVDT or IFM). The level sensor may include look-ahead. The filter may be a low pass filter to cut-off level variations of wavelength shorter than the width of the slit during a scanning exposure. The filter may also be selected to reduce cross-talk between tilt movements and horizontal displacements.