公开(公告)号：JP2008283178A

公开(公告)日：2008-11-20

申请号：JP2008114085

申请日：2008-04-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KAZINCZI ROBERT ,  TEL WIM TJIBBO ,  DE WINTER LAURENTIUS CORNELIUS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70891

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a method, improving fidelity or quality of, for example, a printed pattern. SOLUTION: The lithographic method includes using an illumination system to provide a radiation beam having an illumination mode, using a patterning device to impart the radiation beam with a pattern in its cross-section, and projecting the patterned radiation beam onto a plurality of substrates. The illumination mode is adjusted after the radiation beam has been projected onto one or more substrates. The adjustment is arranged to reduce the effect of aberrations due to lens heating on the projected pattern during projection of the pattern onto one or more subsequent substrates. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种提高例如印刷图案的保真度或质量的光刻设备和方法。 解决方案：光刻方法包括使用照明系统提供具有照明模式的辐射束，使用图案形成装置将辐射束赋予其横截面中的图案，并将图案化的辐射束投影到多个 的底物。 在辐射束已经投影到一个或多个基板上之后调整照明模式。 该调整被布置为在将图案投影到一个或多个后续基底上时，减少由于透镜加热引起的像差对投射图案的影响。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008166777A

公开(公告)日：2008-07-17

申请号：JP2007329420

申请日：2007-12-21

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： HANSEN STEVEN GEORGE ,  MULDER HEINE MELLE ,  KAZINCZI ROBERT

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/705 ,  G03F7/70125

Abstract: PROBLEM TO BE SOLVED: To optimize the lighting conditions of a lithographic device to a printing features having higher precision. SOLUTION: A method for constituting lighting sources of the lithographic device is provided. The method includes a step of dividing the lighting sources into pixel groups containing one or a plurality of lighting source points, respectively; a step of selecting a light form, formed by at least one pixel group for exposing a pattern; a step of repeatedly calculating lithographic metric, as a result of condition changing of the pixel group forming the modified light form in the lighting source; and a step of adjusting the light form, based on the repeated calculation. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：将光刻设备的照明条件优化为具有更高精度的打印特征。 解决方案：提供一种用于构成光刻设备的光源的方法。 该方法包括分别将光源划分为包含一个或多个光源点的像素组的步骤; 选择由用于曝光图案的至少一个像素组形成的光形式的步骤; 作为在光源中形成修改光形状的像素组的条件变化的结果，重复计算光刻度量的步骤; 以及基于重复计算的调整光形式的步骤。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：NL2008285A

公开(公告)日：2012-09-12

申请号：NL2008285

申请日：2012-02-14

Applicant: ASML NETHERLANDS BV

Inventor： ENGELEN ADRIANUS ,  MEGENS HENRICUS ,  MULKENS JOHANNES ,  KAZINCZI ROBERT ,  WANG JEN-SHIANG

IPC: G03F7/20