公开(公告)号：WO2015101461A3

公开(公告)日：2015-08-20

申请号：PCT/EP2014076545

申请日：2014-12-04

Applicant: ASML NETHERLANDS BV

Inventor： CHEN GUANGQING ,  BAI SHUFENG ,  WANG JEN-SHIANG

IPC: G03F7/20

CPC classification number: G03F7/70633 ,  G03F7/705 ,  G03F7/70625 ,  G03F7/70641 ,  G03F7/70683

Abstract: A system to, and a method to, select a metrology target for use on a substrate including performing a lithographic simulation for a plurality of points on a process window region for each proposed target, identifying a catastrophic error for any of the plurality of points for each proposed target, eliminating each target having a catastrophic error at any of the plurality of points, performing a metrology simulation to determine a parameter over the process window for each target not having a catastrophic error at any of the plurality of points, and using the one or more resulting determined simulated parameters to evaluate target quality.

Abstract translation: 一种用于选择在衬底上使用的度量衡目标的系统和方法，包括针对每个提议的目标对处理窗口区域上的多个点执行光刻仿真，识别用于多个点中的任何点的灾难性错误， 每个提出的目标，消除在多个点中的任何点处具有灾难性错误的每个目标，执行计量模拟以确定在多个点中的任一个点处没有灾难性错误的每个目标在处理窗口上的参数，并且使用 一个或多个结果确定的模拟参数以评估目标质量。

公开(公告)号：NL2008285A

公开(公告)日：2012-09-12

申请号：NL2008285

申请日：2012-02-14

Applicant: ASML NETHERLANDS BV

Inventor： ENGELEN ADRIANUS ,  MEGENS HENRICUS ,  MULKENS JOHANNES ,  KAZINCZI ROBERT ,  WANG JEN-SHIANG

IPC: G03F7/20