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    Lithography apparatus, and composite material and method for producing the same
    2.
    发明专利
    Lithography apparatus, and composite material and method for producing the same 有权
    平版印刷装置及其复合材料及其制造方法

    公开(公告)号：JP2009302535A

    公开(公告)日：2009-12-24

    申请号：JP2009135671

    申请日：2009-06-05

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： MARK SCHOLTEN ,  KLEIJN JACOB ,  LIBOUREL STEPHAN CHRISTIAAN QU ,  UBBINK MARK PETRUS

    IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68 ,  H01L21/683

    CPC classification number: G03F7/70716 ,  G03F7/7095 ,  Y10T428/30

    Abstract: PROBLEM TO BE SOLVED: To provide an improved composite material, a lithography apparatus including the composite material, and a method for producing the composite material. SOLUTION: The lithography apparatus includes: a lighting system configured so as to control radiation beams and a support member configured so as to support a patterning device. The patterning device can form patterned radiation beams by providing a pattern to the cross section of radiation beams. The lithography apparatus further includes: substrate table configured so as to hold a substrate and a projection system configured to project patterned radiation beams on a target part of the substrate. The lithography apparatus can include a composite material in which a carbon fiber layer 11 and a titanium layer 15 are provided. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 解决的问题：提供一种改进的复合材料，包括该复合材料的光刻设备以及该复合材料的制造方法。 光刻设备包括：配置为控制辐射束的照明系统和被配置为支撑图案形成装置的支撑构件。 图案形成装置可以通过向辐射束的横截面提供图案来形成图案化的辐射束。 光刻设备还包括：被配置为保持基板的基板台和配置成将图案化的辐射束投射到基板的目标部分上的投影系统。 光刻设备可以包括其中提供碳纤维层11和钛层15的复合材料。 版权所有（C）2010，JPO＆INPIT

    Lithographic apparatus and method of manufacturing device
    3.
    发明专利
    Lithographic apparatus and method of manufacturing device 有权
    光刻设备及其制造方法

    公开(公告)号：JP2006179930A

    公开(公告)日：2006-07-06

    申请号：JP2005368952

    申请日：2005-12-22

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： VAN DIJSSELDONK ANTONIUS JOHAN ,  FRANKEN DOMINICUS JACOBUS PETR ,  JANSEN BASTIAAN STEPHANUS HEND ,  DE JONGH ROBERTUS JOHANNES MAR ,  VAN DER WIJST MARC WILHELMUS M ,  KLEIJN JACOB

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/709 ,  G03F7/70266 ,  G03F7/70825

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus including a projection system including a movable optical element. SOLUTION: The movable optical element M4 can affect the position quantity of a radiation beam projected by the projection system by being displaced. A control device Con which drives an optical element actuator ACT is provided to influence the position quantity of the movable optical element, and consequently the position quantity of the radiation beam projected by the projection system is influenced. The control device moves the movable optical element to position the radiation beam projected by the projection system on a substrate, or corrects the position quantity of the radiation beam projected by the projection system which is caused by disturbance of an arbitrary type to the projection system. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供一种包括具有可移动光学元件的投影系统的光刻设备。 解决方案：可移动光学元件M4可以通过移位来影响由投影系统投射的辐射束的位置量。 提供驱动光学元件致动器ACT的控制装置Con，以影响可移动光学元件的位置量，并且因此影响由投影系统投影的辐射束的位置量。 控制装置移动可移动光学元件以将由投影系统投影的辐射束定位在基板上，或者将由任意类型的干扰引起的由投影系统投射的辐射束的位置量校正到投影系统。 版权所有（C）2006，JPO＆NCIPI

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