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    Lithographic apparatus, and device manufacturing method
    1.
    发明专利
    Lithographic apparatus, and device manufacturing method 有权
    LITHOGRAPHIC设备和设备制造方法

    公开(公告)号：JP2009239280A

    公开(公告)日：2009-10-15

    申请号：JP2009067141

    申请日：2009-03-19

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： STARREVELD JEROEN PIETER ,  VAN DE VEN BASTIAAN LAMBERTUS

    IPC: H01L21/027

    CPC classification number: G03F7/709 ,  G03F7/70758

    Abstract: PROBLEM TO BE SOLVED: To improve a positioning system for positioning a portion of a lithographic apparatus. SOLUTION: The lithographic apparatus includes an illumination system, a support, a substrate table, a projection system, and an actuator. The illumination system is configured to condition a radiation beam. The support is constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The substrate table is constructed to hold a substrate. The projection system is configured to project the patterned radiation beam onto a target portion of the substrate. The actuator is constructed and arranged to exert a force on a part of the lithographic apparatus via an elongated structure. The elongated structure is provided with a vibration damper constructed and arranged to damp vibrations in the elongated structure. The actuator may be used in a positioning system configured to position a portion of the lithographic apparatus, and the portion may be the support and/or substrate table. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：改进用于定位光刻设备的一部分的定位系统。 解决方案：光刻设备包括照明系统，支撑件，基板台，投影系统和致动器。 照明系统被配置为调节辐射束。 支撑件被构造成支撑图案形成装置。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 衬底台被构造成保持衬底。 投影系统被配置为将图案化的辐射束投影到基板的目标部分上。 致动器构造和布置成经由细长结构对光刻设备的一部分施加力。 细长结构设置有一个阻尼器，其被构造和布置成阻尼细长结构中的振动。 致动器可以用于配置成定位光刻设备的一部分的定位系统，并且该部分可以是支撑和/或衬底台。 版权所有（C）2010，JPO＆INPIT

    Lithography apparatus and stage system
    2.
    发明专利
    Lithography apparatus and stage system 有权
    平面设备和舞台系统

    公开(公告)号：JP2012178561A

    公开(公告)日：2012-09-13

    申请号：JP2012032609

    申请日：2012-02-17

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VAN DER TOORN JAN-GERARD CORNELIS ,  BAGGEN MARCEL KOENRAAD MARIE ,  STEFAN GEERTE KRUIJSWIJK ,  STARREVELD JEROEN PIETER ,  MARC CONSTANT JOHANNES BAGGEN ,  MICHAEL JOHANNES PHELVOLDELDONK

    IPC: H01L21/027 ,  G05D3/12 ,  H01L21/68

    CPC classification number: G03F7/70716 ,  G03F7/709

    Abstract: PROBLEM TO BE SOLVED: To provide accurate short stroke positioning.SOLUTION: A stage system comprises an object table which holds an object, a short stroke actuator element which moves the object table over a first moving range, a long stroke actuator element which moves the short stroke actuator element over a second moving range wider than the first moving range. The stage system further comprises a pneumatic compensation device including a sensor which measures an amount representing an air disturbance force on the short stroke actuator element, an actuator which provides a compensation force at least partially compensating for air disturbance, and a controller. The sensor is connected to a controller input of the controller, and the actuator is connected to a controller output of the controller. The controller drives the actuator in response to a signal received from the sensor.

    Abstract translation: 要解决的问题：提供准确的短行程定位。 解决方案：舞台系统包括保持物体的物体台，在第一移动范围上移动物体台的短行程致动器元件，在第二移动范围内移动短行程致动器元件的长行程致动器元件 比第一移动范围宽。 舞台系统还包括气动补偿装置，其包括测量表示短行程致动器元件上的空气扰动力的量的传感器，提供至少部分地补偿空气干扰的补偿力的致动器和控制器。 传感器连接到控制器的控制器输入，执行器连接到控制器的控制器输出。 控制器响应于从传感器接收到的信号驱动致动器。 版权所有（C）2012，JPO＆INPIT

    Imprint lithographic apparatus, and imprint lithographic method
    3.
    发明专利
    Imprint lithographic apparatus, and imprint lithographic method 有权
    IMPRINT LITHOGRAPHIC APPARATUS和IMPRINT LITHOGRAPHIC方法

    公开(公告)号：JP2011135077A

    公开(公告)日：2011-07-07

    申请号：JP2010282942

    申请日：2010-12-20

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BUTLER HANS ,  JOHANNES PETRUS MARTINUS BERNARDUS VERMEULEN ,  VAN DER WIJST MARC WILHELMUS MARIA ,  STARREVELD JEROEN PIETER ,  DE HOON CORNELIUS ADRIANUS LAMBERTUS ,  DEBIESME FRANCOIS XAVIER

    IPC: H01L21/027 ,  H01L21/683

    CPC classification number: G03F7/0002 ,  B29C2043/025 ,  B82Y10/00 ,  B82Y40/00 ,  F16F9/535 ,  F16F15/002 ,  F16F15/0275 ,  F16F15/03

    Abstract: PROBLEM TO BE SOLVED: To provide a vibration isolation system for an imprint lithographic apparatus, capable of improving a throughput of an imprint lithographic apparatus.
    SOLUTION: An imprint lithographic apparatus 100 includes an actuator 130 displacing an imprint template holder 110 relative to a substrate holder 120. A support structure 140 of the imprint template holder 110 and/or the substrate holder 120 is attached to a vibration isolation system 150 attached to a base 160. The vibration isolation system 150 isolates vibration of the support structure 140 relative to the base 160. A control unit controlling the actuator 130 in an imprint process controls an adjusting member of the vibration isolation system 150, and adjusts a dynamic characteristic of the vibration isolation system 150 during at least part of the imprint process to reduce a displacement of the support structure 140 relative to the base 160, the displacement being caused by a force acting the support structure 140.
    COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种能够提高压印光刻设备的生产量的压印光刻设备的隔振系统。 压印光刻设备100包括致动器130，其相对于衬底保持器120移动压印模板保持器110.压印模板保持器110和/或衬底保持器120的支撑结构140附接到振动隔离 系统150附接到基座160.隔振系统150隔离支撑结构140相对于基座160的振动。在压印过程中控制致动器130的控制单元控制隔振系统150的调节构件，并调节 在压印过程的至少一部分期间防振系统150的动态特性，以减小支撑结构140相对于基座160的位移，该位移是由作用于支撑结构140的力引起的。版权所有： （C）2011，JPO＆INPIT

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